Abstract: A system for insert detection includes a sensor and a processor. The processor is configured to receive capacitance measurement associated with the sensor and determine presence or absence of an insert based at least in part on the capacitance measurement and a threshold.

Abstract: In one embodiment, a manufacturing process is optimized by enabling a user to specify a product to be manufactured, enabling the user to specify a manufacturing system for manufacturing the product, enabling the user to select parameters for the product and the manufacturing system, and automatically calculating manufacturing metrics for the manufacturing process based upon the user-specified models and user selections.

Abstract: A gradient-index lens for directing incident electromagnetic radiation comprises at least one substrate having a plurality of micro-features (e.g., trenches or holes) that may be arranged in a pattern of varied size and/or spacing. Each of the micro-features has at least one dimension that is less than a wavelength of the electromagnetic radiation. The spacing between adjacent micro-features is less than the wavelength of the electromagnetic radiation, and the size and spacing of the micro-features are sufficient to produce an effective refractive index profile of the lens that is graded.

Abstract: A gradient-index lens for directing incident electromagnetic radiation comprises at least one substrate having a plurality of micro-features (e.g., trenches or holes) that may be arranged in a pattern of varied size and/or spacing. Each of the micro-features has at least one dimension that is less than a wavelength of the electromagnetic radiation. The spacing between adjacent micro-features is less than the wavelength of the electromagnetic radiation, and the size and spacing of the micro-features are sufficient to produce an effective refractive index profile of the lens that is graded.

Abstract: A system for determining a material property is disclosed. In some embodiments, a method for determining a material property comprises receiving a set of material responses corresponding to a set of ultrasonic excitations. The set of material responses are determined using measurements to determine a peak response for each of the set of ultrasonic excitations. In some embodiments, a device for making non-destructive in-situ measurements of the elastic yield strength of a sample (e.g., a steel plate or pipeline wall) is disclosed. The device determines the yield strength of a specimen based on transducing ultrasonic waves within the medium and correlating quantifiable characteristics of the resulting frequency response to the intrinsic elastic nonlinearity of the material. In various embodiments, the device includes one or more electrodes, an acoustic termination, a horn, a flange, a collar, power electronics, signal processors, a memory, a user interface, or any other appropriate device component.

Abstract: A gradient-index lens for directing incident electromagnetic radiation comprises at least one substrate having a plurality of micro-features (e.g., trenches or holes) that may be arranged in a pattern of varied size and/or spacing. Each of the micro-features has at least one dimension that is less than a wavelength of the electromagnetic radiation. The spacing between adjacent micro-features is less than the wavelength of the electromagnetic radiation, and the size and spacing of the micro-features are sufficient to produce an effective refractive index profile of the lens that is graded. A thermal imaging device incorporating a gradient-index lens is also provided.

Abstract: A gradient-index lens for focusing incident electromagnetic radiation comprises at least first and second substrates. Each of the substrates has a plurality of trenches or holes formed therein. The first substrate is stacked on the second substrate such that trenches or holes in the first substrate are substantially aligned with corresponding trenches or holes in the second substrate to form combined trenches or holes. Each of the combined trenches or holes has a width or diameter that is less than a wavelength of the electromagnetic radiation, and the spacing between adjacent ones of the combined trenches or holes is less than the wavelength of the electromagnetic radiation. The size and spacing of the combined trenches or holes in the stacked substrates are sufficient to produce an effective refractive index profile of the lens element that is graded. A method for producing the lens is also provided.

Abstract: An imaging device comprises a focal plane array (FPA) having a plurality of singulated unit cells arranged on a carrier substrate. Each of the unit cells comprises a sub-array of pixels in the focal plane array. At least one of the unit cells has a different number or type of pixels than does another one of the unit cells arranged on the carrier substrate to enable multi-spectral imaging. The device also includes at least one lens positioned to direct incident electromagnetic radiation to the unit cells. A modular method for producing the FPA and lenses of a camera core uses wafer-level packaging and optics. Lenses and sub-arrays of pixels are each fabricated on densely packed, batch-fabricated wafers, and subsequently singulated and assembled into arrays on respective low cost carrier substrates. The carrier substrates are bonded together at the substrate level to form a series of camera cores, and the stacked substrates are singulated to form individual camera cores.

