Abstract: A pneumatic drum emptying station locates a lance over an opening in a container. A lance can be inserted into the container to remove material from the container. Pneumatic cylinders may lock a carriage supplying the lance at a desired position along an arm. The arm, rotatable relative to a base post, may be locked in a specific position with pneumatics. Supports may assist in reloading/repositioning containers relative to the base.

Abstract: A pneumatic drum emptying station locates a lance over an opening in a container. A lance can be inserted into the container to remove material from the container. Pneumatic cylinders may lock a carriage supplying the lance at a desired position along an arm. The arm, rotatable relative to a base post, may be locked in a specific position with pneumatics. Supports may assist in reloading/repositioning containers relative to the base.

Abstract: A metrology system may receive a model for measuring one or more selected attributes of a target including features distributed in a selected pattern based on regression of spectroscopic scatterometry data from a scatterometry tool for a range of wavelengths. The metrology system may further generate a weighting function for the model to de-emphasize portions of the spectroscopic scatterometry data associated with wavelengths at which light captured by the scatterometry tool when measuring the target is predicted to include undesired diffraction orders. The metrology system may further direct the spectroscopic scatterometry tool to generate scatterometry data of one or more measurement targets including fabricated features distributed in the selected pattern. The metrology system may further measure the selected attributes for the one or more measurement targets based on regression of the scatterometry data of the one or more measurement targets to the model weighted by the weighting function.

Abstract: A parameterized geometric model of a structure can be determined based on spectra from a wafer metrology tool. The structure can have geometry-induced anisotropic effects. Dispersion parameters of the structure can be determined from the parameterized geometric model. This can enable metrology techniques to measure nanostructures that have geometries and relative positions with surrounding structures that induce non-negligible anisotropic effects. These techniques can be used to characterize process steps involving metal and semiconductor targets in semiconductor manufacturing of, for example, FinFETs or and gate-all-around field-effect transistors.

Abstract: A metrology system may receive a model for measuring one or more selected attributes of a target including features distributed in a selected pattern based on regression of spectroscopic scatterometry data from a scatterometry tool for a range of wavelengths. The metrology system may further generate a weighting function for the model to de-emphasize portions of the spectroscopic scatterometry data associated with wavelengths at which light captured by the scatterometry tool when measuring the target is predicted to include undesired diffraction orders. The metrology system may further direct the spectroscopic scatterometry tool to generate scatterometry data of one or more measurement targets including fabricated features distributed in the selected pattern. The metrology system may further measure the selected attributes for the one or more measurement targets based on regression of the scatterometry data of the one or more measurement targets to the model weighted by the weighting function.

Abstract: A parameterized geometric model of a structure can be determined based on spectra from a wafer metrology tool. The structure can have geometry-induced anisotropic effects. Dispersion parameters of the structure can be determined from the parameterized geometric model. This can enable metrology techniques to measure nanostructures that have geometries and relative positions with surrounding structures that induce non-negligible anisotropic effects. These techniques can be used to characterize process steps involving metal and semiconductor targets in semiconductor manufacturing of, for example, FinFETs or and gate-all-around field-effect transistors.

Abstract: The present invention relates to a pharmaceutical formulation comprising lipopolysaccharide derived from Burkholderia thailandensis and its various uses, including but not limited to its use in the treatment and/or prophylaxis of meliodosis or amelioration of symptoms associated therewith, and/or glanders or amelioration of symptoms associated therewith.

Abstract: The present invention relates to a pharmaceutical formulation comprising lipopolysaccharide derived from Burkholderia thailandensis and its various uses, including but not limited to its use in the treatment and/or prophylaxis of meliodosis or amelioration of symptoms associated therewith, and/or glanders or amelioration of symptoms associated therewith.

Abstract: This invention relates to proteins expressed by ABC system genes of Burkholderia pseudomallei. The proteins (or protective fragments or protective variants thereof) are protective against Burkholderia pseudomallei infection. Use of the proteins in treating Burkholderia mallei or Burkholderia pseudomallei infection and uses in the preparation of vaccines against melioidosis and glanders are described and claimed.