Patents by Inventor Philipp Bosselmann

Philipp Bosselmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • EUV illumination system with a system for measuring fluctuations of the light source
    Patent number: 8513628
    Abstract: The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.
    Type: Grant
    Filed: December 15, 2010
    Date of Patent: August 20, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Axel Scholz, Markus Weiss, Manfred Maul, Philipp Bosselmann
  • EUV ILLUMINATION SYSTEM WITH A SYSTEM FOR MEASURING FLUCTUATIONS OF THE LIGHT SOURCE
    Publication number: 20110079737
    Abstract: The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.
    Type: Application
    Filed: December 15, 2010
    Publication date: April 7, 2011
    Applicant: CARL ZEISS SMT AG
    Inventors: Axel Scholz, Markus Weiss, Manfred Maul, Philipp Bosselmann
  • EUV illumination system with a system for measuring fluctuations of the light source
    Patent number: 7875865
    Abstract: The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.
    Type: Grant
    Filed: April 7, 2008
    Date of Patent: January 25, 2011
    Assignee: Carl Zeiss SMT AG
    Inventors: Axel Scholz, Markus Weiss, Manfred Maul, Philipp Bosselmann
  • Illumination system for a wavelength of ? 193 nm, with sensors for determining an illumination
    Patent number: 7473907
    Abstract: There is provided an illumination system that includes (a) a light source that emits light having a wavelength ?193 nm, where the light provides a predetermined illumination in a plane distant from the light source and defines a used area in the plane, and (b) a sensor, situated in or near the plane, for detecting light outside the used area.
    Type: Grant
    Filed: March 28, 2005
    Date of Patent: January 6, 2009
    Assignees: Carl Zeiss SMT AG, ASML Netherlands
    Inventors: Wolfgang Singer, Martin Antoni, Johannes Wangler, Markus Weiss, Vadim Yevgenyevich Banine, Marcel Dierichs, Roel Moors, Karl Heinz Schuster, Axel Scholz, Philipp Bosselmann, Bernd Warm
  • EUV ILLUMINATION SYSTEM WITH A SYSTEM FOR MEASURING FLUCTUATIONS OF THE LIGHT SOURCE
    Publication number: 20080258070
    Abstract: The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.
    Type: Application
    Filed: April 7, 2008
    Publication date: October 23, 2008
    Applicant: CARL ZEISS SMT AG
    Inventors: Axel Scholz, Markus Weiss, Manfred Maul, Philipp Bosselmann
  • Illumination system for a wavelength of less than or equal to 193 nm, with sensors for determining an illumination
    Publication number: 20050274897
    Abstract: There is provided an illumination system that includes (a) a light source that emits light having a wavelength ?193 nm, where the light provides a predetermined illumination in a plane distant from the light source and defines a used area in the plane, and (b) a sensor, situated in or near the plane, for detecting light outside the used area.
    Type: Application
    Filed: March 28, 2005
    Publication date: December 15, 2005
    Inventors: Wolfgang Singer, Martin Antoni, Johannes Wangler, Markus Weiss, Vadim Banine, Marcel Dierichs, Roel Moors, Karl Schuster, Axel Scholz, Philipp Bosselmann, Bernd Warm