Patents by Inventor Philipp KOSCHKER

Philipp KOSCHKER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230416252
    Abstract: The present application generally relates to several processes for the preparation of (6R,10S)-10-{4-[5-chloro-2-(4-chloro-1H-1,2,3-triazol-1-yl)phenyl]-6-oxo-1(6H)-pyrimidinyl}-1-(difluoromethyl)-6-methyl-1,4,7,8,9,10-hexahydro-11,15-(metheno)pyrazolo[4,3-b][1,7]diazacyclotetradecin-5(6H)-one: Compound (I).
    Type: Application
    Filed: October 11, 2021
    Publication date: December 28, 2023
    Inventors: Subha MUKHERJEE, William P. GALLAGHER, Christopher Robert JAMISON, Carolyn S. WEI, Sergei KOLOTUCHIN, Amarjit SINGH, Nicolas CUNIERE, Chris SFOUGGATAKIS, Adrian ORTIZ, Steven R. WISNIEWSKI, Bin ZHENG, Helen Y. LUO, Sébastien François Emmanuel LEMAIRE, Cyril BEN HAÏM, Kostiantyn CHERNICHENKO, Diego Fernando Domenico BROGGINI, Simon Albert WAGSCHAL, Duy Chi Trung CAO, Karl REUTER, Björn SCHMALZBAUER, Philipp KOSCHKER, Martin D. EASTGATE, Dimitri SKLIAR, Alexander ZHDANKO, Christos XIOURAS, Matthew Penfield MOWER, Ngoc Duc TRAN, Ramdane RAHMANI, Xavier Jean-Marie JUSSEAU, Kiran MATCHA, Luca Alessandro PEREGO
  • Publication number: 20210340317
    Abstract: The present invention relates to compounds of the formula (I), which are suitable as monomers for preparing thermoplastic resins having beneficial optical properties and which can be used for producing optical devices. In Formula (I), A1, A2 are selected from mono- or bicyclic aromatic radicals and mono- or bicyclic heteroaromatic radicals; X represents e.g. a single bond, O, NH, CR6R7; Y is e.g. absent or represents a single bond, O, NH, CR8R9; R1, R2 are hydrogen, a radical Ar? or a radical Ra; R3 is Alk, O-Alk?-, O-Alk?-[O-Alk?]o, O—CH2—Ar—C(O)—, O—C(O)—Ar—C(O)— or O-Alk-C(O)—, where in the last five moieties the left O is bound to A1 and A2, respectively; m, n are 0, 1 or 2; o is an integer from 1 to 10; R4, R5 are e.g. selected from CN and a radical Ra; R6, R8 are e.g. selected from hydrogen, a radical Ar? and a radical Ra; R7, R9 are e.g. selected from hydrogen, C1-C4-alkyl and a radical Ar?; Ra is selected from the group consisting of C?C—R11 and Ar—C?C—R11; R11 is e.g.
    Type: Application
    Filed: October 18, 2019
    Publication date: November 4, 2021
    Inventors: Karl REUTER, Vasyl ANDRUSHKO, Mark KANTOR, Florian STOLZ, Philipp KOSCHKER, Munenori SHIRATAKE, Kentaro ISHIHARA, Koji HIROSE, Shinya IKEDA, Noriyuki KATO, Mitsuteru KONDO, Shoko SUZUKI, Kensuke OSHIMA