Patents by Inventor Phuc Van
Phuc Van has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240132846Abstract: A method of manufacturing a stem cell sheets is provided which includes: (a) obtaining mesenchymal stem cells; (b) extracting programmed death ligands one (PD-L1) from the mesenchymal stem cells; (c) selecting only PD-L1 positive (PD-L1+ MSCs) from the PD-L1; (d) differentiating the PD-L1+ cells into osteoblasts and chondroblasts in a predetermined activation condition; and (e) forming the stem cell sheets by mixing the PD-L1+ MSCs with platelet rich plasma solution and CaCl2).Type: ApplicationFiled: February 16, 2023Publication date: April 25, 2024Applicants: VietNam National University Ho Chi Minh City, Stem Cell InstituteInventors: NGOC BICH VU, PHUC VAN PHAM
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Publication number: 20220062737Abstract: Exercise class systems and methods may include a plurality of pieces of exercise equipment and/or a plurality of sensing systems adapted to be worn on people in the class, each piece of equipment or sensing system outputting plural exercise signals relating to exercise performance on the piece of equipment or of the person with the sensing system. A computer system may also be provided. The computer system may include at least one electronic storage device which stores the plural signals from the pieces of equipment or sensing system and at least one processor which generates an output signal containing an animation corresponding to at least two of the exercise signals from each of the pieces of equipment or sensing systems. At least one display device, visible from each of the pieces of equipment or people in the class, may receive the output signal and display the animation.Type: ApplicationFiled: September 10, 2021Publication date: March 3, 2022Applicant: Equinox Holdings, Inc.Inventors: Elizabeth Kelly HENNING, Jeffrey Scott BRUENING, Gordon THOMPSON, III, Chirag PATEL, Neel Magan BAKARANIA, Phuc Van Nguyen, Catherine Crowe MARK, John WHITE, Jin Sung YOO, Karen RAINERT, John Paul BENVENUTO, Nicole DEL SENNO, Matthew JACOBS, David HITCHINGS
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Patent number: 11148032Abstract: Exercise class systems and methods may include a plurality of pieces of exercise equipment and/or a plurality of sensing systems adapted to be worn on people in the class, each piece of equipment or sensing system outputting plural exercise signals relating to exercise performance on the piece of equipment or of the person with the sensing system. A computer system may also be provided. The computer system may include at least one electronic storage device which stores the plural signals from the pieces of equipment or sensing system and at least one processor which generates an output signal containing an animation corresponding to at least two of the exercise signals from each of the pieces of equipment or sensing systems. At least one display device, visible from each of the pieces of equipment or people in the class, may receive the output signal and display the animation.Type: GrantFiled: September 28, 2015Date of Patent: October 19, 2021Assignee: EQUINOX HOLDING, INC.Inventors: Elizabeth Kelly Henning, Jeffrey Scott Bruening, Gordon Thompson, III, Chirag Patel, Neel Magan Bakarania, Phuc Van Nguyen, Catherine Crowe Mark, John White, Jin Sung Yoo, Karen Rainert, John Paul Benvenuto, Nicole Del Senno, Matthew Jacobs, David Hitchings
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Publication number: 20160089574Abstract: Exercise class systems and methods may include a plurality of pieces of exercise equipment and/or a plurality of sensing systems adapted to be worn on people in the class, each piece of equipment or sensing system outputting plural exercise signals relating to exercise performance on the piece of equipment or of the person with the sensing system. A computer system may also be provided. The computer system may include at least one electronic storage device which stores the plural signals from the pieces of equipment or sensing system and at least one processor which generates an output signal containing an animation corresponding to at least two of the exercise signals from each of the pieces of equipment or sensing systems. At least one display device, visible from each of the pieces of equipment or people in the class, may receive the output signal and display the animation.Type: ApplicationFiled: September 28, 2015Publication date: March 31, 2016Inventors: Elizabeth Kelly HENNING, Jeffrey Scott BRUENING, Gordon THOMPSON, III, Chirag PATEL, Neel Magan BAKARANIA, Phuc Van Nguyen, Catherine Crowe MARK, John WHITE, Jin Sung YOO, Karen RAINERT, John Paul BENVENUTO, Nicole DEL SENNO, Matthew JACOBS, David HITCHINGS
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Patent number: 7804294Abstract: A contactless sheet resistance measurement apparatus and method for measuring the sheet resistance of upper layer of ultra shallow p-n junction is disclosed. The apparatus comprises alternating light source optically coupled with first transparent and conducting electrode brought close to the wafer, the second electrode placed outside of illumination area. Using the measurement of the surface photovoltage signals inside illuminated area and outside this area and its phase shifts, linear SPV model describing its lateral distribution the sheet resistance and p-n junction conductance is determined.Type: GrantFiled: January 12, 2009Date of Patent: September 28, 2010Assignee: Abhee 1, L.P.Inventors: Vladimir Faifer, Phuc Van
