Patents by Inventor Philip M. Conklin

Philip M. Conklin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SEED LASER SYSTEM FOR RADIATION SOURCE
    Publication number: 20230143962
    Abstract: Systems, apparatuses, and methods are provided for dual-pass amplification of laser beams along a common beam path. An example method can include generating a first laser beam and a second laser beam. Subsequently, the example method can include performing dual-pass amplification of the first laser beam and the second laser beam along a common beam path. In some aspects, the first laser beam can include a first wavelength, the second laser beam can include a second wavelength different from the first wavelength.
    Type: Application
    Filed: March 10, 2021
    Publication date: May 11, 2023
    Inventors: Rostislav Rokitski, Philip M. Conklin, Cory Alan Stinson, Alexander Anthony Schafgans, Christoffel Johannes Liebenberg
  • Reducing an optical power of a reflected light beam
    Patent number: 10606096
    Abstract: A system for an extreme ultraviolet (EUV) light source includes a light-generation system configured to emit one or more light beams onto a beam path; one or more optical amplifiers, each of the one or more amplifiers including a gain medium on the beam path, each gain medium being configured to amplify the one or more light beams to produce one or more amplified light beams; and one or more diffractive optical elements on the beam path, where each of the one or more diffractive optical elements has a plurality of focal lengths, and each focal length of the diffractive optical element is associated with a particular polarization state.
    Type: Grant
    Filed: February 22, 2018
    Date of Patent: March 31, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Cory Alan Stinson, Philip M. Conklin
  • REDUCING AN OPTICAL POWER OF A REFLECTED LIGHT BEAM
    Publication number: 20180246338
    Abstract: A system for an extreme ultraviolet (EUV) light source includes a light-generation system configured to emit one or more light beams onto a beam path; one or more optical amplifiers, each of the one or more amplifiers including a gain medium on the beam path, each gain medium being configured to amplify the one or more light beams to produce one or more amplified light beams; and one or more diffractive optical elements on the beam path, where each of the one or more diffractive optical elements has a plurality of focal lengths, and each focal length of the diffractive optical element is associated with a particular polarization state.
    Type: Application
    Filed: February 22, 2018
    Publication date: August 30, 2018
    Inventors: Cory Alan Stinson, Philip M. Conklin
  • Reducing an optical power of a reflected light beam
    Patent number: 9904068
    Abstract: A system for an extreme ultraviolet (EUV) light source includes a light-generation system configured to emit one or more light beams onto a beam path; one or more optical amplifiers, each of the one or more amplifiers including a gain medium on the beam path, each gain medium being configured to amplify the one or more light beams to produce one or more amplified light beams; and one or more diffractive optical elements on the beam path, where each of the one or more diffractive optical elements has a plurality of focal lengths, and each focal length of the diffractive optical element is associated with a particular polarization state.
    Type: Grant
    Filed: January 9, 2017
    Date of Patent: February 27, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Cory Alan Stinson, Philip M. Conklin