Abstract: A thermal imaging device comprises a focal plane array disposed on a focal plane substrate. The focal plane array comprises a plurality of pixels grouped into sub-arrays of pixels. The device also comprises a lens array comprising a plurality of lenslets. Each of the lenslets is arranged to focus infrared rays on a respective one of the sub-arrays of pixels. The focal plane array is enclosed in a vacuum in a space between the lens array and the focal plane substrate, and a readout circuit is electrically connected to the pixels. The thermal imaging device has a small form factor and low cost while maintaining adequate performance, enabling expanded usage of thermal imaging (e.g., in security, surveillance, first responder, defense and/or automotive applications).

Abstract: A gradient-index lens for focusing incident electromagnetic radiation comprises at least first and second substrates. Each of the substrates has a plurality of trenches or holes formed therein. The first substrate is stacked on the second substrate such that trenches or holes in the first substrate are substantially aligned with corresponding trenches or holes in the second substrate to form combined trenches or holes. Each of the combined trenches or holes has a width or diameter that is less than a wavelength of the electromagnetic radiation, and the spacing between adjacent ones of the combined trenches or holes is less than the wavelength of the electromagnetic radiation. The size and spacing of the combined trenches or holes in the stacked substrates are sufficient to produce an effective refractive index profile of the lens element that is graded. A method for producing the lens is also provided.

Abstract: A gradient-index lens for directing incident electromagnetic radiation comprises at least one substrate having a plurality of micro-features (e.g., trenches or holes) that may be arranged in a pattern of varied size and/or spacing. Each of the micro-features has at least one dimension that is less than a wavelength of the electromagnetic radiation. The spacing between adjacent micro-features is less than the wavelength of the electromagnetic radiation, and the size and spacing of the micro-features are sufficient to produce an effective refractive index profile of the lens that is graded. A thermal imaging device incorporating a gradient-index lens is also provided.

Abstract: A contour mode micromechanical piezoelectric resonator. The resonator has a bottom electrode; a top electrode; and a piezoelectric layer disposed between the bottom electrode and the top electrode. The piezoelectric resonator has a planar surface with a cantilevered periphery, dimensioned to undergo in-plane lateral displacement at the periphery. The resonator also includes means for applying an alternating electric field across the thickness of the piezoelectric resonator. The electric field is configured to cause the resonator to have a contour mode in-plane lateral displacement that is substantially in the plane of the planar surface of the resonator, wherein the fundamental frequency for the displacement of the piezoelectric resonator is set in part lithographically by the planar dimension of the bottom electrode, the top electrode or the piezoelectric layer.

Abstract: An imaging device comprises a focal plane array (FPA) having a plurality of singulated unit cells arranged on a carrier substrate. Each of the unit cells comprises a sub-array of pixels in the focal plane array. At least one of the unit cells has a different number or type of pixels than does another one of the unit cells arranged on the carrier substrate to enable multi-spectral imaging. The device also includes at least one lens positioned to direct incident electromagnetic radiation to the unit cells. A modular method for producing the FPA and lenses of a camera core uses wafer-level packaging and optics. Lenses and sub-arrays of pixels are each fabricated on densely packed, batch-fabricated wafers, and subsequently singulated and assembled into arrays (e.g., 3×3, 4×4, 4×5) on respective low cost carrier substrates. The carrier substrates are bonded together at the substrate level to form a series of camera cores, and the stacked substrates are singulated to form individual camera cores.

Abstract: A contour mode micromechanical piezoelectric resonator. The resonator has a bottom electrode; a top electrode; and a piezoelectric layer disposed between the bottom electrode and the top electrode. The piezoelectric resonator has a planar surface with a cantilevered periphery, dimensioned to undergo in-plane lateral displacement at the periphery. The resonator also includes means for applying an alternating electric field across the thickness of the piezoelectric resonator. The electric field is configured to cause the resonator to have a contour mode in-plane lateral displacement that is substantially in the plane of the planar surface of the resonator, wherein the fundamental frequency for the displacement of the piezoelectric resonator is set in part lithographically by the planar dimension of the bottom electrode, the top electrode or the piezoelectric layer.

