Patents by Inventor Philip A. Greene
Philip A. Greene has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9437112Abstract: Techniques are described that allow an air traffic display of an aircraft to display the relative motion of air traffic proximate to the aircraft. The air traffic display may be switched between a first display mode in which absolute motion of air traffic is displayed (e.g., motion of air traffic targets relative to a fixed point on the earth's surface or relative to an apparently fixed celestial point is displayed) and a second display mode in which motion of air traffic targets is displayed relative to the aircraft. The techniques further facilitate the selection of individual traffic targets from a displayed traffic depiction to activate a third display mode in which additional information about the relative motion of the selected target, such as its estimated closest point of approach (CPA) to the aircraft and the estimated time it will take the selected target to reach the CPA are shown.Type: GrantFiled: June 11, 2015Date of Patent: September 6, 2016Assignee: Garmin International, Inc.Inventor: Philip A. Greene
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Patent number: 8361835Abstract: Embodiments disclosed herein generally relate to a process of depositing a transparent conductive oxide layer over a substrate. The transparent oxide layer is sometimes deposited onto a substrate for later use in a solar cell device. The transparent conductive oxide layer may be deposited by a “cold” sputtering process. In other words, during the sputtering process, a plasma is ignited in the processing chamber which naturally heats the substrate. No additional heat is provided to the substrate during deposition such as from the susceptor. After the transparent conductive oxide layer is deposited, the substrate may be annealed and etched, in either order, to texture the transparent conductive oxide layer. In order to tailor the shape of the texturing, different wet etch chemistries may be utilized. The different etch chemistries may be used to shape the surface of the transparent conductive oxide and the etch rate.Type: GrantFiled: March 29, 2010Date of Patent: January 29, 2013Assignee: Applied Materials, Inc.Inventors: Valery V. Komin, Hien-Minh Huu Le, David Tanner, James S. Papanu, Philip A. Greene, Suresh M. Shrauti, Roman Gouk, Steven Verhaverbeke
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Patent number: 8318589Abstract: Embodiments disclosed herein generally relate to a process of depositing a transparent conductive oxide layer over a substrate. The transparent oxide layer is sometimes deposited onto a substrate for later use in a solar cell device. The transparent conductive oxide layer may be deposited by a “cold” sputtering process. In other words, during the sputtering process, a plasma is ignited in the processing chamber which naturally heats the substrate. No additional heat is provided to the substrate during deposition such as from the susceptor. After the transparent conductive oxide layer is deposited, the substrate may be annealed and etched, in either order, to texture the transparent conductive oxide layer. In order to tailor the shape of the texturing, different wet etch chemistries may be utilized. The different etch chemistries may be used to shape the surface of the transparent conductive oxide and the etch rate.Type: GrantFiled: March 29, 2010Date of Patent: November 27, 2012Assignee: Applied Materials, Inc.Inventors: Valery V. Komin, Hien-Minh Huu Le, David Tanner, James S. Papanu, Philip A. Greene, Suresh M. Shrauti, Roman Gouk, Steven Verhaverbeke
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Patent number: 8118982Abstract: A method and apparatus for physical vapor deposition of films on a substrate is provided. The apparatus comprises a series of connected sputtering chambers through which a substrate passes to undergo sequential deposition processes. The chambers have passages through which the substrates move, and through which process gases may leak. Target gas flows to each chamber are established by operating each chamber while adjacent chambers are idle, measuring the extent of gas communication between the chambers, and reducing the flows by an amount based on the extent of gas leakage.Type: GrantFiled: March 6, 2009Date of Patent: February 21, 2012Assignee: Applied Materials, Inc.Inventor: Philip A. Greene
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Publication number: 20100311228Abstract: Embodiments disclosed herein generally relate to a process of depositing a transparent conductive oxide layer over a substrate. The transparent oxide layer is sometimes deposited onto a substrate for later use in a solar cell device. The transparent conductive oxide layer may be deposited by a “cold” sputtering process. In other words, during the sputtering process, a plasma is ignited in the processing chamber which naturally heats the substrate. No additional heat is provided to the substrate during deposition such as from the susceptor. After the transparent conductive oxide layer is deposited, the substrate may be annealed and etched, in either order, to texture the transparent conductive oxide layer. In order to tailor the shape of the texturing, different wet etch chemistries may be utilized. The different etch chemistries may be used to shape the surface of the transparent conductive oxide and the etch rate.Type: ApplicationFiled: March 29, 2010Publication date: December 9, 2010Inventors: VALERY V. KOMIN, Hien-Minh Huu Le, David Tanner, James S. Papanu, Philip A. Greene, Suresh M. Shrauti, Roman Gouk, Steven Verhaverbeke