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Patent number: 7741833Abstract: A contactless sheet resistance measurement apparatus and method for measuring the sheet resistance of upper layer of ultra shallow p-n junction is disclosed. The apparatus comprises alternating light source optically coupled with first transparent and conducting electrode brought close to the wafer, the second electrode placed outside of illumination area. Using the measurement of the surface photovoltage signals inside illuminated area and outside this area and its phase shifts, linear SPV model describing its lateral distribution the sheet resistance and p-n junction conductance is determined.Type: GrantFiled: August 2, 2006Date of Patent: June 22, 2010Assignee: Ahbee 1, L.P.Inventors: Vladimir Faifer, Phuc Van
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Patent number: 7737680Abstract: A contactless sheet resistance measurement apparatus and method for measuring the sheet resistance of upper layer of ultra shallow p-n junction is disclosed. The apparatus comprises alternating light source optically coupled with first transparent and conducting electrode brought close to the wafer, the second electrode placed outside of illumination area. Using the measurement of the surface photovoltage signals inside illuminated area and outside this area and its phase shifts, linear SPV model describing its lateral distribution the sheet resistance and p-n junction conductance is determined.Type: GrantFiled: January 12, 2009Date of Patent: June 15, 2010Assignee: Ahbee 1, L.P.Inventors: Vladimir Faifer, Phuc Van
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Patent number: 7737681Abstract: A contactless sheet resistance measurement apparatus and method for measuring the sheet resistance of upper layer of ultra shallow p-n junction is disclosed. The apparatus comprises alternating light source optically coupled with first transparent and conducting electrode brought close to the wafer, the second electrode placed outside of illumination area. Using the measurement of the surface photovoltage signals inside illuminated area and outside this area and its phase shifts, linear SPV model describing its lateral distribution the sheet resistance and p-n junction conductance is determined.Type: GrantFiled: January 12, 2009Date of Patent: June 15, 2010Assignee: Ahbee 1, L.P.Inventors: Vladimir Faifer, Phuc Van
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Patent number: 7502121Abstract: This invention is a device for measuring of absolute distances by means of low coherence optical interferometry. The proposed apparatus eliminates thermal of the conventional fiber optic interferometers caused by variation of the refractive index of the optical fiber material to change of the temperature.Type: GrantFiled: November 24, 2004Date of Patent: March 10, 2009Assignee: Ahbee 1, L.P.Inventors: Wojciech Walecki, Phuc Van
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Publication number: 20090023728Abstract: Compounds of general formula (I) wherein D, E, R1, R2, R3, R4, R5, R6 and R7 are as defined in the specification, as well as salts, enantiomers thereof and pharmaceutical compositions including the compounds are prepared. They are useful in therapy, in particular in the management of pain.Type: ApplicationFiled: December 20, 2004Publication date: January 22, 2009Applicant: ASTRAZENECA ABInventors: Justin Ripper, Ian Jenkins, Phuc Van Le, Ron Quinn, Christian Janssen
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Patent number: 7362088Abstract: A contactless sheet resistance measurement apparatus and method for measuring the sheet resistance of upper layer of ultra shallow p-n junction is disclosed. The apparatus comprises alternating light source optically coupled with first transparent and conducting electrode brought close to the wafer, the second electrode placed outside of illumination area. Using the measurement of the surface photovoltage signals inside illuminated area and outside this area and its phase shifts, linear SPV model describing its lateral distribution the sheet resistance and p-n junction conductance is determined.Type: GrantFiled: October 15, 2003Date of Patent: April 22, 2008Assignee: Ahbee 1, L.P.Inventors: Vladimir Faifer, Phuc Van
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Patent number: 7116429Abstract: A method and apparatus for determining the thickness of slabs of materials using an interferometer.Type: GrantFiled: January 18, 2003Date of Patent: October 3, 2006Inventors: Wojciech J. Walecki, Phuc Van
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Patent number: 7019513Abstract: A contactless sheet resistance measurement apparatus and method for measuring the sheet resistance of a surface p-n junction and its leakage current is disclosed. The apparatus comprises an alternating light source optically coupled with a transparent and conducting electrode brought close to the junction, a second electrode placed outside of the illumination area, and a third grounded electrode surrounding the first and second electrodes. For measurements of junction capacitance, a calibration wafer with known sheet resistance is used to provide reference photovoltage signals. Using the measurement of the junction photovoltage (JPV) signals from the illuminated area and outside this area for calibration and test wafers at different light modulation frequencies, p-n junction sheet resistance and conductance (leakage current density) are determined.Type: GrantFiled: January 19, 2005Date of Patent: March 28, 2006Inventors: Vladimir Faifer, Phuc Van, Michael Current, Timothy Wong
