Abstract: An electrode for a lithium-ion battery is provided, which comprises: a current collector; and an electrode material layer disposed on the current collector, wherein the electrode material layer comprises an anode material and a binder, the binder is pectin, its derivative or a combination thereof, and the anode material is selected from the group consisting of lithium vanadium oxide, lithium titanium oxide, lithium iron oxide, graphite, and a combination thereof. In addition, a lithium-ion battery comprising the aforesaid electrode is also provided.

Abstract: Disclosed is an electrolyte solution for a lithium metal battery, comprising: a lithium thiophosphate complex formed by phosphorus pentasulfide and lithium polysulfide. In addition, a lithium metal battery comprising the aforesaid electrolyte solution and a method for preparing the aforesaid electrolyte solution are also disclosed.

Abstract: At least one of the present embodiments generally relates to an apparatus and a method for enhancing the figure of merit (zT) in composite thermoelectric materials using aerogel such as e.g., silicate/silica aerogel, carbon aerogel, chalcogenide aerogel and metal oxide aerogel. For example, the present embodiments provide apparatuses and methods for the addition of aerogels to two commonly used p and n type thermoelectric materials and thereby enhancing their thermoelectric figure of merits to record levels.

Abstract: At least one of the present embodiments generally relates to an apparatus and a method for enhancing the figure of merit (zT) in composite thermoelectric materials using aerogel such as e.g., silicate/silica aerogel, carbon aerogel, chalcogenide aerogel and metal oxide aerogel. For example, the present embodiments provide apparatuses and methods for the addition of aerogels to two commonly used p and n type thermoelectric materials and thereby enhancing their thermoelectric figure of merits to record levels.

Abstract: A system for fabrication of a photovoltaic structure is provided. During fabrication, the system can deposit a doped amorphous Si layer on a first surface of a crystalline Si substrate; and deposit, using a physical vapor deposition machine, a transparent conductive oxide layer on the doped amorphous Si layer. The deposited transparent conductive oxide layer can include In2O3 doped with TiO2 and Ta2O5, and depositing the transparent conductive oxide layer can involve maintaining the Si substrate at a temperature below 130° C. The system can further deposit a metallic layer on the transparent conductive oxide layer, and anneal the transparent conductive oxide layer.