Patents by Inventor Philip Grunow

Philip Grunow has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for in-situ cleaning of carbon contaminated surfaces
    Patent number: 7147722
    Abstract: Activated gaseous species generated adjacent a carbon contaminated surface affords in-situ cleaning. A device for removing carbon contamination from a surface of the substrate includes (a) a housing defining a vacuum chamber in which the substrate is located; (b) a source of gaseous species; and (c) a source of electrons that are emitted to activate the gaseous species into activated gaseous species. The source of electrons preferably includes (i) a filament made of a material that generates thermionic electron emissions; (ii) a source of energy that is connected to the filament; and (iii) an electrode to which the emitted electrons are attracted. The device is particularly suited for photolithography systems with optic surfaces, e.g., mirrors, that are otherwise inaccessible unless the system is dismantled. A method of removing carbon contaminants from a substrate surface that is housed within a vacuum chamber is also disclosed.
    Type: Grant
    Filed: May 24, 2004
    Date of Patent: December 12, 2006
    Assignee: EUV LLC
    Inventors: Leonard E. Klebanoff, Philip Grunow, Samuel Graham, Jr.
  • Apparatus for in-situ cleaning of carbon contaminated surfaces
    Publication number: 20040211448
    Abstract: Activated gaseous species generated adjacent a carbon contaminated surface affords in-situ cleaning. A device for removing carbon contamination from a surface of the substrate includes (a) a housing defining a vacuum chamber in which the substrate is located; (b) a source of gaseous species; and (c) a source of electrons that are emitted to activate the gaseous species into activated gaseous species. The source of electrons preferably includes (i) a filament made of a material that generates thermionic electron emissions; (ii) a source of energy that is connected to the filament; and (iii) an electrode to which the emitted electrons are attracted. The device is particularly suited for photolithography systems with optic surfaces, e.g., mirrors, that are otherwise inaccessible unless the system is dismantled.
    Type: Application
    Filed: May 24, 2004
    Publication date: October 28, 2004
    Applicant: EUV LLC
    Inventors: Leonard E. Klebanoff, Philip Grunow, Samuel Graham
  • Apparatus for in situ cleaning of carbon contaminated surfaces
    Patent number: 6772776
    Abstract: Activated gaseous species generated adjacent a carbon contaminated surface affords in-situ cleaning. A device for removing carbon contamination from a surface of the substrate includes (a) a housing defining a vacuum chamber in which the substrate is located; (b) a source of gaseous species; and (c) a source of electrons that are emitted to activate the gaseous species into activated gaseous species. The source of electrons preferably includes (i) a filament made of a material that generates thermionic electron emissions; (ii) a source of energy that is connected to the filament; and (iii) an electrode to which the emitted electrons are attracted. The device is particularly suited for photolithography systems with optic surfaces, e.g., mirrors, that are otherwise inaccessible unless the system is dismantled.
    Type: Grant
    Filed: September 18, 2001
    Date of Patent: August 10, 2004
    Assignee: EUV LLC
    Inventors: Leonard E. Klebanoff, Philip Grunow, Samuel Graham, Jr.
  • Apparatus for in situ cleaning of carbon contaminated surfaces
    Publication number: 20030051739
    Abstract: Activated gaseous species generated adjacent a carbon contaminated surface affords in-situ cleaning. A device for removing carbon contamination from a surface of the substrate includes (a) a housing defining a vacuum chamber in which the substrate is located; (b) a source of gaseous species; and (c) a source of electrons that are emitted to activate the gaseous species into activated gaseous species. The source of electrons preferably includes (i) a filament made of a material that generates thermionic electron emissions; (ii) a source of energy that is connected to the filament; and (iii) an electrode to which the emitted electrons are attracted. The device is particularly suited for photolithography systems with optic surfaces, e.g., mirrors, that are otherwise inaccessible unless the system is dismantled.
    Type: Application
    Filed: September 18, 2001
    Publication date: March 20, 2003
    Inventors: Leonard E. Klebanoff, Philip Grunow, Samuel Graham