Patents by Inventor Pieter Mulder
Pieter Mulder has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 10649341Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.Type: GrantFiled: October 6, 2016Date of Patent: May 12, 2020Assignee: ASML Netherlands B.V.Inventors: Clemens Johannes Gerardus Van Den Dungen, Nicolaas Franciscus Koppelaars, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens, Erik Henricus Egidius Catharina Eummelen, Marcel Beckers, Richard Moerman, Cédric Désiré Grouwstra, Danny Maria Hubertus Philips, Remko Jan Peter Verhees, Pieter Mulder, Evert Van Vliet
-
Patent number: 9618835Abstract: In a liquid confinement structure of an immersion lithographic apparatus an elongate continuous opening forms an outlet for supplying liquid to a space beneath the projection system. The elongate slit forms a region of high shear and pressure gradient that deflects bubbles away from the image field.Type: GrantFiled: January 31, 2011Date of Patent: April 11, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Daniel Jozef Maria Direcks, Erik Henricus Egidius Catharina Eummelen, Clemens Johannes Gerardus Van Den Dungen, Maikel Adrianus Cornelis Schepers, Sergei Shulepov, Pieter Mulder, David Bessems, Marco Baragona
-
Publication number: 20170023870Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.Type: ApplicationFiled: October 6, 2016Publication date: January 26, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Clemens Johannes Gerardus VAN DEN DUNGEN, Nicolaas Franciscus Koppelaars, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens, Erik Henricus Egidius Catharina Eummelen, Marcel Beckers, Richard Moerman, Cédric Désiré Grouwstra, Danny Maria Hubertus Philips, Remko Jan Peter Verhees, Pieter Mulder, Evert Van Vliet
-
Patent number: 9465302Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.Type: GrantFiled: May 5, 2015Date of Patent: October 11, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Clemens Johannes Gerardus Van Den Dungen, Nicolaas Franciscus Koppelaars, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens, Erik Henricus Egidius Catharina Eummelen, Marcel Beckers, Richard Moerman, Cédric Désiré Grouwstra, Danny Maria Hubertus Philips, Remko Jan Peter Verhees, Pieter Mulder, Evert Van Vliet
-
Publication number: 20150234294Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.Type: ApplicationFiled: May 5, 2015Publication date: August 20, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Clemens Johannes Gerardus VAN DEN DUNGEN, Nicolaas Franciscus KOPPELAARS, Martinus Hendrikus Antonius LEENDERS, Paulus Martinus Maria LIEBREGTS, Johannes Catharinus Hubertus MULKENS, Erik Henricus Egidius Catharina EUMMELEN, Marcel BECKERS, Richard MOERMAN, Cédric Désiré GROUWSTRA, Danny Maria Hubertus PHILIPS, Remko Jan Peter VERHEES, Pieter MULDER, Evert VAN VLIET
-
Patent number: 9036127Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.Type: GrantFiled: April 14, 2009Date of Patent: May 19, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Clemens Johannes Gerardus Van den Dungen, Nicolaas Franciscus Koppelaars, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens, Erik Henricus Egidius Catharina Eummelen, Marcel Beckers, Richard Moerman, Cédric Désiré Grouwstra, Danny Maria Hubertus Philips, Remko Jan Peter Verhees, Pieter Mulder, Evert Van Vliet
-
Patent number: 8836915Abstract: An immersion lithographic apparatus is disclosed having a projection system configured to direct a patterned beam of radiation onto a substrate and a liquid handling system configured to supply and confine immersion liquid to a space defined between the projection system and a substrate, or a substrate table, or both. A controller is provided to adjust an angle of a lower surface of the liquid handling system relative to the top surface of the substrate during motion of the substrate and/or substrate table relative to the liquid handling system dependent upon a position of the substrate and/or substrate table relative to the liquid handling system and/or a direction of relative movement between the substrate and/or substrate table and the liquid handling system.Type: GrantFiled: February 23, 2012Date of Patent: September 16, 2014Assignee: ASML Netherlands B.V.Inventors: Pieter Mulder, Jan Willem Cromwijk, Jimmy Matheus Wilhelmus Van De Winkel, Marjan Leonardus Catharina Hoofman, Ferdinand Bernardus Johannus Wilhelmus Maria Hendriks
-
Patent number: 8638417Abstract: A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.Type: GrantFiled: April 12, 2011Date of Patent: January 28, 2014Assignee: ASML Netherlands B.V.Inventors: Danny Maria Hubertus Philips, Daniel Jozef Maria Direcks, Clemens Johannes Gerardus Van Den Dungen, Maikel Adrianus Cornelis Schepers, Paul Petrus Joannes Berkvens, Marcus Johannes Van Der Zanden, Pieter Mulder
