Abstract: A log-time stitching system provides for directly determining an accurate pixel exposure for each pixel in a recorded image. The present invention provides a digital processing system in which signals associated with a pixel are obtained at each of a plurality of different development times of the film being developed. A regression analysis that compares these different development times versus the natural log of time is made, to obtain a best fit line of this data, which line is then used to determine a “b” value. This “b” value or “fitting constant” corresponds to the intersection of the y-intercept and the best fit line. It has been discovered that this “b” value is substantially directly proportional to the log exposure of the pixel. Accordingly, this “b” value can be directly used to determine an appropriate exposure of the pixel.