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Publication number: 20100311204Abstract: Embodiments disclosed herein generally relate to a process of depositing a transparent conductive oxide layer over a substrate. The transparent oxide layer is sometimes deposited onto a substrate for later use in a solar cell device. The transparent conductive oxide layer may be deposited by a “cold” sputtering process. In other words, during the sputtering process, a plasma is ignited in the processing chamber which naturally heats the substrate. No additional heat is provided to the substrate during deposition such as from the susceptor. After the transparent conductive oxide layer is deposited, the substrate may be annealed and etched, in either order, to texture the transparent conductive oxide layer. In order to tailor the shape of the texturing, different wet etch chemistries may be utilized. The different etch chemistries may be used to shape the surface of the transparent conductive oxide and the etch rate.Type: ApplicationFiled: March 29, 2010Publication date: December 9, 2010Inventors: VALERY V. KOMIN, Hien-Minh Huu Le, David Tanner, James S. Papanu, Philip A. Greene, Suresh M. Shrauti, Roman Gouk, Steven Verhaverbeke
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Publication number: 20100230274Abstract: A method and apparatus for performing physical vapor deposition on a large-area substrate is provided. One or more sputtering targets are disposed in a chamber, with each sputtering target comprising a magnet assembly. Each magnet assembly may comprise a plurality of magnet units aligned such that the magnetic polarity of the magnet units is complementary, and the magnetic fields of the magnet units couple. Each magnet unit thus comprises a plurality of magnets arranged such that the polarity of each magnet is opposite that of adjacent magnets in the same magnet unit. Alternately, each magnet assembly may comprise a plurality of magnets individually oriented to complement the magnetic fields of its neighbors. A substrate support having an insulating surface may also be provided.Type: ApplicationFiled: March 11, 2010Publication date: September 16, 2010Applicant: APPLIED MATERIALS, INC.Inventors: Philip A. Greene, Hans Peter Theodorus Ceelen
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Publication number: 20100224481Abstract: A method and apparatus for physical vapor deposition of films on a substrate is provided. The apparatus comprises a series of connected sputtering chambers through which a substrate passes to undergo sequential deposition processes. The chambers have passages through which the substrates move, and through which process gases may leak. Target gas flows to each chamber are established by operating each chamber while adjacent chambers are idle, measuring the extent of gas communication between the chambers, and reducing the flows by an amount based on the extent of gas leakage.Type: ApplicationFiled: March 6, 2009Publication date: September 9, 2010Applicant: APPLIED MATERIALS, INC.Inventor: Philip A. Greene
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Publication number: 20050067985Abstract: Stator position feedback controller. A first position monitoring device responds to the position of a stator supported for relative motion by a machine base. A second position monitoring device responds to the position of a carriage with respect to the machine base. An actuator is provided to move the carriage through interaction with the stator. A servo controller responds to the difference in the output of the first and second position monitoring devices to control the position of the carriage with respect to the machine base.Type: ApplicationFiled: July 27, 2004Publication date: March 31, 2005Inventors: Philip Greene, Alon Harpaz
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Publication number: 20040129561Abstract: A support assembly for the magnetic array in a cylindrical magnetron that greatly reduces the stress placed on the assembly and on the end blocks of the magnetron. The support assembly and method also reduce the time necessary for properly positioning the magnetic array in relation to the target tube, and result in uniform positioning of the magnetic array along the length of the target tube. A cylindrical magnetron incorporating such an assembly produces uniform coatings and requires less adjustment and maintenance.Type: ApplicationFiled: January 7, 2003Publication date: July 8, 2004Applicant: Von Ardenne Anlagentechnik GmbHInventors: Richard Lowe Barrett, Philip A. Greene
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Patent number: 6668173Abstract: In an Internet system having instant message capability each of the plurality of users is provided with a wired or wireless device. The wireless device transmits location data indicating its location or status update messages based on its location to an instant message server. In this invention a wireless device or server associates the location data with status update messages indicating the status and/or location of the users carrying the wireless devices in accordance with the received location information. The instant messages are then transmitted by the instant message server to other users of the instant message system.Type: GrantFiled: December 15, 2000Date of Patent: December 23, 2003Assignee: Motorola, Inc.Inventor: Kenneth Philip Greene
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Publication number: 20020077080Abstract: In an Internet system having instant message capability each of the plurality of users is provided with a wired or wireless device. The wireless device transmits location data indicating its location or status update messages based on its location to an instant message server. In this invention a wireless device or server associates the location data with status update messages indicating the status and/or location of the users carrying the wireless devices in accordance with the received location information. The instant messages are then transmitted by the instant message server to other users of the instant message system.Type: ApplicationFiled: December 15, 2000Publication date: June 20, 2002Inventor: Kenneth Philip Greene