Patents by Inventor Pierre C. Fazan
Pierre C. Fazan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11081486Abstract: An integrated circuit device having (i) a memory cell array which includes a plurality of memory cells arranged in a matrix of rows and columns, wherein each memory cell includes at least one transistor having a gate, gate dielectric and first, second and body regions, wherein: (i) the body region of each transistor is electrically floating and (ii) the transistors of adjacent memory cells have a common first region and/or a common second region. Each common first region and/or second regions of transistors of adjacent memory cells includes a barrier disposed therein and/or therebetween, wherein each barrier provides a discontinuity in the common regions and/or includes one or more electrical characteristics that are different from one or more corresponding electrical characteristics of the common regions.Type: GrantFiled: May 28, 2019Date of Patent: August 3, 2021Assignee: OVONYX MEMORY TECHNOLOGY, LLCInventor: Pierre C. Fazan
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Publication number: 20190279985Abstract: An integrated circuit device having (i) a memory cell array which includes a plurality of memory cells arranged in a matrix of rows and columns, wherein each memory cell includes at least one transistor having a gate, gate dielectric and first, second and body regions, wherein: (i) the body region of each transistor is electrically floating and (ii) the transistors of adjacent memory cells have a common first region and/or a common second region. Each common first region and/or second regions of transistors of adjacent memory cells includes a barrier disposed therein and/or therebetween, wherein each barrier provides a discontinuity in the common regions and/or includes one or more electrical characteristics that are different from one or more corresponding electrical characteristics of the common regions.Type: ApplicationFiled: May 28, 2019Publication date: September 12, 2019Applicant: OVONYX MEMORY TECHNOLOGY, LLCInventor: Pierre C. FAZAN
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Patent number: 10304837Abstract: An integrated circuit device having (i) a memory cell array which includes a plurality of memory cells arranged in a matrix of rows and columns, wherein each memory cell includes at least one transistor having a gate, gate dielectric and first, second and body regions, wherein: (i) the body region of each transistor is electrically floating and (ii) the transistors of adjacent memory cells have a common first region and/or a common second region. Each common first region and/or second regions of transistors of adjacent memory cells includes a barrier disposed therein and/or therebetween, wherein each barrier provides a discontinuity in the common regions and/or includes one or more electrical characteristics that are different from one or more corresponding electrical characteristics of the common regions.Type: GrantFiled: September 16, 2013Date of Patent: May 28, 2019Assignee: OVONYX MEMORY TECHNOLOGY, LLCInventor: Pierre C. Fazan
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Patent number: 9276000Abstract: Embodiments of a manufacturing process flow for producing standalone memory devices that can achieve bit cell sizes on the order of 4F2 or 5F2, and that can be applied to common source/drain, separate source/drain, or common source only or common drain only transistor arrays. Active area and word line patterns are formed as perpendicularly-arranged straight lines on a Silicon-on-Insulator substrate. The intersections of the active area and spaces between word lines define contact areas for the connection of vias and metal line layers. Insulative spacers are used to provide an etch mask pattern that allows the selective etching of contact areas as a series of linear trenches, thus facilitating straight line lithography techniques. Embodiments of the manufacturing process remove first layer metal (metal-1) islands and form elongated vias, in a succession of processing steps to build dense memory arrays.Type: GrantFiled: August 26, 2013Date of Patent: March 1, 2016Assignee: MICRON TECHNOLOGY, INC.Inventor: Pierre C. Fazan
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Patent number: 9093311Abstract: Techniques for providing a semiconductor memory device are disclosed. In one embodiment, the techniques may be realized as a semiconductor memory device including a plurality of memory cells arranged in an array of rows and columns. Each memory cell may include a first region connected to a source line extending in a first orientation, a second region connected to a bit line extending a second orientation, and a body region spaced apart from and capacitively coupled to a word line, wherein the body region is electrically floating and disposed between the first region and the second region. The semiconductor device may also include a first barrier wall extending in the first orientation of the array and a second barrier wall extending in the second orientation of the array and intersecting with the first barrier wall to form a trench region configured to accommodate each of the plurality of memory cells.Type: GrantFiled: June 9, 2014Date of Patent: July 28, 2015Assignee: Micron Technology, Inc.Inventors: Michael A. Van Buskirk, Christian Caillat, Viktor I. Koldiaev, Jungtae Kwon, Pierre C. Fazan
