Abstract: The invention relates to a charged particle system for processing a target surface with at least one charged particle beam. The system comprises an optical column with a beam generator module for generating a plurality of charged particle beams, a beam modulator module for switching on and off said plurality of beams and a beam projector module for projecting beams or subbeams on said target surface. The system further comprises a frame supporting each of said modules in a fixed position and alignment elements for aligning at least one of beams and/or subbeams with a downstream module element.

Abstract: The invention relates to a support structure for supporting a wafer table in a lithography system, said support structure comprising: a base comprising a reference surface, an interface member, made from a low thermal expansion material, arranged on top of said base and adapted for positioning said wafer table on the support structure, wherein said interface member is connected to said reference surface via at least one strut, and wherein the at least one strut is made from a low thermal expansion material. The invention further relates to a lithography system comprising such a support structure.

Abstract: The invention relates to an assembly, preferably for use in a lithography system or a microscopy system, for providing an accurately aligned stack of two or more modules in a stacking direction. Each of the two or more modules comprises three support members. The assembly comprises a frame comprising three planar alignment surfaces which extend in the stacking direction and which are angularly off-set with respect to each other. In addition each of the three support members of each one of the two or more modules, when arranged in said frame, abuts against a corresponding one of the three alignment surfaces. The frame is provided with an opening between two of the three planar alignment surfaces for inserting a module in the assembly, said two planar alignment surfaces on either side of the opening are arranged at least partially facing said opening.

Abstract: The invention relates to an assembly, preferably for use in a lithography system or a microscopy system, for providing an accurately aligned stack of two or more modules in a stacking direction. Each of the two or more modules comprises three support members. The assembly comprises a frame comprising three planar alignment surfaces which extend in the stacking direction and which are angularly off-set with respect to each other. In addition each of the three support members of each one of the two or more modules, when arranged in said frame, abuts against a corresponding one of the three alignment surfaces. The frame is provided with an opening between two of the three planar alignment surfaces for inserting a module in the assembly, said two planar alignment surfaces on either side of the opening are arranged at least partially facing said opening.

Abstract: The invention relates to a support structure for supporting a wafer table in a lithography system, said support structure comprising: a base comprising a reference surface, an interface member, made from a low thermal expansion material, arranged on top of said base and adapted for positioning said wafer table on the support structure, wherein said interface member is connected to said reference surface via at least one strut, and wherein the at least one strut is made from a low thermal expansion material. The invention further relates to a lithography system comprising such a support structure.

Abstract: The invention relates to a charged particle system for processing a target surface with at least one charged particle beam. The system comprises an optical column with a beam generator module for generating a plurality of charged particle beams, a beam modulator module for switching on and off said plurality of beams and a beam projector module for projecting beams or subbeams on said target surface. The system further comprises a frame supporting each of said modules in a fixed position and alignment elements for aligning at least one of beams and/or subbeams with a downstream module element.

Abstract: A structure such as an electronically deformable mirror contains a deformable membrane, an array of actuators located facing the membrane, each actuator being arranged to actuate local displacement of the membrane perpendicular to its surface. The actuators and the membrane are connected via an array of actuating connections. The actuating connections substantially transmit movement perpendicular to the second surface, but leave planar displacement and/or local rotation of the second surface substantially free. Preferably, the actuators contain an array of soft magnetic islands on a soft magnetic base plane, with actuator coils running around the islands and a system of sort magnetic walls on the base plane to separate the coils. The walls support a soft magnetic resilient surface that extend over of the islands and serve to drive the actuating connections.