Patents by Inventor Pia WENNERBERG

Pia WENNERBERG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Oligomer or polymer and composition comprising the same
    Patent number: 11548972
    Abstract: Disclosed is an oligomer or polymer obtained by reacting at least one monomeric, oligomeric or polymeric isocyanate having two or more isocyanate groups with 2-hydroxy-3-butenoic acid and/or at least one alkyl ester of 2-hydroxy-3-butenoic acid. A composition comprising a said oligomer or polymer is also disclosed.
    Type: Grant
    Filed: August 30, 2018
    Date of Patent: January 10, 2023
    Assignee: PERSTORP AB
    Inventors: Stefan Lundmark, Pia Wennerberg, David James
  • Hybrid photopolymer composition for additive manufacturing
    Patent number: 11130874
    Abstract: The present invention refers to a hybrid photopolymer composition for additive manufacturing, —comprising 50-95% by weight of a free radically curable-component, farther comprising at least one (meth)acrylate monomer or oligomer, 5-49% by weight of a cationically curable component, further comprising a cycloaliphatic epoxide, an oxetane mixture, containing a monooxetane compound and a polyoxetane compound, and a thermoplastic polycaprolactone with a molecular weight of 20,000-100,000 g/mol, a free radical photoinitiator, a UV blocker, a cationic photoinitiator, optionally a cationic photosensitiser, and optionally a thermal initiator, wherein the percent by weight is based on the total weight of the photopolymer' composition.
    Type: Grant
    Filed: December 19, 2018
    Date of Patent: September 28, 2021
    Assignee: PERSTORP AB
    Inventors: David James, Vanessa Maurin, Pia Wennerberg
  • NOVEL OLIGOMER OR POLYMER AND COMPOSITION COMPRISING THE SAME
    Publication number: 20210070919
    Abstract: Disclosed is an oligomer or polymer obtained by reacting at least one monomeric, oligomeric or polymeric isocyanate having two or more isocyanate groups with 2-hydroxy-3-butenoic acid and/or at least one alkyl ester of 2-hydroxy-3-butenoic acid. A composition comprising a said oligomer or polymer is also disclosed.
    Type: Application
    Filed: August 30, 2018
    Publication date: March 11, 2021
    Inventors: Stefan LUNDMARK, Pia WENNERBERG, David JAMES
  • A HYBRID PHOTOPOLYMER COMPOSITION FOR ADDITIVE MANUFACTURING
    Publication number: 20200308426
    Abstract: The present invention refers to a hybrid photopolymer composition for additive manufacturing, comprising 50-95% by weight of a free radically curable-component, farther comprising at least one (meth)acrylate monomer or oligomer, 5-49% by weight of a cationically curable component, further comprising a cycloaliphatic epoxide, an oxetane mixture, containing a monooxetane compound and a polyoxetane compound, and a thermoplastic polycaprolactone with a molecular weight of 20,000-100,000 g/mol, a free radical photoinitiator, a UV blocker, a cationic photoinitiator, optionally a cationic photosensitiser, and optionally a thermal initiator, wherein the percent by weight is based on the total weight of the photopolymer' composition.
    Type: Application
    Filed: December 19, 2018
    Publication date: October 1, 2020
    Inventors: David JAMES, Vanessa MAURIN, Pia WENNERBERG
  • Radiation curing composition
    Patent number: 10501573
    Abstract: Disclosed is a radiation curable composition comprising 2-hydroxy-3-butenoic acid and/or at least one ester of 2-hydroxy-3-butenoic acid and at least one additional compound selected from radiation curable monomers, oligomers and polymers.
    Type: Grant
    Filed: December 30, 2016
    Date of Patent: December 10, 2019
    Assignee: PERSTORP AB
    Inventors: Stefan Lundmark, Pia Wennerberg
  • RADIATION CURING COMPOSITION
    Publication number: 20190048132
    Abstract: Disclosed is a radiation curable composition comprising 2-hydroxy-3-butenoic acid and/or at least one ester of 2-hydroxy-3-butenoic acid and at least one additional compound selected from radiation curable monomers, oligomers and polymers.
    Type: Application
    Filed: December 30, 2016
    Publication date: February 14, 2019
    Inventors: Stefan LUNDMARK, Pia WENNERBERG