Patents by Inventor Philip Salzman

Philip Salzman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6475335
    Abstract: An RF plasma reactor for processing a semiconductor wafer in a reactor chamber with a multi-radius dome-shaped ceiling and a gas inlet for supplying a process gas into the chamber includes an overhead RF signal applicator near the ceiling for applying an RF signal into the chamber through the ceiling to maintain a plasma of the process gas in the chamber, the plasma having a radial ion density distribution near the plane of the pedestal which is center-high for a greater height of the ceiling above the pedestal and is center-low for a lesser height, the height of the ceiling being intermediate the greater and lesser heights such that the radial ion density distribution is neither center-high nor center-low.
    Type: Grant
    Filed: September 8, 2000
    Date of Patent: November 5, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Gerald Yin, Diana Xiabing Ma, Peter Loewenhardt, Philip Salzman, Allen Zhao, Hiroji Hanawa
  • Patent number: 6270617
    Abstract: An RF plasma reactor for processing a semiconductor wafer in a reactor chamber with a multi-radius dome-shaped ceiling and a gas inlet for supplying a process gas into the chamber includes an overhead RF signal applicator near the ceiling for applying an RF signal into the chamber through the ceiling to maintain a plasma of the process gas in the chamber, the plasma having a radial ion density distribution near the plane of the pedestal which is center-high for a greater height of the ceiling above the pedestal and is center-low for a lesser height, the height of the ceiling being intermediate the greater and lesser heights such that the radial ion density distribution is neither center-high nor center-low.
    Type: Grant
    Filed: January 2, 1997
    Date of Patent: August 7, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Gerald Yin, Diana Xiabing Ma, Peter Loewenhardt, Philip Salzman, Allen Zhao, Hiroji Hanawa