Abstract: Process of fabricating an active matrix display screen in which there are left after the second photo-etching segments (S) forming conductive bridges (120, 110, 112, 114) over breaks (103) in the conductive layer (102) forming the columns.

Abstract: Method for the manufacture of electronic circuits based on thin-film transistors and capacitors.According to the invention this method comprises the following operations: deposition of a layer (102) of a first transparent, conductive material on an insulating substrate (100), first photogravure applied to the first layer to constitute blocks (106) forming one of the plates of the future capacitors, as well as the sources and drains for the future transistors, deposition of a hydrogenated, amorphous silicon layer (110), deposition of an insulating layer (112), deposition of a layer (114) of a second conductive material and second photogravure applied to the silicon layer-insulating layer-conductive layer assembly in order to define the control grids of the transistors.Application to the construction of display screen control circuits or BBD registers.