Patents by Inventor Phong H. Nguyen

Phong H. Nguyen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8204637
    Abstract: A method has been found for assessing an aircraft approach to landing on a shipboard landing surface. The method includes a comparison of an identified aircraft performance with the mean or median of a baseline data set. The baseline data set is assembled from a multiplicity of actual approaches to landing data that are selected for relevance and then statistically evaluated. A high data recording rate captures the pilot's control inputs and allows evaluation of the pilot's manual efficiency of input to controls. The method is particularly useful to evaluate performance under conditions in which evaluation by human observation is limited or evaluation against guidelines produces less meaningful results.
    Type: Grant
    Filed: July 6, 2009
    Date of Patent: June 19, 2012
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Daniel P. Everson, Phong H. Nguyen, Eric J. Silberg
  • Publication number: 20100083975
    Abstract: A nail care system and method using a rubber or soft plastic coated mandrel bit connected to a rotary device, the mandrel bit reducing vibration during operation of the nail care system allowing for smoother polishing and filing as well as a more comfortable experience for the client and nail care practitioner.
    Type: Application
    Filed: October 7, 2008
    Publication date: April 8, 2010
    Applicant: SOFI NAILS, INC.
    Inventors: Phong H. Nguyen, Chung Quoc Nguyen
  • Publication number: 20080295855
    Abstract: A disposable corn and callus remover tool with a holder for receiving an abrasive block. The holder forms a handle for comfortably holding the tool and includes a receptacle to removably receive an abrasive block. The abrasive block may be formed of pumice or a buffing block comprising one or more abrasive layers attached to a compressible layer. The compressible layer is made of foam or hard sponge. The abrasive block is secured to the holder in such a way that both top and bottom abrasive layers are exposed for efficient use.
    Type: Application
    Filed: May 31, 2007
    Publication date: December 4, 2008
    Inventors: Phong H. Nguyen, Chung Quoc Nguyen
  • Publication number: 20080276952
    Abstract: A disposable nail buffing tool with a holder for receiving a buffing block. The holder may be made of plastic, metal, graphite, or some other light weight and rigid material. The holder has a receptacle for receiving a buffing block. In one embodiment the sides of the receptacle are angled inwards, to grasp and hold the buffing block. The holder also has handles to facilitate holding and using the nail buffing tool. The buffing block is removably received in the receptacle of the holder. The buffing block is made of a compressible layer and one or more abrasive layers attached to the compressible layer. The compressible layer is made of foam or hard sponge. The abrasive layer may be sand paper glued to the compressible layer or as in one embodiment, directly sprayed onto the compressible layer.
    Type: Application
    Filed: May 10, 2007
    Publication date: November 13, 2008
    Inventors: Phong H. Nguyen, Chung Quoc Nguyen
  • Patent number: 6806203
    Abstract: A method of forming a dual damascene structure on a substrate having a dielectric layer already formed thereon. In one embodiment the method includes depositing a first hard mask layer over the dielectric layer and depositing a second hard mask layer on the first hard mask layer, where the second hard mask layer is an amorphous silicon layer. Afterwards, formation of the dual damascene structure is completed by etching a metal wiring pattern and a via pattern in the dielectric layer and filling the etched metal wiring pattern and via pattern with a conductive material.
    Type: Grant
    Filed: March 18, 2002
    Date of Patent: October 19, 2004
    Assignee: Applied Materials Inc.
    Inventors: Timothy Weidman, Nikolaos Bekiaris, Josephine Chang, Phong H. Nguyen
  • Publication number: 20030176058
    Abstract: A method of forming a dual damascene structure on a substrate having a dielectric layer already formed thereon. In one embodiment the method includes depositing a first hard mask layer over the dielectric layer and depositing a second hard mask layer on the first hard mask layer, where the second hard mask layer is an amorphous silicon layer. Afterwards, formation of the dual damascene structure is completed by etching a metal wiring pattern and a via pattern in the dielectric layer and filling the etched metal wiring pattern and via pattern with a conductive material.
    Type: Application
    Filed: March 18, 2002
    Publication date: September 18, 2003
    Applicant: Applies Materials, Inc.
    Inventors: Timothy Weidman, Nikolaos Bekiaris, Josephine Chang, Phong H. Nguyen