Abstract: A method for improving the properties of resistance to laser flux of an optical component, comprising a step consisting in bringing the component into contact with an aqueous solution comprising at least one hydroxide of an alkaline metal or an alkaline earth metal in a quantity of between 5 and 30 mass % and having a temperature T of between 50 and 100° C.

Abstract: A method for improving the properties of resistance to laser flux of an optical component, comprising a step consisting in bringing the component into contact with an aqueous solution comprising at least one hydroxide of an alkaline metal or an alkaline earth metal in a quantity of between 5 and 30 mass % and having a temperature T of between 50 and 100° C.

Abstract: Method for manufacturing an optical component, including a substrate made of a fusible material, includes the following steps a) and b) of steps a), b) and c), or steps a), b), c) and d): a) roughing; b) fine grinding; c) polishing; and d) finishing. The method includes steps, subsequent to any one of steps b), c) and/or d): e) inspecting the optical surface of the optical component; f) detecting and locating at least one surface defect to be eliminated; g) for each surface defect, applying a laser beam to an area emcompassing the defect, so as to produce a local remelting of the fusible material, and to form, at the location of the defect, an area of material remelted; h) polishing the optical surface including at least one area of remelted material, to produce a polished optical surface free of surface defects, and continuing with steps c) and d).

Abstract: Method for manufacturing an optical component, including a substrate made of a fusible material, includes the following steps a) and b) of steps a), b) and c), or steps a), b), c) and d): a) roughing; b) fine grinding; c) polishing; and d) finishing. The method includes steps, subsequent to any one of steps b), c) and/or d): e) inspecting the optical surface of the optical component; f) detecting and locating at least one surface defect to be eliminated; g) for each surface defect, applying a laser beam to an area emcompassing the defect, so as to produce a local remelting of the fusible material, and to form, at the location of the defect, an area of material remelted; h) polishing the optical surface including at least one area of remelted material, to produce a polished optical surface free of surface defects, and continuing with steps c) and d).

Abstract: The invention concerns a method for laser ablation of a surface coating from a wall, such as a painted wall finish, for example in a nuclear plant to be decontaminated, and a device for implementing said method. The inventive ablation method includes sweeping shots on the coating of at least one pulsed laser beam with a laser beam quality factor M2 less than 20, and characterized in that it comprises a direct control of said shots by optical deflection, such that the impact zones (I1, I2, I3,) of said shots on said coating are disjointed or substantially adjacent with minimized overlapping.

Abstract: A method for the corrective treatment of a defect on the surface of an optical component for a power laser, includes a first step of applying a first laser beam having a power P1 for a duration t1 so as to generate an illumination E1 on a first zone, the size and position of which match the defect to be corrected, the first laser beam having a wavelength ? that can be absorbed by the material of the optical component in order to form a crater on the surface of the optical component. The method includes a second step of applying a second laser beam having a power P2 for a duration t2 on a second zone including at least the periphery of the crater created during the first step in order to subject the second zone to an illumination E2 that is lower than the illumination E1.

Abstract: The invention concerns a method for laser ablation of a surface coating from a wall, such as a painted wall finish, for example in a nuclear plant to be decontaminated, and a device for implementing said method. The inventive ablation method includes sweeping shots on the coating of at least one pulsed laser beam with a laser beam quality factor M2 less than 20, and characterized in that it comprises a direct control of said shots by optical deflection, such that the impact zones (I1, I2, I3,) of said shots on said coating are disjointed or substantially adjacent with minimized overlapping.

Abstract: The invention relates to a method and device for photolithography by extreme ultraviolet radiation, using a source resulting from the excitation of plasma by several lasers. The object which is to be photoengraved is displaced behind an irradiation window. The radiation is comprised of N successive current impulses whose surface energy is measured. In particular, each laser emits a quantum of energy having a given duration at each outset. The surface energy of the radiation received by the object in the course of the last N?1 pulses is thus added up for an nth iteration of an iterative method. The photosensitive object is displaced from a distance equal to a fraction 1/N of the width of the irradiation window according to the axis of said translation. The above-mentioned sum is subtracted from the amount of total energy required for the photoengraving method.

Abstract: The device comprises a device (2) for creating an essentially linear target (4) in an evacuated space where laser beams (1) are focused, the target being suitable for interacting with the focused laser beams (1) to emit a plasma emitting radiation in the extreme ultraviolet. A receiver device (3) receives the target (4) after it has interacted with the focused laser beams (1), and a collector device (110) collects the EUV radiation emitted by the target (4). The focusing elements (11) for focusing the laser beams on the target (4) are arranged in such a manner that the laser beams (1) are focused on the target (4) laterally, being situated in a common half-space relative to the target (4) and being inclined at a determined angle lying in the range about 60° to about 90° relative to a mean collection axis (6) perpendicular to the target (4).

Abstract: The invention relates to a method and device for photolithography by extreme ultraviolet radiation, using a source resulting from the excitation of plasma by several lasers. The object which is to be photoengraved is displaced behind an irradiation window. The radiation is comprised of N successive current impulses whose surface energy is measured. In particular, each laser emits a quantum of energy having a given duration at each outset. The surface energy of the radiation received by the object in the course of the last N?1 pulses is thus added up for an nth iteration of an iterative method. The photosensitive object is displaced from a distance equal to a fraction 1/N of the width of the irradiation window according to the axis of said translation. The above-mentioned sum is subtracted from the amount of total energy required for the photoengraving method.

Abstract: The device comprises a device (2) for creating an essentially linear target (4) in an evacuated space where laser beams (1) are focused, the target being suitable for interacting with the focused laser beams (1) to emit a plasma emitting radiation in the extreme ultraviolet. A receiver device (3) receives the target (4) after it has interacted with the focused laser beams (1), and a collector device (110) collects the EUV radiation emitted by the target (4). The focusing elements (11) for focusing the laser beams on the target (4) are arranged in such a manner that the laser beams (1) are focused on the target (4) laterally, being situated in a common half-space relative to the target (4) and being inclined at a determined angle lying in the range about 60° to about 90° relative to a mean collection axis (6) perpendicular to the target (4).