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Patent number: 6922067Abstract: An apparatus and method is provided for determining the minority carrier diffusion length from the back side of the wafer within predetermined areas using pattern recognition system. In particular embodiments SPV probe includes transparent and non-transparent electrodes, to provide measurement of SPV and in area larger than optical beam and to provide accurate determination of diffusion length with spatial resolution <1 mm. The apparatus includes the ability to measure diffusion length from the areas under special areas within scribe line of patterned wafer. This apparatus and method provides a determination of the diffusion length to control metal contamination in product including patterned wafers including measurement within scribe lines and full wafer mapping.Type: GrantFiled: November 18, 2003Date of Patent: July 26, 2005Assignee: Ahbee 2, L.P.Inventors: Phuc Van, Alexander Pravdivtsev
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Patent number: 6643393Abstract: An apparatus for the automatic testing the adhesion characteristics of thin film and coating to silicon wafers, and the processing of the data obtained thereby to present to the user a rapid and accurate forecast of the thin film's behavior in a selected processing environment. The apparatus of the invention heats and cools samples while automatically monitoring for debonding. Information collected from the optical and thermal devices are processed by computer for analysis and recorded for cataloging. Information is collected and processed over time while samples are subjected to selected temperature environments to provide a data base of adhesion characteristics of thin films and coatings.Type: GrantFiled: February 21, 2003Date of Patent: November 4, 2003Inventors: Phuc Van, Yuen Lim
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Patent number: 6611616Abstract: An apparatus for the automatic testing the adhesion characteristics of thin film and coating to silicon wafers, and the processing of the data obtained thereby to present to the user a rapid and accurate forecast of the thin film's behavior in a selected processing environment. The apparatus of the invention heats and cools samples while automatically monitoring for debonding. Information collected from the optical and thermal devices are processed by computer for analysis and recorded for cataloging. Information is collected and processed over time while samples are subjected to selected temperature environments to provide a data base of adhesion characteristics of thin films and coatings.Type: GrantFiled: February 21, 2003Date of Patent: August 26, 2003Inventors: Phuc Van, Yuen Lim
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Patent number: 6567541Abstract: An apparatus for the automatic testing the adhesion characteristics of thin film and coating to silicon wafers, and the processing of the data obtained thereby to present to the user a rapid and accurate forecast of the thin film's behavior in a selected processing environment. The apparatus of the invention heats and cools samples while automatically monitoring for debonding. Information collected from the optical and thermal devices are processed by computer for analysis and recorded for cataloging. Information is collected and processed over time while samples are subjected to selected temperature environments to provide a data base of adhesion characteristics of thin films and coatings.Type: GrantFiled: February 25, 2000Date of Patent: May 20, 2003Assignee: Ahbee 1, L.P.Inventors: Phuc Van, Yuen Lim
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Patent number: 6546820Abstract: An apparatus is disclosed for in situ characterizing and quantifying physical properties of thin film materials over time and in various environments. Through the utilization of multiple probes and sensors, and the processing of the data, a rapid and accurate forecast of the material's behavior in a selected environment may be obtained. The present invention scans for a variety of properties, including film stress, film thickness, desorption, reflectivity, and resistivity. Photodetectors are used to collect reflected light which is processed by computer for analysis, while simultaneously processing data collected from the probes and sensors placed within and without the testing chamber. Data is collected and analyzed over time while sample materials are subjected to selected environments, including thermal cycling and gaseous or vacuum environments, using multiple probes according to the user's industry needs.Type: GrantFiled: February 11, 2000Date of Patent: April 15, 2003Inventors: Phuc Van, Yuen Lim
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Patent number: D450000Type: GrantFiled: February 24, 2000Date of Patent: November 6, 2001Inventor: Phuc Van