Patents by Inventor Philip M. Kemp

Philip M. Kemp has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ion exchange removal of metal ions from wastewater
    Patent number: 6818129
    Abstract: A novel process and apparatus are disclosed for cleaning wastewater containing metal ions in solution, hydrogen peroxide, and high solids, e.g., greater than about 50 mg/l particulate solids. A carbon adsorption column removes hydrogen peroxide in the wastewater feed containing high solids. A ion exchange unit removes the metal ions from solution. The process and apparatus remove metal ions such as copper from a high solids byproduct polishing slurry from the chemical mechanical polishing (CMP) of integrated circuit microchips to form an environmentally clean wastewater discharge.
    Type: Grant
    Filed: December 14, 2001
    Date of Patent: November 16, 2004
    Assignee: USFilter Corporation
    Inventors: Philip M. Kemp, James L. Filson, Stanley R. Kaars, Frank L. Sassaman, Jr.
  • Ion exchange removal of metal ions from wastewater
    Publication number: 20020104803
    Abstract: A novel process and apparatus are disclosed for cleaning wastewater containing metal ions in solution, hydrogen peroxide, and high solids, e.g., greater than about 50 mg/l particulate solids. A carbon adsorption column removes hydrogen peroxide in the wastewater feed containing high solids. A ion exchange unit removes the metal ions from solution. The process and apparatus remove metal ions such as copper from a high solids byproduct polishing slurry from the chemical mechanical polishing (CMP) of integrated circuit microchips to form an environmentally clean wastewater discharge.
    Type: Application
    Filed: December 14, 2001
    Publication date: August 8, 2002
    Inventors: James L. Filson, Philip M. Kemp, Stanley R. Kaars, Frank L. Sassaman
  • Removing metal ions from wastewater
    Publication number: 20020079269
    Abstract: A novel process and apparatus are disclosed for cleaning wastewater containing metal ions in solution, hydrogen peroxide, and high solids, e.g., greater than about 50 mg/l particulate solids. A carbon adsorption column removes hydrogen peroxide in the wastewater feed containing high solids. A chemical precipitation unit removes the metal ions from solution. The process and apparatus remove metal ions such as copper from a high solids byproduct polishing slurry from the chemical mechanical polishing (CMP) of integrated circuit microchips to form an environmentally clean wastewater discharge.
    Type: Application
    Filed: October 31, 2001
    Publication date: June 27, 2002
    Inventors: Frank L. Sassaman, James L. Filson, Philip M. Kemp
  • Ion exchange removal of metal ions from wastewater
    Patent number: 6346195
    Abstract: A novel process and apparatus are disclosed for cleaning wastewater containing metal ions in solution, hydrogen peroxide, and high solids, e.g., greater than about 50 mg/l particulate solids. A carbon adsorption column removes hydrogen peroxide in the wastewater feed containing high solids. A ion exchange unit removes the metal ions from solution. The process and apparatus remove metal ions such as copper from a high solids byproduct polishing slurry from the chemical mechanical polishing (CMP) of integrated circuit microchips to form an environmentally clean wastewater discharge.
    Type: Grant
    Filed: July 10, 1998
    Date of Patent: February 12, 2002
    Assignee: U.S. Filter Corporation
    Inventors: James L. Filson, Philip M. Kemp, Stanley R. Kaars, Frank L. Sassaman, Jr.
  • Removing metal ions from wastewater
    Patent number: 6315906
    Abstract: A novel process and apparatus are disclosed for cleaning wastewater containing metal ions in solution, hydrogen peroxide, and high solids, e.g., greater than about 50 mg/l particulate solids. A carbon adsorption column removes hydrogen peroxide in the wastewater feed containing high solids. A chemical precipitation unit removes the metal ions from solution. The process and apparatus remove metal ions such as copper from a high solids byproduct polishing slurry from the chemical mechanical polishing (CMP) of integrated circuit microchips to form an environmentally clean wastewater discharge.
    Type: Grant
    Filed: July 10, 1998
    Date of Patent: November 13, 2001
    Assignee: United States Filter Corporation
    Inventors: Frank L. Sassaman, Jr., James L. Filson, Philip M. Kemp