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Publication number: 20140291763Abstract: Techniques for providing a semiconductor memory device are disclosed. In one embodiment, the techniques may be realized as a semiconductor memory device including a plurality of memory cells arranged in an array of rows and columns. Each memory cell may include a first region connected to a source line extending in a first orientation, a second region connected to a bit line extending a second orientation, and a body region spaced apart from and capacitively coupled to a word line, wherein the body region is electrically floating and disposed between the first region and the second region. The semiconductor device may also include a first barrier wall extending in the first orientation of the array and a second barrier wall extending in the second orientation of the array and intersecting with the first barrier wall to form a trench region configured to accommodate each of the plurality of memory cells.Type: ApplicationFiled: June 9, 2014Publication date: October 2, 2014Applicant: MICRON TECHNOLOGY, INC.Inventors: Michael A. VAN BUSKIRK, Christian CAILLAT, Viktor I. KOLDIAEV, Jungtae KWON, Pierre C. FAZAN
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Patent number: 8748959Abstract: A semiconductor memory device is disclosed. In one particular exemplary embodiment, the semiconductor memory device includes a plurality of memory cells arranged in an array of rows and columns. Each memory cell may include a first region connected to a source line extending in a first orientation. Each memory cell may also include a second region connected to a bit line extending a second orientation. Each memory cell may further include a body region spaced apart from and capacitively coupled to a word line, wherein the body region is electrically floating and disposed between the first region and the second region. The semiconductor device may also include a first barrier wall extending in the first orientation and a second barrier wall extending in the second orientation and intersecting with the first barrier wall to form a trench region configured to accommodate each of the plurality of memory cells.Type: GrantFiled: March 31, 2010Date of Patent: June 10, 2014Assignee: Micron Technology, Inc.Inventors: Michael A. Van Buskirk, Christian Caillat, Viktor I Koldiaev, Jungtae Kwon, Pierre C. Fazan
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Publication number: 20140017868Abstract: An integrated circuit device having (i) a memory cell array which includes a plurality of memory cells arranged in a matrix of rows and columns, wherein each memory cell includes at least one transistor having a gate, gate dielectric and first, second and body regions, wherein: (i) the body region of each transistor is electrically floating and (ii) the transistors of adjacent memory cells have a common first region and/or a common second region. Each common first region and/or second regions of transistors of adjacent memory cells includes a barrier disposed therein and/or therebetween, wherein each barrier provides a discontinuity in the common regions and/or includes one or more electrical characteristics that are different from one or more corresponding electrical characteristics of the common regions.Type: ApplicationFiled: September 16, 2013Publication date: January 16, 2014Applicant: Micron Technology, Inc.Inventor: Pierre C. FAZAN
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Publication number: 20130341695Abstract: Embodiments of a manufacturing process flow for producing standalone memory devices that can achieve bit cell sizes on the order of 4F2 or 5F2, and that can be applied to common source/drain, separate source/drain, or common source only or common drain only transistor arrays. Active area and word line patterns are formed as perpendicularly-arranged straight lines on a Silicon-on-Insulator substrate. The intersections of the active area and spaces between word lines define contact areas for the connection of vias and metal line layers. Insulative spacers are used to provide an etch mask pattern that allows the selective etching of contact areas as a series of linear trenches, thus facilitating straight line lithography techniques. Embodiments of the manufacturing process remove first layer metal (metal-1) islands and form elongated vias, in a succession of processing steps to build dense memory arrays.Type: ApplicationFiled: August 26, 2013Publication date: December 26, 2013Applicant: MICRON TECHNOLOGY, INC.Inventor: Pierre C. FAZAN
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Publication number: 20120044752Abstract: Processes are disclosed which facilitate improved high-density memory circuitry, most preferably dynamic random access memory (DRAM) circuitry. A semiconductor memory device includes i) a total of no more than 68,000,000 functional and operably addressable memory cells arranged in multiple memory arrays formed on a semiconductor die; and ii) circuitry formed on the semiconductor die permitting data to be written to and read from one or more of the memory cells. At least one of the memory arrays contains at least 100-square microns of continuous die surface area having at least 128 of the functional and operably addressable memory cells. More preferably, at least 100 square microns of continuous die surface area have at least 170 of the functional and operably addressable memory cells.Type: ApplicationFiled: October 31, 2011Publication date: February 23, 2012Applicant: ROUND ROCK RESEARCH, LLCInventors: Brent Keeth, Pierre C. Fazan
