Patents by Inventor Pieter Lein Joseph Gunter
Pieter Lein Joseph Gunter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11300890Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.Type: GrantFiled: December 20, 2019Date of Patent: April 12, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks
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Publication number: 20200124993Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.Type: ApplicationFiled: December 20, 2019Publication date: April 23, 2020Applicant: AS ML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis KUNNEN, Johannes Henricus Wilhelmus JACOBS, Coen Cornelis Wilhelmus VERSPAGET, Ronald VAN DER HAM, Ivo Adam Johannes THOMAS, Martijn HOUBEN, Thibault Simon Mathieu LAURENT, Gregory Martin Mason CORCORAN, Ruud Hendrikus Martinus Johannes BLOKS, Gerben PIETERSE, Pieter Lein Joseph GUNTER, Marinus Jan REMIE, Sander Catharina Reinier DERKS
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Patent number: 10534270Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.Type: GrantFiled: February 7, 2019Date of Patent: January 14, 2020Assignee: ASML Netherlands B.V.Inventors: Norbertus Josephus Martinus Van den Nieuwelaar, Victor Manuel Blanco Carballo, Casper Roderik De Groot, Rolf Hendrikus Jacobus Custers, David Merritt Phillips, Frederik Antonius Van der Zanden, Pieter Lein Joseph Gunter, Erik Henricus Egidius Catharina Eummelen, Yuri Johannes Gabriël Van de Vijver, Bert Dirk Scholten, Marijn Wouters, Ronald Frank Kox, Jorge Alberto Vieyra Salas
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Patent number: 10520837Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.Type: GrantFiled: February 16, 2018Date of Patent: December 31, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks
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Publication number: 20190187568Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.Type: ApplicationFiled: February 7, 2019Publication date: June 20, 2019Applicant: ASML Netherlands B.V.Inventors: Norbertus Josephus Martinus VAN DEN NIEUWELAAR, Victor Manuel BLANCO CARBALLO, Casper Roderik DE GROOT, Rolf Hendrikus Jacobus CUSTERS, David Merritt PHILLIPS, Frederik Antonius VAN DER ZANDEN, Pieter Lein Joseph GUNTER, Erik Henricus Egidius Catharina EUMMELEN, Yuri Johannes Gabriël VAN DE VIJVER, Bert Dirk SCHOLTEN, Marijn WOUTERS, Ronald Frank KOX, Jorge Alberto VIEYRA SALAS
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Patent number: 10261422Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.Type: GrantFiled: June 30, 2015Date of Patent: April 16, 2019Assignee: ASML Netherlands B.V.Inventors: Norbertus Josephus Martinus Van Den Nieuwelaar, Victor Manuel Blanco Carballo, Casper Roderik De Groot, Rolf Hendrikus Jacobus Custers, David Merritt Phillips, Frederik Antonius Van Der Zanden, Pieter Lein Joseph Gunter, Erik Henricus Egidius Catharina Eummelen, Yuri Johannes Gabriël Van De Vijver, Bert Dirk Scholten, Marijn Wouters, Ronald Frank Kox, Jorge Alberto Vieyra Salas
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Publication number: 20180284627Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.Type: ApplicationFiled: February 16, 2018Publication date: October 4, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks
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Patent number: 9904177Abstract: A fluid handling structure, lithographic apparatus and device manufacturing method are disclosed. According to a disclosed embodiment, the fluid handling structure is configured to confine an immersion fluid in a space between a final element of a projection system and a facing surface during movement of the facing surface relative to the structure, wherein the structure has at least one heater to heat a portion of the facing surface adjacent to the heater, the at least one heater having a fluid heater to heat fluid flow from the structure onto the facing surface, the heater thereby heating the portion.Type: GrantFiled: August 22, 2012Date of Patent: February 27, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Ivo Adam Johannes Thomas, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter
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Patent number: 9897928Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.Type: GrantFiled: August 15, 2012Date of Patent: February 20, 2018Assignee: ASML Netherlands B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks
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Publication number: 20170219933Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.Type: ApplicationFiled: June 30, 2015Publication date: August 3, 2017Applicant: ASML Netherlands B.V.Inventors: Norbertus Josephus Martinus VAN DEN NIEUWELAAR, Victor Manuel BLANCO CARBALLO, Casper Roderik DE GROOT, Rolf Hendrikus Jacobus CUSTERS, David Merritt PHILLIPS, Frederik Antonius VAN DER ZANDEN, Pieter Lein Joseph GUNTER, Erik Henricus Egidius Catharina EUMMELEN, Yuri Johannes Gabriël VAN DE VIJVER, Bert Dirk SCHOLTEN, Marijn WOUTERS, Ronald Frank KOX, Jorge Alberto VIEYRA SALAS
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Patent number: 8405817Abstract: A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.Type: GrantFiled: February 1, 2010Date of Patent: March 26, 2013Assignee: ASML Netherlands B.V.Inventors: Marco Koert Stavenga, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens, Erik Henricus Egidius Catharina Eummelen, Richard Moerman, Michel Riepen, Sergei Shulepov, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Jan Willem Cromwijk, Ralph Joseph Meijers, Fabrizio Evangelista, David Bessems, Hua Li, Marinus Jochemsen, Pieter Lein Joseph Gunter, Franciscus Wilhelmus Bell, Erik Witberg, Marcus Agnes Johannes Smits, Zhenhua Ma
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Publication number: 20130050665Abstract: A fluid handling structure, lithographic apparatus and device manufacturing method are disclosed. According to a disclosed embodiment, the fluid handling structure is configured to confine an immersion fluid in a space between a final element of a projection system and a facing surface during movement of the facing surface relative to the structure, wherein the structure has at least one heater to heat a portion of the facing surface adjacent to the heater, the at least one heater having a fluid heater to heat fluid flow from the structure onto the facing surface, the heater thereby heating the portion.Type: ApplicationFiled: August 22, 2012Publication date: February 28, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Ivo Adam Johannes Thomas, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter
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Publication number: 20130045447Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.Type: ApplicationFiled: August 15, 2012Publication date: February 21, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks
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Publication number: 20100214543Abstract: A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.Type: ApplicationFiled: February 1, 2010Publication date: August 26, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Marco Koert Stavenga, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens, Erik Henricus Egidius Catharina Eummelen, Richard Moerman, Michel Riepen, Sergei Shulepov, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Jan Willem Cromwijk, Ralph Joseph Meijers, Fabrizio Evangelista, David Bessems, Hua Li, Marinus Jochemsen, Pieter Lein Joseph Gunter, Franciscus Wilhelmus Bell, Erik Witberg, Marcus Agnes Johannes Smits, Zhenhua Ma