Patents by Inventor Philjae Kang

Philjae Kang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist composition comprising amide compound and pattern formation methods using the same
    Patent number: 11874603
    Abstract: Disclosed herein is a photoresist composition comprising a first polymer comprising an acid labile group; a photoacid generator; and an acid diffusion control agent that comprises a tri-alkyl amide compound having a lipophilicity (log P) value that is greater than 11.
    Type: Grant
    Filed: September 15, 2021
    Date of Patent: January 16, 2024
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Philjae Kang, Kwang Mo Choi, Yoo Jung Yoon, Won Seok Lee, Hae-Jin Lim
  • PHOTORESIST COMPOSITION COMPRISING AMIDE COMPOUND AND PATTERN FORMATION METHODS USING THE SAME
    Publication number: 20230099348
    Abstract: Disclosed herein is a photoresist composition comprising a first polymer comprising an acid labile group; a photoacid generator; and an acid diffusion control agent that comprises a tri-alkyl amide compound having a lipophilicity (log P) value that is greater than 11.
    Type: Application
    Filed: September 15, 2021
    Publication date: March 30, 2023
    Inventors: Philjae Kang, Kwang Mo Choi, Yoo Jung Yoon, Won Seok Lee, Hae-Jin Lim