Abstract: Disclosed herein are self-assembling protein nanoparticles comprising passenger molecules of interest.

Abstract: An offshore system for growing and harvesting seaweed includes an existing non-producing offshore platform. In addition, the offshore system includes a seaweed support system coupled to the platform and configured to support the subsea growth of seaweed.

Abstract: Disclosed herein are self-assembling protein nanoparticles comprising passenger molecules of interest.

Abstract: A subsea wellbore protection (SWP) system. The SWP system includes a wellbore penetrating a subterranean formation beneath a sea floor and a SWP structure positioned below-grade with respect to the sea floor. The SWP structure comprises a caisson that encloses a first wellbore equipment component. The first wellbore equipment component is in fluid communication with the wellbore.

Abstract: A subsea wellbore protection (SWP) system. The SWP system includes a wellbore penetrating a subterranean formation beneath a sea floor and a SWP structure positioned below grade with respect to the sea floor. The SWP structure comprises a caisson that encloses a first wellbore equipment component. The first wellbore equipment component is in fluid communication with the wellbore.

Abstract: The present invention provides methods for fracturing and for reducing the production of both water and particulates from subterranean formations. The methods are particularly useful in conjunction with subterranean formations surrounding wellbores and fractures. The methods comprise the steps of applying to a subterranean formation gelled fluid that contains a gelling agent and a water resistant polymer, applying aqueous surfactant fluid, applying a low-viscosity consolidating fluid, and applying an after-flush fluid, and (in some embodiments) a crosslinked gel fluid.

Abstract: Methods are provided for identifying root causes of particle issues and for developing particle-robust process recipes in plasma deposition processes. The presence of in situ particles within the substrate processing system is detected over a period of time that spans multiple distinct processing steps in the recipe. The time dependence of in situ particle levels is determined from these results. Then, the processing steps are correlated with the time dependence to identify relative particle levels with the processing steps. This information provides a direct indication of which steps result in the production of particle contaminants so that those steps may be targeted for modification in the development of particle recipes.

Abstract: Methods are provided for identifying root causes of particle issues and for developing particle-robust process recipes in plasma deposition processes. The presence of in situ particles within the substrate processing system is detected over a period of time that spans multiple distinct processing steps in the recipe. The time dependence of in situ particle levels is determined from these results. Then, the processing steps are correlated with the time dependence to identify relative particle levels with the processing steps. This information provides a direct indication of which steps result in the production of particle contaminants so that those steps may be targeted for modification in the development of particle recipes.