Abstract: This invention relates to a pane comprising a glass substrate (1) coated with at least one transparent, thin, low-emissivity and/or conducting "functional" film (3), and with an "intermediate" film (2) disposed between substrate (1) and functional film (3). The intermediate film (2) has an optical thickness between 150 and 195 nm, preferably at approximately 168 or 185 nm, so that the residual color of the reflected appearance of the substrate from the "film side" of the pane is in the range of the blues.

Abstract: The invention relates to a glazing comprising a transparent substrate (1), in particular of glass provided with a transparent, conducting and/or low emissive functional coating (3) based on a metal oxide or metal oxides, an "inner" covering (2) of geometrical thickness between 70 and 135 nm and a refractive index between 1.65 and 1.90 positioned between the functional coating (3) and the substrate (1) and an "outer" covering (4) of geometrical thickness between 70 and 110 nm and a refractive index between 1.40 and 1.70 located on the functional coating (3).

Abstract: The invention relates to a transparent substrate (1), more particularly of glass, surmounted by a metal nitride layer (3) for filtering solar radiation, characterized in that with a view to protecting said metal nitride layer particularly against high temperature oxidation, said layer (3) is surmounted by a pyrolyzed, metal oxide layer (4), whose metal has an oxide formation standard free enthalpy value .DELTA.G.degree. equal to or below .DELTA.G.degree. of the metal of the nitride layer (3) at a given temperature.

Abstract: The present invention relates to a product containing a glass substrate and a transparent conductive layer made of sub-stoichiometric metallic oxide coated with a metallic oxide overlayer protecting the conductive layer from oxidation. The indices of refraction of the two layers and the geometric thickness of the overlayer may be selected so as to offer a product which has a neutral color under reflection. The invention also concerns processes for obtaining said product.

Abstract: This invention relates to a process and a device for the deposition of thin layers on a substrate using a plasma-CVD technique. The substrate itself, which previously has been made conductive by the deposition of conductive layers, is used as an electrode to create the discharge. In particular, the technique can be applied to the deposition of organosilicon layers on glass plates of large dimensions. The invention also relates to a glass substrate covered by thin layers including at least one metal layer, in particular silver, on which the organosilicon layer is deposited according to the process.