Patents by Inventor Phillip N. First

Phillip N. First has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for Producing Graphitic Patterns on Silicon Carbide
    Publication number: 20090236608
    Abstract: In a method of making a vertical graphitic path on a silicon carbide crystal having a horizontal surface, a portion of the silicon carbide crystal is removed from the horizontal surface so as to define a vertical surface that is transverse to the horizontal surface of the silicon carbide crystal. The vertical surface is annealed so as to generate a thin-film graphitic layer on the vertical surface. In another method of making graphitic layers, a material that inhibits formation of a graphitic layer when the silicon carbide crystal is annealed is applied to a surface of a silicon carbide crystal so as to define at least one opening that exposes a portion of the surface of the silicon carbide crystal. The portion of the silicon carbide crystal is annealed so as to generate a thin-film graphitic layer in the portion of the silicon carbide crystal.
    Type: Application
    Filed: July 1, 2008
    Publication date: September 24, 2009
    Applicant: GEORGIA TECH RESEARCH CORPORATION
    Inventors: Walt A. de Heer, Phillip N. First
  • Patterned thin film graphite devices and method for making same
    Patent number: 7327000
    Abstract: In a method of making graphite devices, a preselected crystal face of a crystal is annealed to create a thin-film graphitic layer disposed against selected face. A preselected pattern is generated on the thin-film graphitic layer. A functional structure includes a crystalline substrate having a preselected crystal face. A thin-film graphitic layer is disposed on the preselected crystal face. The thin-film graphitic layer is patterned so as to define at least one functional structure.
    Type: Grant
    Filed: December 14, 2005
    Date of Patent: February 5, 2008
    Assignee: Georgia Tech Research Corp.
    Inventors: Walt A. DeHeer, Claire Berger, Phillip N. First
  • Patterned thin film graphite devices and method for making same
    Patent number: 7015142
    Abstract: In a method of making graphite devices, a preselected crystal face of a crystal is annealed to create a thin-film graphitic layer disposed against selected face. A preselected pattern is generated on the thin-film graphitic layer. A functional structure includes a crystalline substrate having a preselected crystal face. A thin-film graphitic layer is disposed on the preselected crystal face. The thin-film graphitic layer is patterned so as to define at least one functional structure.
    Type: Grant
    Filed: June 3, 2004
    Date of Patent: March 21, 2006
    Assignee: Georgia Tech Research Corporation
    Inventors: Walt A. DeHeer, Claire Berger, Phillip N. First
  • Patterned thin film graphite devices and method for making same
    Publication number: 20040253820
    Abstract: In a method of making graphite devices, a preselected crystal face of a crystal is annealed to create a thin-film graphitic layer disposed against selected face. A preselected pattern is generated on the thin-film graphitic layer. A functional structure includes a crystalline substrate having a preselected crystal face. A thin-film graphitic layer is disposed on the preselected crystal face. The thin-film graphitic layer is patterned so as to define at least one functional structure.
    Type: Application
    Filed: June 3, 2004
    Publication date: December 16, 2004
    Inventors: Walt A. DeHeer, Claire Berger, Phillip N. First