Patents by Inventor Pieter Debrauwer

Pieter Debrauwer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method
    Patent number: 8675169
    Abstract: A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.
    Type: Grant
    Filed: October 14, 2011
    Date of Patent: March 18, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Frank Johannes Jacobus Van Boxtel, Marinus Johannes Maria Van Dam, Johannes Christiaan Maria Jasper, Ronald Van Der Ham, Sergei Yurievich Shulepov, Gerben Pieterse, Marco Baragona, Pieter Debrauwer, Antonius Arnoldus Henricus Van Der Steen
  • Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method
    Patent number: 8675170
    Abstract: A gas manifold to direct a gas flow between two parallel plates of an optical component of a lithographic apparatus, the gas manifold having an inlet to provide a gas flow to the gas manifold, a lattice comprising a plurality of through holes to homogenize the gas flow, a contractor downstream of the lattice to reduce the cross sectional area through which the gas flow flows, and an outlet downstream of the contractor to provide the gas flow to the two parallel plates.
    Type: Grant
    Filed: February 27, 2012
    Date of Patent: March 18, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Frank Johannes Jacobus Van Boxtel, Pieter Debrauwer, Antonius Arnoldus Henricus Van Der Steen, Robin Bernardus Johannes Koldeweij
  • GAS MANIFOLD, MODULE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFATURING METHOD
    Publication number: 20120218532
    Abstract: A gas manifold to direct a gas flow between two parallel plates of an optical component of a lithographic apparatus, the gas manifold having an inlet to provide a gas flow to the gas manifold, a lattice comprising a plurality of through holes to homogenize the gas flow, a contractor downstream of the lattice to reduce the cross sectional area through which the gas flow flows, and an outlet downstream of the contractor to provide the gas flow to the two parallel plates.
    Type: Application
    Filed: February 27, 2012
    Publication date: August 30, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Frank Johannes Jacobus VAN BOXTEL, Pieter Debrauwer, Antonius Arnoldus Henricus Van Der Steen, Robin Bernardus Johannes Koldeweij
  • GAS MANIFOLD, MODULE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120092631
    Abstract: A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.
    Type: Application
    Filed: October 14, 2011
    Publication date: April 19, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Frank Johannes Jacobus VAN BOXTEL, Marinus Johannes Maria Van Dam, Johannes Christiaan Maria Jasper, Ronald Van Der Ham, Sergei Yurievich Shulepov, Gerben Pieterse, Marco Baragona, Pieter Debrauwer, Antonius Arnoldus Henricus Van Der Steen