Abstract: A method for fine positioning a component through the use of fusible elements having two or more melting points so as to establish intermediate displacements between totally melted fusible elements and unmelted fusible elements. Because of the use of non-eutectic fusible materials, fine adjustments in the displacement may be achieved.

Abstract: A method for fine positioning a component through the use of fusible elements having two or more melting points so as to establish intermediate displacements between totally melted fusible elements and unmelted fusible elements. Because of the use of non-eutectic fusible materials, fine adjustments in the displacement may be achieved.

Abstract: A method for fine positioning a component through the use of fusible elements having two or more melting points so as to establish intermediate displacements between totally melted fusible elements and unmelted fusible elements. Because of the use of non-eutectic fusible materials, fine adjustments in the displacement may be achieved.

Abstract: A method for fine positioning a component through the use of fusible elements having two or more melting points so as to establish intermediate displacements between totally melted fusible elements and unmelted fusible elements. Because of the use of non-eutectic fusible materials, fine adjustments in the displacement may be achieved.

Abstract: A method for fine positioning a component through the use of fusible elements having two or more melting points so as to establish intermediate displacements between totally melted fusible elements and unmelted fusible elements. Because of the use of non-eutectic fusible materials, fine adjustments in the displacement may be achieved.

Abstract: A method for fine positioning a component through the use of fusible elements having two or more melting points so as to establish intermediate displacements between totally melted fusible elements and unmelted fusible elements. Because of the use of non-eutectic fusible materials, fine adjustments in the displacement may be achieved.

Abstract: A method for fine positioning a component through the use of fusible elements having two or more melting points so as to establish intermediate displacements between totally melted fusible elements and unmelted fusible elements. Because of the use of non-eutectic fusible materials, fine adjustments in the displacement may be achieved.

Abstract: A photonic waveguide structure includes a first photonic waveguide layer located over a substrate. A sidewall cladding layer is located cladding a sidewall, but not covering a top, of the first photonic waveguide layer. A second photonic waveguide layer may be located upon the top of the sidewall cladding layer while contacting, but not straddling, the first photonic waveguide layer. The sidewall cladding layer protects the first photonic waveguide layer from environmental exposure, thus providing enhanced performance of a photonic waveguide structure. A planarizing sidewall cladding layer allows the fabrication of optical chips with multiple layers of lithographically defined devices.

Abstract: A method for fine positioning a component through the use of fusible elements having two or more melting points so as to establish intermediate displacements between totally melted fusible elements and unmelted fusible elements. Because of the use of non-eutectic fusible materials, fine adjustments in the displacement may be achieved.

Abstract: An apparatus (and method) for launching a modulated optical signal, includes a waveguide, an antenna structure for communicating with the waveguide and with an externally-applied optical field and having an output port, and an electrically-variable-impedance device connected at the antenna's output port, capable of responding at a frequency of an externally-applied optical field and having its impedance at the optical frequency changed by an applied electrical signal.

Abstract: A system and method are disclosed for an optical backplane in an electronic processor that comprises of a plurality of processing units. The backplane is comprising of a network of optical waveguides which can guide polarized light. Furthermore, the backplane has magneto optic routers for steering light at the vertexes of the network, and the backplane also has optical devices for operationally connecting the processing units to the network. The backplane network affords an optical interconnection amongst all of the processing units.

Abstract: A system and method are disclosed for an optical backplane in an electronic processor that comprises of a plurality of processing units. The backplane is comprising of a network of optical waveguides which can guide polarized light. Furthermore, the backplane has magneto optic routers for steering light at the vertexes of the network, and the backplane also has optical devices for operationally connecting the processing units to the network. The backplane network affords an optical interconnection amongst all of the processing units.

Abstract: A system and method are disclosed for an optical backplane in an electronic processor that comprises of a plurality of processing units. The backplane is comprising of a network of optical waveguides which can guide polarized light. Furthermore, the backplane has magneto optic routers for steering light at the vertexes of the network, and the backplane also has optical devices for operationally connecting the processing units to the network. The backplane network affords an optical interconnection amongst all of the processing units.

Abstract: An apparatus (and method) for launching a modulated optical signal, includes a waveguide, an antenna structure for communicating with the waveguide and with an externally-applied optical field and having an output port, and an electrically-variable-impedance device connected at the antenna's output port, capable of responding at a frequency of an externally-applied optical field and having its impedance at the optical frequency changed by an applied electrical signal.

Abstract: A system and method are disclosed for an optical backplane in an electronic processor that comprises of a plurality of processing units. The backplane is comprising of a network of optical waveguides which can guide polarized light. Furthermore, the backplane has magneto optic routers for steering light at the vertexes of the network, and the backplane also has optical devices for operationally connecting the processing units to the network. The backplane network affords an optical interconnection amongst all of the processing units.

Abstract: An optical system includes a spectrometer and a multipass optical probe. The multipass optical probe includes a retroreflective element such that light propagating, in a first direction, from the probe to a sample under test and passing through or reflecting from the sample under test, is reflected back in a second direction opposite the first direction, so as to pass through the sample under test a total of at least two times.

Abstract: A method for constructing a thin-film infrared photodetector includes providing a thin film including ferroelectric polymer, and applying at least one electrically conductive coating to the polymer so that the coating is nonuniform in surface conductivity to thereby provide an area of higher surface resistance connected to an output region by an area of lower surface resistance.

Abstract: An optical assembly utilizing a novel optical element. The assembly includes a tunable source of input radiation; an optical element that can receive at least a portion of the input radiation and comprises a manifold having at least two independent surfaces, in which at least a portion of each independent surface is selected from the group consisting of a reflective structure and a diffractive structure, and the independent surfaces are geometrically configured so that a portion of incident radiation to the manifold is diffracted at least twice in an angular sense that can increase a tuning sensitivity of an angular deviation of the incident radiation exiting the manifold; and, a scanner means which can accept and redirect a portion of the radiation output by the optical element for producing an illumination pattern.

Abstract: Method for correcting aberrations of an optical system and solving the problem of tolerance buildup. The method posits a desired specification limit for each of at least one optical characteristic of an optical element, and requires embossing at least a portion of a surface of the optical element for bringing the or each optical characteristic within its corresponding specification limit.

Abstract: Apparatus suitable for transforming a radiation beam so that it can exit with a predetermined alteration. The apparatus includes a first variably diffractive radiation element for transforming a characteristic of the radiation beam from an original state; a second radiation element juxtaposed to the first radiation element for transforming the same characteristic in a complementary way; and, means for physically deforming the first variably diffractive radiation element so that its diffracting pattern can change in a known way.