Patents by Inventor Philip Ryan Barros

Philip Ryan Barros has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250132170
    Abstract: Systems for processing articles are essential for semiconductor fabrication. These systems employ a variety of apparatuses for controlling flow. In one implementation, an apparatus for controlling flow may utilize a body having a flow path extending from an inlet to an outlet. A valve, a flow restrictor, and a pressure sensor are operably coupled to the flow path. The valve incorporates first and second actuators which enable control of mass flow rates of fluid flowing through the flow path.
    Type: Application
    Filed: October 14, 2024
    Publication date: April 24, 2025
    Applicant: Ichor Systems, Inc.
    Inventors: Philip Ryan Barros, Greg Patrick Mulligan, Christopher Bryant Davis, Randolph Treur, Gary Lei Xing, Todd Mark Cushman
  • Publication number: 20250003537
    Abstract: Fluid delivery systems are important component assemblies used for semiconductor fabrication. These fluid delivery systems rely on assemblies of components, requiring seals which must be installed and replaced during assembly and maintenance of the fluid delivery systems. Seals may be arranged as seal rings which engage substrate blocks and active components. The seal rings may incorporate an interior sleeve and an outer ring, the interior sleeve having a sleeve fluid passageway. In some implementations, the sleeve fluid passageway may have a constant or varying diameter and the outer ring may incorporate features to improve seal retention within seal cavities in the substrate blocks and active components.
    Type: Application
    Filed: June 25, 2024
    Publication date: January 2, 2025
    Inventors: Randolph Treur, Philip ryan Barros, Stephen Carson, Michael Vogtmann, Haruyuki Kubota
  • Publication number: 20240363369
    Abstract: Systems for manufacturing semiconductors are essential to enabling modern technologies. Such systems may include a central controller, a plurality of fluid supplies, a plurality of apparatus for controlling flow, and a processing chamber. The central controller may have a processor, a memory, and a communication module. The plurality of apparatus for controlling flow may have a device controller having an active component, a sensor, and a communication module. The communication may have a communication module, a memory, a sensor drive circuit operably coupled to the sensor, and an active component drive operably coupled to the active component. The central controller is configured to receive sensor data from the sensors of the plurality of apparatus for controlling flow and transmit active component commands to the active component drives of the device controllers to control the plurality of apparatus for controlling flow.
    Type: Application
    Filed: April 23, 2024
    Publication date: October 31, 2024
    Inventors: Philip Ryan Barros, Greg Patrick Mulligan, Sean Joseph Penley, Christopher Bryant Davis
  • Patent number: 11899477
    Abstract: Systems for processing articles are essential for semiconductor fabrication. In one embodiment, a system is disclosed comprising a plurality of fluid supplies configured to supply process fluids, a plurality of apparatuses for controlling flow, a plurality of mounting substrates, a vacuum manifold fluidly coupled to the plurality of mounting substrates, an outlet manifold fluidly coupled to the plurality of mounting substrates, a vacuum source fluidly coupled to the vacuum manifold, and a processing chamber fluidly coupled to the outlet manifold. The plurality of apparatuses for controlling flow have a bleed port and an outlet. The outlets of the plurality of apparatuses are fluidly coupled to corresponding outlet ports of the plurality of mounting substrates. The bleed ports of the plurality of apparatuses are fluidly coupled to the corresponding vacuum ports of the plurality of mounting substrates.
    Type: Grant
    Filed: February 14, 2022
    Date of Patent: February 13, 2024
    Inventors: Philip Ryan Barros, Greg Patrick Mulligan
  • Publication number: 20230317471
    Abstract: An improved fluid delivery system and method that directly controls the concentration of constituent components in a fluid mixture delivered, for example, to a process chamber. Pressure of the fluid mixture can also be directly controlled. A concentration sensor capable of measuring concentration of all of the constituent components in a fluid mixture is used to provide signals used to vary the flow rate of constituent gases under a closed loop feedback system. The signal output of one or more pressure sensors can also be used to provide a signal used to vary the flow rate of constituent gases under a closed loop feedback system. By directly controlling these two extremely important process variables, embodiments of the present invention provide a significant advantage in measurement accuracy over the prior art, enable real-time process control, reduce system level response time, and allow for a system with a significant footprint reduction.
    Type: Application
    Filed: May 9, 2023
    Publication date: October 5, 2023
    Inventors: Philip Ryan Barros, Greg Patrick Mulligan, Chris Melcer
  • Patent number: 11682565
    Abstract: An improved fluid delivery system and method that directly controls the concentration of constituent components in a fluid mixture delivered, for example, to a process chamber. Pressure of the fluid mixture can also be directly controlled. A concentration sensor capable of measuring concentration of all of the constituent components in a fluid mixture is used to provide signals used to vary the flow rate of constituent gases under a closed loop feedback system. The signal output of one or more pressure sensors can also be used to provide a signal used to vary the flow rate of constituent gases under a closed loop feedback system. By directly controlling these two extremely important process variables, embodiments of the present invention provide a significant advantage in measurement accuracy over the prior art, enable real-time process control, reduce system level response time, and allow for a system with a significant footprint reduction.
    Type: Grant
    Filed: August 4, 2021
    Date of Patent: June 20, 2023
    Inventors: Philip Ryan Barros, Greg Patrick Mulligan, Chris Melcer
  • Publication number: 20230029366
    Abstract: Apparatuses for controlling fluid flow are important components for delivering process fluids for semiconductor fabrication. These apparatuses for controlling fluid flow require a variety of fluid flow components which are tightly packaged within the apparatuses for controlling flow. In an effort to improve packaging density, fluid delivery modules preferably incorporate both active and passive components into a single substrate block. This enables increases in packaging density as well as enabling reduced cost through greater simplification of the fluid delivery module. For instance, incorporating a filter to filter incoming fluid with a valve or other component in a single monolithic block avoids the need for separate components which add cost and complexity.
