Patents by Inventor Pi-Hsi Huang

Pi-Hsi Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240115616
    Abstract: The present disclosure provides a method for treating liver cirrhosis by using a composition including mesenchymal stem cells, extracellular vesicles produced by the mesenchymal stem cells, and growth factors. The composition of the present disclosure achieves the effect of treating liver cirrhosis through various efficacy experiments.
    Type: Application
    Filed: October 4, 2023
    Publication date: April 11, 2024
    Inventors: Po-Cheng Lin, Pi-Chun Huang, Zih-Han Hong, Ming-Hsi Chuang, Yi-Chun Lin, Chia-Hsin Lee, Chun-Hung Chen, Chao-Liang Chang, Kai-Ling Zhang
  • Patent number: 6772805
    Abstract: An in-situ purge system for charging the interior of a semiconductor wafer pod with nitrogen gas after the pod is exposed to ambient moisture, air and particles in a clean room. A gas supply line extends into the pod interior from a gas source, and a gas exhaust line extends from the pod interior to remove moisture, particles and excess gas from the pod interior as the pod contains a wafer-filled cassette and rests typically on a SMIF arm before transfer to a processing tool or other destination in the facility. The removable bottom door of the pod and the bottom plate of the cassette are modified to receive the gas supply line and the gas exhaust line.
    Type: Grant
    Filed: November 22, 2002
    Date of Patent: August 10, 2004
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Wen-Shan Tsai, Shu-Hua Wang, Pi-Hsi Huang, Zeng-Zong Twu
  • Publication number: 20040099333
    Abstract: An in-situ purge system for charging the interior of a semiconductor wafer pod with nitrogen gas after the pod is exposed to ambient moisture, air and particles in a clean room. A gas supply line extends into the pod interior from a gas source, and a gas exhaust line extends from the pod interior to remove moisture, particles and excess gas from the pod interior as the pod contains a wafer-filled cassette and rests typically on a SMIF arm before transfer to a processing tool or other destination in the facility. The removable bottom door of the pod and the bottom plate of the cassette are modified to receive the gas supply line and the gas exhaust line.
    Type: Application
    Filed: November 22, 2002
    Publication date: May 27, 2004
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Wen-Shan Tsai, Shu-Hua Wang, Pi-Hsi Huang, Zeng-Zong Twu