Patents by Inventor Philip Hartmann

Philip Hartmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160053395
    Abstract: The present invention is related to a galvanic nickel or nickel alloy electroplating bath for depositing a semi-bright nickel or nickel alloy coating characterized in that the electroplating bath comprises at least one compound having the general formula (I) wherein R1=C1-C18 hydrocarbon moiety substituted with a SO3? group, C1-C18 hydrocarbon moiety substituted with a carboxylic group or C1-C18 hydrocarbon moiety substituted with at least an aromatic and/or a heteroaromatic group; R2=NR3R4 moiety, OR5 moiety, or cyclic NR6 moiety, wherein R3, R4, R5=hydrogen or C1-C18 hydrocarbon moiety or C1-C18 hydrocarbon moiety substituted with at least an aromatic and/or a heteroaromatic group, wherein R3, R4 and R5 are identical or different; R6=C3-C8 hydrocarbon moiety or C3-C8 hydrocarbon moiety, wherein at least one carbon atom is substituted by a heteroatom; and n=1-3.
    Type: Application
    Filed: March 20, 2014
    Publication date: February 25, 2016
    Inventors: Klaus-Dieter SCHULZ, Philip HARTMANN, Philipp WACHTER, Mike BRIESE, Heiko BRUNNER, Richard RICHTER, Lars KOHLMANN
  • Publication number: 20150014177
    Abstract: The present invention relates to a method for deposition of a matte copper coating wherein a first copper layer is deposited from an aqueous copper electrolyte which does not contain an organic compound comprising divalent sulfur. A second copper layer is then deposited onto the first copper layer from an aqueous copper electrolyte comprising a first and a second water soluble sulfur-containing additive wherein the first water soluble sulfur-containing compound is an alkyl sulfonic acid derivative and the second water soluble sulfur-containing additive is an aromatic sulfonic acid derivative. The method provides copper layers with a homogeneous and adjustable matte appearance for decorative applications.
    Type: Application
    Filed: November 27, 2012
    Publication date: January 15, 2015
    Inventors: Stefan Kretschmer, Philip Hartmann, Bernd Roelfs
  • Patent number: 8894835
    Abstract: For fast and secure determination of the quality of a metal coating as well as of an electrolyte for depositing a metal, in particular for electrolytic deposition of nickel such as of semi-gloss nickel and bright nickel and for analytical control of the deposition electrolyte, a method of inspecting a metal coating is provided, which involves the following method steps: a) depositing the metal coating from a deposition electrolyte onto a working electrode; b) electrolytically dissolving the metal coating through anodic polarization of the working electrode with respect to a counter electrode, which is in electrolytic contact with the working electrode; c) recording an electrical dissolution potential at the working electrode over time, said potential occurring during a dissolution of the metal coating; and d) determining a time-averaged vale of the dissolution potential.
    Type: Grant
    Filed: October 26, 2009
    Date of Patent: November 25, 2014
    Assignee: Atotech Deutschland GmbH
    Inventors: Philip Hartmann, Michael Jonat, Mathias Wuensche
  • Publication number: 20140124376
    Abstract: A pyrophosphate-containing bath for the cyanide-free deposition of copper alloys on substrate surfaces, comprising a reaction product of a secondary monoamine with a diglycidyl ether, is described. The electrolyte bath is suitable for the galvanic deposition of glossy white, even and uniform copper-tin alloy coatings.
    Type: Application
    Filed: December 9, 2013
    Publication date: May 8, 2014
    Applicant: ATOTECH DEUTSCHLAND GMBH
    Inventors: Philip Hartmann, Klaus-Dieter Schulz, Lars Kohlmann, Heiko Brunner
  • Publication number: 20140042033
    Abstract: The invention relates to methods and plating baths for electrodepositing a dark chromium layer on a workpiece. The trivalent chromium electroplating baths comprise sulphur compounds and the methods for electrodepositing a dark chromium layer employ these trivalent chromium electroplating baths. The dark chromium deposits and workpieces carrying dark chromium deposits are suited for application for decorative purposes.
    Type: Application
    Filed: April 27, 2012
    Publication date: February 13, 2014
    Applicant: ATOTECH DEUTSCHLAND GMBH
    Inventors: Klaus-Dieter Schulz, Philipp Wachter, Philip Hartmann
  • Patent number: 8647491
    Abstract: An aqueous cyanide-free electrolyte bath for plating of tin alloy layers on substrate surfaces comprising (i) a tin ion source and a source for another alloy element, characterized in that it further contains (ii) N-methyl pyrrolidone is described.
