Patents by Inventor Pieter Bart Aloïs DE BUCK

Pieter Bart Aloïs DE BUCK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic method and apparatus
    Patent number: 10620548
    Abstract: A method comprising illuminating a patterning device (MA?) comprising a plurality of patterned regions (15a-15c) of which each patterns a measurement beam (17a-17c), projecting, with a projection system (PL), the measurement beams onto a sensor apparatus (21) comprising a plurality of detector regions (25a-25c), making a first measurement of radiation when the patterning device and the sensor apparatus are positioned in a first relative configuration, moving at least one of the patterning device and the sensor apparatus so as to change the relative configuration of the patterning device to a second relative configuration, making a second measurement of radiation when the patterning device and the sensor apparatus are positioned in the second relative configuration in which at least some of the plurality of detector regions receive a different measurement beam to the measurement beam which was received at the respective detector region in the first relative configuration and determining aberrations caused by t
    Type: Grant
    Filed: April 18, 2016
    Date of Patent: April 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Pieter Bart Aloïs De Buck, Nico Vanroose, Giovanni Imponente, Roland Johannes Wilhelmus Stas, Chanpreet Kaur, James Robert Downes
  • Lithographic Method and Apparatus
    Publication number: 20180088467
    Abstract: A method comprising illuminating a patterning device (MA?) comprising a plurality of patterned regions (15a-15c) of which each patterns a measurement beam (17a-17c), projecting, with a projection system (PL), the measurement beams onto a sensor apparatus (21) comprising a plurality of detector regions (25a-25c), making a first measurement of radiation when the patterning device and the sensor apparatus are positioned in a first relative configuration, moving at least one of the patterning device and the sensor apparatus so as to change the relative configuration of the patterning device to a second relative configuration, making a second measurement of radiation when the patterning device and the sensor apparatus are positioned in the second relative configuration in which at least some of the plurality of detector regions receive a different measurement beam to the measurement beam which was received at the respective detector region in the first relative configuration and determining aberrations caused by t
    Type: Application
    Filed: April 18, 2016
    Publication date: March 29, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus BASELMANS, Pieter Bart Aloïs DE BUCK, Nico VANROOSE, Giovanni IMPONENTE, Roland Johannes Wilhelmus STAS, Chanpreet KAUR, James Robert DOWNES