    Type: Application
    Filed: July 15, 2022
    Publication date: January 26, 2023
    Inventors: Philip Ryan Barros, Greg Patrick Mulligan, Dustin Tomhave, Christopher Bryant Davis
  • Publication number: 20220283596
    Abstract: Systems for processing articles are essential for semiconductor fabrication. In one embodiment, a system is disclosed comprising a plurality of fluid supplies configured to supply process fluids, a plurality of apparatuses for controlling flow, a plurality of mounting substrates, a vacuum manifold fluidly coupled to the plurality of mounting substrates, an outlet manifold fluidly coupled to the plurality of mounting substrates, a vacuum source fluidly coupled to the vacuum manifold, and a processing chamber fluidly coupled to the outlet manifold. The plurality of apparatuses for controlling flow have a bleed port and an outlet. The outlets of the plurality of apparatuses are fluidly coupled to corresponding outlet ports of the plurality of mounting substrates. The bleed ports of the plurality of apparatuses are fluidly coupled to the corresponding vacuum ports of the plurality of mounting substrates.
    Type: Application
    Filed: February 14, 2022
    Publication date: September 8, 2022
    Inventors: Philip Ryan Barros, Greg Patrick Mulligan
  • Publication number: 20210366735
    Abstract: An improved fluid delivery system and method that directly controls the concentration of constituent components in a fluid mixture delivered, for example, to a process chamber. Pressure of the fluid mixture can also be directly controlled. A concentration sensor capable of measuring concentration of all of the constituent components in a fluid mixture is used to provide signals used to vary the flow rate of constituent gases under a closed loop feedback system. The signal output of one or more pressure sensors can also be used to provide a signal used to vary the flow rate of constituent gases under a closed loop feedback system. By directly controlling these two extremely important process variables, embodiments of the present invention provide a significant advantage in measurement accuracy over the prior art, enable real-time process control, reduce system level response time, and allow for a system with a significant footprint reduction.
    Type: Application
    Filed: August 4, 2021
    Publication date: November 25, 2021
    Inventors: Philip Ryan Barros, Greg Patrick Mulligan, Chris Melcer
  • Patent number: 11158522
    Abstract: A fluid delivery system may include a substrate block having an upper surface; a first substrate port in the upper surface; a second substrate port in the upper surface; a substrate fluid passageway extending between the first substrate port and the second substrate port; a substrate ring defining the second substrate port; and a substrate seal channel formed in the upper surface and surrounding the substrate ring. An outer surface of the substrate ring may form an inner surface of the substrate seal channel. An active component may be selected from a flow controller, a pressure transducer, a flow measurement sensor, a pressure regulator, a valve, and a flow meter. The active component may comprise a lower surface; a first component port in the lower surface; a component fluid passageway; a component ring; and a component seal channel formed in the lower surface and surrounding the component ring.
    Type: Grant
    Filed: March 10, 2021
    Date of Patent: October 26, 2021
    Inventors: Chris Melcer, Philip Ryan Barros, Haruyuki Kubota, Randolph Treur, Todd Cushman
  • Patent number: 11094563
    Abstract: An improved fluid delivery system and method that directly controls the concentration of constituent components in a fluid mixture delivered, for example, to a process chamber. Pressure of the fluid mixture can also be directly controlled. A concentration sensor capable of measuring concentration of all of the constituent components in a fluid mixture is used to provide signals used to vary the flow rate of constituent gases under a closed loop feedback system. The signal output of one or more pressure sensors can also be used to provide a signal used to vary the flow rate of constituent gases under a closed loop feedback system. By directly controlling these two extremely important process variables, embodiments of the present invention provide a significant advantage in measurement accuracy over the prior art, enable real-time process control, reduce system level response time, and allow for a system with a significant footprint reduction.
    Type: Grant
    Filed: February 19, 2018
    Date of Patent: August 17, 2021
    Inventors: Philip Ryan Barros, Greg Patrick Mulligan, Chris Melcer
  • Publication number: 20180286705
    Abstract: An improved fluid delivery system and method that directly controls the concentration of constituent components in a fluid mixture delivered, for example, to a process chamber. Pressure of the fluid mixture can also be directly controlled. A concentration sensor capable of measuring concentration of all of the constituent components in a fluid mixture is used to provide signals used to vary the flow rate of constituent gases under a closed loop feedback system. The signal output of one or more pressure sensors can also be used to provide a signal used to vary the flow rate of constituent gases under a closed loop feedback system. By directly controlling these two extremely important process variables, embodiments of the present invention provide a significant advantage in measurement accuracy over the prior art, enable real-time process control, reduce system level response time, and allow for a system with a significant footprint reduction.
    Type: Application
    Filed: February 19, 2018
    Publication date: October 4, 2018
    Inventors: Philip Ryan Barros, Greg Patrick Mulligan, Chris Melcer, Hong Peng, Chris Ellec
  • Publication number: 20080302426
    Abstract: A system for enabling a distribution of fluids includes a backplane and at least two component bases. Each component base has a first flange segment on one side and a second flange segment on an opposite side. Each of the first flange segment and the second flange segment has through holes formed therein. Fasteners secure the two component bases to the backplane. The fasteners extending through the through holes formed in the first flange segment of a first component base and through holes formed in the second flange segment of a second component base and into the backplane. Methods of assembling a distribution system are further provided.
    Type: Application
    Filed: June 6, 2007
    Publication date: December 11, 2008
    Inventors: Greg Patrick Mulligan, Philip Ryan Barros, Joshua David Anderson