    Type: Grant
    Filed: February 5, 2009
    Date of Patent: February 11, 2014
    Assignee: Atotech Deutschland GmbH
    Inventors: Philip Hartmann, Lars Kohlmann, Heiko Brunner, Klaus-Dieter Schulz
  • Publication number: 20120052319
    Abstract: The present invention is to provide a chrome-plated part having a corrosion resistance in normal and specific circumstances and not requiring additional treatments after chrome plating, and to provide a manufacturing method of such a chrome plated part. The chrome -plated part 1 includes: a substrate 2; a bright nickel plating layer 5b formed over the substrate 2; a noble potential nickel plating layer 5a formed on the bright nickel plating layer 5b. An electric potential difference between the bright nickel plating layer 5b and the noble potential nickel plating layer 5a is within a range from 40 mV to 150 mV. The chrome-plated part 1 further includes: a trivalent chrome plating layer 6 formed on the noble potential nickel plating layer 5a and having at least any one of a microporous structure and a microcrack structure.
    Type: Application
    Filed: February 13, 2009
    Publication date: March 1, 2012
    Applicants: ATOTECH DEUTSCHLAND GMBH, NISSAN MOTOR CO., LTD.
    Inventors: Soichiro Sugawara, Hiroshi Sakai, Philip Hartmann
  • Patent number: 8114263
    Abstract: The invention relates to a polyvinylammonium compound, to a method of manufacturing said compound, to an aqueous acidic solution containing at least said Polyvinylammonium compound for electrolytically depositing a copper deposit as well as to a method of electrolytically depositing a copper deposit using said aqueous acidic solution, said polyinylammonium compound corresponding to the general chemical formula (1): as well as to polyvinylammonium compounds of the general chemical formula (1), wherein one of the monomer units or both having indices I and m are present in the neutral form.
    Type: Grant
    Filed: March 1, 2006
    Date of Patent: February 14, 2012
    Assignee: Atotech Deutschland GmbH
    Inventors: Wolfgang Dahms, Udo Grieser, Olanda Grieser, legal representative, Christopher Grieser, legal representative, Philip Hartmann
  • Publication number: 20110215003
    Abstract: For fast and secure determination of the quality of a metal coating as well as of an electrolyte for depositing a metal, in particular for electrolytic deposition of nickel such as of semi-gloss nickel and bright nickel and for analytical control of the deposition electrolyte, a method of inspecting a metal coating is provided, which involves the following method steps: a) depositing the metal coating from a deposition electrolyte onto a working electrode; b) electrolytically dissolving the metal coating through anodic polarisation of the working electrode with respect to a counter electrode, which is in electrolytic contact with the working electrode; c) recording an electrical dissolution potential at the working electrode over time, said potential occurring during a dissolution of the metal coating; and d) determining a time-averaged vale of the dissolution potential.
    Type: Application
    Filed: October 26, 2009
    Publication date: September 8, 2011
    Applicant: ATOTECH DEUTSCHLAND GMBH
    Inventors: Philip Hartmann, Michael Jonat, Mathias Wuensche
  • Publication number: 20100326838
    Abstract: A pyrophosphate-containing bath for the cyanide-free deposition of copper alloys on substrate surfaces, comprising a reaction product of a secondary monoamine with a diglycidyl ether, is described. The electrolyte bath is suitable for the galvanic deposition of glossy white, even and uniform copper-tin alloy coatings.
    Type: Application
    Filed: May 29, 2009
    Publication date: December 30, 2010
    Applicant: ATOTECH DEUTSCHLAND GMBH
    Inventors: Philip Hartmann, Klaus-Dieter Schulz, Lars Kohlmann, Heiko Brunner
  • Publication number: 20100300890
    Abstract: An aqueous cyanide-free electrolyte bath for plating of tin alloy layers on substrate surfaces comprising (i) a tin ion source and a source for another alloy element, characterised in that it further contains (ii) N-methyl pyrrolidone is described.
    Type: Application
    Filed: February 5, 2009
    Publication date: December 2, 2010
    Applicant: ATOTECH DEUTSCHLAND GMBH
    Inventors: Philip Hartmann, Lars Kohlmann, Heiko Brunner, Klaus-Dieter Schulz
  • Publication number: 20080210569
    Abstract: The invention relates to a polyvinylammonium compound, to a method of manufacturing said compound, to an aqueous acidic solution containing at least said Polyvinylammonium compound for electrolytically depositing a copper deposit as well as to a method of electrolytically depositing a copper deposit using said aqueous acidic solution, said polyinylammonium compound corresponding to the general chemical formula (1): as well as to polyvinylammonium compounds of the general chemical formula (1), wherein one of the monomer units or both having indices l and m are present in the neutral form.
    Type: Application
    Filed: March 1, 2006
    Publication date: September 4, 2008
    Inventors: Wolfgang Dahms, Udo Grieser, Olanda Grieser, Christopher Grieser, Philip Hartmann