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Publication number: 20110024762Abstract: A method of forming a thin film transistor relative to a substrate includes, a) providing a thin film transistor layer of polycrystalline material on a substrate, the polycrystalline material comprising grain boundaries; b) providing a fluorine containing layer adjacent the polycrystalline thin film layer; c) annealing the fluorine containing layer at a temperature and for a time period which in combination are effective to drive fluorine from the fluorine containing layer into the polycrystalline thin film layer and incorporate fluorine within the grain boundaries to passivate said grain boundaries; and d) providing a transistor gate operatively adjacent the thin film transistor layer. The thin film transistor can be fabricated to be bottom gated or top gated. A buffering layer can be provided intermediate the thin film transistor layer and the fluorine containing layer, with the buffering layer being transmissive of fluorine from the fluorine containing layer during the annealing.Type: ApplicationFiled: October 11, 2010Publication date: February 3, 2011Applicant: Micron Technology, Inc.Inventors: Gurtej S. Sandhu, Shubneesh Batra, Pierre C. Fazan
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Patent number: 7825414Abstract: A method of forming a thin film transistor relative to a substrate includes, a) providing a thin film transistor layer of polycrystalline material on a substrate, the polycrystalline material comprising grain boundaries; b) providing a fluorine containing layer adjacent the polycrystalline thin film layer; c) annealing the fluorine containing layer at a temperature and for a time period which in combination are effective to drive fluorine from the fluorine containing layer into the polycrystalline thin film layer and incorporate fluorine within the grain boundaries to passivate said grain boundaries; and d) providing a transistor gate operatively adjacent the thin film transistor layer. The thin film transistor can be fabricated to be bottom gated or top gated. A buffering layer can be provided intermediate the thin film transistor layer and the fluorine containing layer, with the buffering layer being transmissive of fluorine from the fluorine containing layer during the annealing.Type: GrantFiled: October 24, 2008Date of Patent: November 2, 2010Assignee: Micron Technology, Inc.Inventors: Gurtej S. Sandhu, Shubneesh Batra, Pierre C. Fazan
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Publication number: 20100259964Abstract: Techniques for providing a semiconductor memory device are disclosed. In one particular exemplary embodiment, the techniques may be realized as a semiconductor memory device including a plurality of memory cells arranged in an array of rows and columns. Each memory cell may include a first region connected to a source line extending in a first orientation. Each memory cell may also include a second region connected to a bit line extending a second orientation. Each memory cell may further include a body region spaced apart from and capacitively coupled to a word line, wherein the body region is electrically floating and disposed between the first region and the second region. The semiconductor device may also include a first barrier wall extending in the first orientation of the array and a second barrier wall extending in the second orientation of the array and intersecting with the first barrier wall to form a trench region configured to accommodate each of the plurality of memory cells.Type: ApplicationFiled: March 31, 2010Publication date: October 14, 2010Applicant: Innovative Silicon ISi SAInventors: Michael A. Van Buskirk, Christian Caillat, Viktor I. Koldiaev, Jungtae Kwon, Pierre C. Fazan
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Publication number: 20100149855Abstract: Processes are disclosed which facilitate improved high-density memory circuitry, most preferably dynamic random access memory (DRAM) circuitry. A semiconductor memory device includes i) a total of no more than 68,000,000 functional and operably addressable memory cells arranged in multiple memory arrays formed on a semiconductor die; and ii) circuitry formed on the semiconductor die permitting data to be written to and read from one or more of the memory cells, at least one of the memory arrays containing at least 100-square microns of continuous die surface area having at least 128 of the functional and operably addressable memory cells, more preferably, at least 100 square microns of continuous die surface area having at least 170 of the functional and operably addressable memory cells.Type: ApplicationFiled: February 26, 2010Publication date: June 17, 2010Applicant: MICRON TECHNOLOGY, INC.Inventors: Brent Keeth, Pierre C. Fazan
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Patent number: 7705383Abstract: Processes are disclosed which facilitate improved high-density memory circuitry, most preferably dynamic random access memory (DRAM) circuitry. A semiconductor memory device includes i) a total of no more than 68,000,000 functional and operably addressable memory cells arranged in multiple memory arrays formed on a semiconductor die; and ii) circuitry formed on the semiconductor die permitting data to be written to and read from one or more of the memory cells, at least one of the memory arrays containing at least 100-square microns of continuous die surface area having at least 128 of the functional and operably addressable memory cells, more preferably, at least 100 square microns of continuous die surface area having at least 170 of the functional and operably addressable memory cells.Type: GrantFiled: September 20, 1995Date of Patent: April 27, 2010Assignee: Micron Technology, Inc.Inventors: Brent Keeth, Pierre C. Fazan
