Patents by Inventor Pieter Cristiaan DE GROOT

Pieter Cristiaan DE GROOT has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200363573
    Abstract: A two-dimensional diffraction grating for a phase-stepping measurement system for determining an aberration map for a projection system comprises a substrate provided with a square array of through-apertures, wherein the diffraction grating is self-supporting. It will be appreciated that for a substrate provided with a square array of through-apertures to be self-supporting at least some substrate material is provided between each through-aperture and the adjacent through apertures. A method of designing a two-dimensional diffraction grating for a phase-stepping measurement system for determining an aberration map for a projection system comprises: selecting a general geometry for the two-dimensional diffraction grating, the general geometry having at least one parameter; and selecting values for the least one parameter that result in a grating efficiency map for the two-dimensional diffraction grating so as to control the contributions to a first harmonic of a phase stepping signal.
    Type: Application
    Filed: January 4, 2019
    Publication date: November 19, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Pieter Cristiaan DE GROOT, Johannes Jacobus Matheus BASELMANS, Derick Yun Chek CHONG, Yassin CHOWDHURY
  • Patent number: 10732498
    Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: August 4, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Pieter Cristiaan De Groot, Gerard Frans Jozef Schasfoort, Maksym Yuriiovych Sladkov, Manfred Petrus Johannes Maria Dikkers, Jozef Maria Finders, Pieter-Jan Van Zwol, Johannes Jacobus Matheus Baselmans, Stefan Michael Bruno Baumer, Laurentius Cornelius De Winter, Wouter Joep Engelen, Marcus Adrianus Van De Kerkhof, Robbert Jan Voogd
  • Publication number: 20190324365
    Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
    Type: Application
    Filed: July 3, 2019
    Publication date: October 24, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Pieter Cristiaan DE GROOT, Gerard Frans Jozef SCHASFOORT, Maksym Yuriiovych SLADKOV, Manfred Petrus Johannes M DIKKERS, Jozef Maria FINDERS, Pieter-Jan VAN ZWOL, Johannes Jacobus Matheus BASELMANS, Stefan Michael Bruno BAUMER, Laurentius Cornelius DE WINTER, Wouter Joep ENGELEN, Marcus Adrianus VAN DE KERKHOF, Robbert Jan VOOGD
  • Patent number: 10401723
    Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
    Type: Grant
    Filed: May 30, 2017
    Date of Patent: September 3, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Pieter Cristiaan De Groot, Gerard Frans Jozef Schasfoort, Maksym Yuriiovych Sladkov, Manfred Petrus Johannes Maria Dikkers, Jozef Maria Finders, Pieter-Jan Van Zwol, Johannes Jacobus Matheus Baselmans, Stefan Michael Bruno Baumer, Laurentius Cornelius De Winter, Wouter Joep Engelen, Marcus Adrianus Van De Kerkhof, Robbert Jan Voogd
  • Publication number: 20190137861
    Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
    Type: Application
    Filed: May 30, 2017
    Publication date: May 9, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Pieter Cristiaan DE GROOT, Gerard Frans Jozef SCHASFOORT, Maksym Yuriiovych SLADKOV, Manfred Petrus Johannes Maria DIKKERS, Jozef Maria FINDERS, Pieter-Jan VAN ZWOL, Johannes Jacobus Matheus BASELMANS, Stefan Michael Bruno BAUMER, Laurentius Cornelius DE WINTER, Wouter Joep ENGELEN, Marcus Adrianus VAN DE KERKHOF, Robbert Jan VOOGD