Abstract: The invention refers to a deflection module comprising a first deflection unit (10a) comprising a first scanning device (12a) for scanning a first working beam (50a) over a first working field and (40a) and a second deflection unit (10b) comprising a second scanning device (12b) for scanning a second working beam (50b) over a second working field (40b). At least a movable mirror (12a-2) of the first scanning device (12a) and at least a movable mirror (12b-2) of the second scanning device (12b) are arranged mirror-symmetrically with respect to each other. The first working field (40a) and the second working field (40b) overlap in a common overlap area (42).

Abstract: The present invention relates to a deflection unit (10) having an optical element (20), which partly reflects a first wavelength and which partly transmits a different, second wavelength. The deflection unit defines an operating beam path traversed by the operating beam (14) from a first window (12) to a second window (24) via a reflection at the optical element (20). The deflection unit comprises an XY-deflection device (22), which is arranged in the operating beam path in order to scan the operating beam that has emerged, a focusing device (16) for focusing the operating beam (14), wherein the focusing device has a variable focal length and is arranged in the operating beam path between the first window (12) and the optical element (20).

Abstract: The present invention relates to a deflection unit (10) having an optical element (20), which partly reflects a first wavelength and which partly transmits a different, second wavelength. The deflection unit defines an operating beam path traversed by the operating beam (14) from a first window (12) to a second window (24) via a reflection at the optical element (20). The deflection unit comprises an XY-deflection device (22), which is arranged in the operating beam path in order to scan the operating beam that has emerged, a focusing device (16) for focusing the operating beam (14), wherein the focusing device has a variable focal length and is arranged in the operating beam path between the first window (12) and the optical element (20).

Abstract: The present invention refers to an implant with a surface layer having a topographic modification. The topographic modification includes a line pattern with ridge and groove widths of 0.9 to 1.1 ?m and a ridge height of more than 0.9 ?m.

Abstract: The present invention refers to an implant with a surface layer having a topographic modification. The topographic modification includes a line pattern with ridge and groove widths of 0.9 to 1.1 ?m and a ridge height of more than 0.9 ?m.