Abstract: A piezoelectric resonator device includes: a top electrode layer with a patterned structure, a top piezoelectric layer adjacent to the top layer, a middle metal layer adjacent to the top piezoelectric layer opposite the top layer, a bottom piezoelectric layer adjacent to the middle layer opposite the top piezoelectric layer, and a bottom electrode layer with a patterned structure and adjacent to the bottom piezoelectric layer opposite the middle layer. The top layer includes a first plurality of electrodes inter-digitated with a second plurality of electrodes. A first one of the electrodes in the top layer and a first one of the electrodes in the bottom layer are coupled to a first contact, and a second one of the electrodes in the top layer and a second one of the electrodes in the bottom layer are coupled to a second contact.

Abstract: A contour mode micromechanical piezoelectric resonator. The resonator has a bottom electrode; a top electrode; and a piezoelectric layer disposed between the bottom electrode and the top electrode. The piezoelectric resonator has a planar surface with a cantilevered periphery, dimensioned to undergo in-plane lateral displacement at the periphery. The resonator also includes means for applying an alternating electric field across the thickness of the piezoelectric resonator. The electric field is configured to cause the resonator to have a contour mode in-plane lateral displacement that is substantially in the plane of the planar surface of the resonator, wherein the fundamental frequency for the displacement of the piezoelectric resonator is set in part lithographically by the planar dimension of the bottom electrode, the top electrode or the piezoelectric layer.

Abstract: A piezoelectric resonator device comprises five layers. A first layer and a fifth layer include one or more metal electrodes. A second layer and a fourth layer comprise a piezoelectric material. A third layer comprises a metal layer. In a first area of the first layer the first layer metal electrodes include a first layer periodic structure along one dimension comprising one of the one or more first layer metal electrodes and a space with no first layer metal electrodes. In a second area of the fifth layer the fifth layer metal electrodes include a fifth layer periodic structure along the one dimension comprising one of the one or more fifth layer metal electrodes and a space with no fifth layer metal electrodes.

Abstract: This disclosure provides implementations of electromechanical systems resonator structures, devices, apparatus, systems, and related processes. In one aspect, a sacrificial layer is deposited on an insulating substrate. A lower electrode layer is formed proximate the sacrificial layer. A piezoelectric layer is deposited on the lower electrode layer. An upper electrode layer is formed on the piezoelectric layer. At least a portion of the sacrificial layer is removed to define a cavity such that at least a portion of the lower electrode layer is spaced apart from the insulating substrate.

Abstract: A contour mode micromechanical piezoelectric resonator. The resonator has a bottom electrode; a top electrode; and a piezoelectric layer disposed between the bottom electrode and the top electrode. The piezoelectric resonator has a planar surface with a cantilevered periphery, dimensioned to undergo in-plane lateral displacement at the periphery. The resonator also includes means for applying an alternating electric field across the thickness of the piezoelectric resonator. The electric field is configured to cause the resonator to have a contour mode in-plane lateral displacement that is substantially in the plane of the planar surface of the resonator, wherein the fundamental frequency for the displacement of the piezoelectric resonator is set in part lithographically by the planar dimension of the bottom electrode, the top electrode or the piezoelectric layer.

Abstract: A contour mode micromechanical piezoelectric resonator. The resonator has a bottom electrode; a top electrode; and a piezoelectric layer disposed between the bottom electrode and the top electrode. The piezoelectric resonator has a planar surface with a cantilevered periphery, dimensioned to undergo in-plane lateral displacement at the periphery. The resonator also includes means for applying an alternating electric field across the thickness of the piezoelectric resonator. The electric field is configured to cause the resonator to have a contour mode in-plane lateral displacement that is substantially in the plane of the planar surface of the resonator, wherein the fundamental frequency for the displacement of the piezoelectric resonator is set in part lithographically by the planar dimension of the bottom electrode, the top electrode or the piezoelectric layer.