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Publication number: 20090302322Abstract: A method of forming a thin film transistor relative to a substrate includes, a) providing a thin film transistor layer of polycrystalline material on a substrate, the polycrystalline material comprising grain boundaries; b) providing a fluorine containing layer adjacent the polycrystalline thin film layer; c) annealing the fluorine containing layer at a temperature and for a time period which in combination are effective to drive fluorine from the fluorine containing layer into the polycrystalline thin film layer and incorporate fluorine within the grain boundaries to passivate said grain boundaries; and d) providing a transistor gate operatively adjacent the thin film transistor layer. The thin film transistor can be fabricated to be bottom gated or top gated. A buffering layer can be provided intermediate the thin film transistor layer and the fluorine containing layer, with the buffering layer being transmissive of fluorine from the fluorine containing layer during the annealing.Type: ApplicationFiled: June 26, 2009Publication date: December 10, 2009Applicant: MICRON TECHNOLOGY, INC.Inventors: Gurtej S. Sandhu, Shubneesh Batra, Pierre C. Fazan
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Patent number: 7566907Abstract: A method of forming a thin film transistor relative to a substrate includes, a) providing a thin film transistor layer of polycrystalline material on a substrate, the polycrystalline material comprising grain boundaries; b) providing a fluorine containing layer adjacent the polycrystalline thin film layer; c) annealing the fluorine containing layer at a temperature and for a time period which in combination are effective to drive fluorine from the fluorine containing layer into the polycrystalline thin film layer and incorporate fluorine within the grain boundaries to passivate said grain boundaries; and d) providing a transistor gate operatively adjacent the thin film transistor layer. The thin film transistor can be fabricated to be bottom gated or top gated. A buffering layer can be provided intermediate the thin film transistor layer and the fluorine containing layer, with the buffering layer being transmissive of fluorine from the fluorine containing layer during the annealing.Type: GrantFiled: June 9, 2008Date of Patent: July 28, 2009Assignee: Micron Technology, Inc.Inventors: Gurtej S. Sandhu, Shubneesh Batra, Pierre C. Fazan
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Publication number: 20090047776Abstract: A method of forming a thin film transistor relative to a substrate includes, a) providing a thin film transistor layer of polycrystalline material on a substrate, the polycrystalline material comprising grain boundaries; b) providing a fluorine containing layer adjacent the polycrystalline thin film layer; c) annealing the fluorine containing layer at a temperature and for a time period which in combination are effective to drive fluorine from the fluorine containing layer into the polycrystalline thin film layer and incorporate fluorine within the grain boundaries to passivate said grain boundaries; and d) providing a transistor gate operatively adjacent the thin film transistor layer. The thin film transistor can be fabricated to be bottom gated or top gated. A buffering layer can be provided intermediate the thin film transistor layer and the fluorine containing layer, with the buffering layer being transmissive of fluorine from the fluorine containing layer during the annealing.Type: ApplicationFiled: October 24, 2008Publication date: February 19, 2009Applicant: MICRON TECHNOLOGY, INC.Inventors: Gurtej S. Sandhu, Shubneesh Batra, Pierre C. Fazan
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Patent number: 7452760Abstract: A method of forming a thin film transistor relative to a substrate includes, a) providing a thin film transistor layer of polycrystalline material on a substrate, the polycrystalline material comprising grain boundaries; b) providing a fluorine containing layer adjacent the polycrystalline thin film layer; c) annealing the fluorine containing layer at a temperature and for a time period which in combination are effective to drive fluorine from the fluorine containing layer into the polycrystalline thin film layer and incorporate fluorine within the grain boundaries to passivate said grain boundaries; and d) providing a transistor gate operatively adjacent the thin film transistor layer. The thin film transistor can be fabricated to be bottom gated or top gated. A buffering layer can be provided intermediate the thin film transistor layer and the fluorine containing layer, with the buffering layer being transmissive of fluorine from the fluorine containing layer during the annealing.Type: GrantFiled: December 21, 2006Date of Patent: November 18, 2008Assignee: Micron Technology, Inc.Inventors: Gurtej S. Sandhu, Shubneesh Batra, Pierre C. Fazan
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Publication number: 20080237601Abstract: A method of forming a thin film transistor relative to a substrate includes, a) providing a thin film transistor layer of polycrystalline material on a substrate, the polycrystalline material comprising grain boundaries; b) providing a fluorine containing layer adjacent the polycrystalline thin film layer; c) annealing the fluorine containing layer at a temperature and for a time period which in combination are effective to drive fluorine from the fluorine containing layer into the polycrystalline thin film layer and incorporate fluorine within the grain boundaries to passivate said grain boundaries; and d) providing a transistor gate operatively adjacent the thin film transistor layer. The thin film transistor can be fabricated to be bottom gated or top gated. A buffering layer can be provided intermediate the thin film transistor layer and the fluorine containing layer, with the buffering layer being transmissive of fluorine from the fluorine containing layer during the annealing.Type: ApplicationFiled: June 9, 2008Publication date: October 2, 2008Inventors: Gurtej S. Sandhu, Shubneesh Batra, Pierre C. Fazan