-
Patent number: 8259283Abstract: An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.Type: GrantFiled: March 20, 2009Date of Patent: September 4, 2012Assignee: ASML Netherlands B.V.Inventors: Daniël Jozef Maria Direcks, Nicolaas Rudolf Kemper, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Danny Maria Hubertus Philips, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Marcus Johannes Van Der Zanden, Pieter Mulder
-
Publication number: 20120218534Abstract: An immersion lithographic apparatus is disclosed having a projection system configured to direct a patterned beam of radiation onto a substrate and a liquid handling system configured to supply and confine immersion liquid to a space defined between the projection system and a substrate, or a substrate table, or both. A controller is provided to adjust an angle of a lower surface of the liquid handling system relative to the top surface of the substrate during motion of the substrate and/or substrate table relative to the liquid handling system dependent upon a position of the substrate and/or substrate table relative to the liquid handling system and/or a direction of relative movement between the substrate and/or substrate table and the liquid handling system.Type: ApplicationFiled: February 23, 2012Publication date: August 30, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Pieter MULDER, Jan Willem CROMWIJK, Jimmy Matheus Wilhelmus VAN DE WINKEL, Marjan Leonardus Catharina HOOFMAN, Ferdinand Bernardus Johannus Wilhelmus Maria HENDRIKS
-
Publication number: 20110255062Abstract: A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.Type: ApplicationFiled: April 12, 2011Publication date: October 20, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Danny Maria Hubertus PHILIPS, Daniel Jozef Maria DIRECKS, Clemens Johannes Gerardus VAN DEN DUNGEN, Maikel Adrianus Cornelis SCHEPERS, Paul Petrus Joannes BERKVENS, Marcus Johannes VAN DER ZANDEN, Pieter MULDER
-
Publication number: 20110188012Abstract: In a liquid confinement structure of an immersion lithographic apparatus an elongate continuous opening forms an outlet for supplying liquid to a space beneath the projection system. The elongate slit forms a region of high shear and pressure gradient that deflects bubbles away from the image field.Type: ApplicationFiled: January 31, 2011Publication date: August 4, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Daniel Jozef Maria DIRECKS, Erik Henricus Egidius Catharina Eummelen, Clemens Johannes Gerardus Van Den Dungen, Maikel Adrianus Cornelis Schepers, Sergei Shulepov, Pieter Mulder, David Bessems, Marco Baragona
-
Patent number: 7869722Abstract: A toner dam maintenance process and system model the amount of toner mass at a toner cleaner blade, and apply a corrective procedure, such as insertion of a paperless copy into the print job mid-job or immediately prior to cycle out, to replenish the toner mass at the cleaner blade to maintain lubrication and reduce cleaning failure. The modeling includes contributing factors toward toner dam input and output, including untransferred toner, cycle-in/cycle-out bands, untransferred background, and leakage of toner from the cleaner blade. One or several threshold can be reached to cause one or more different corrective actions to take place. The action may be adding or skipping a pitch to insert a corrective maintenance pattern without transfer.Type: GrantFiled: November 21, 2007Date of Patent: January 11, 2011Assignee: Xerox CorporationInventors: Derek John Milton, Stuart John Handley, Tim Spink, Julian Derek Morrison, Pieter Mulder
-
Patent number: 7729651Abstract: A web cleaning system for a fuser system includes a web which is biased into contact with a rotating cylindrical member, such as a fuser roll, as the fuser roll is rotated about its axis of rotation. A lateral displacement system displaces the web, relative to the cylindrical member, in a direction parallel to the axis of rotation of the cylindrical member. In this way, regions of the web which have become contaminated with collected toner are shifted laterally, thus avoiding oversaturation of the web.Type: GrantFiled: December 21, 2005Date of Patent: June 1, 2010Assignee: Xerox CorporationInventors: John Poxon, Nicholas Baxter, Ian Pitts, Pieter Mulder, Martin Callis, Riley Brede
-
Publication number: 20090262318Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.Type: ApplicationFiled: April 14, 2009Publication date: October 22, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Clemens Johannes Gerardus VAN DEN DUNGEN, Nicolaas Franciscus KOPPELAARS, Martinus Hendrikus Antonius LEENDERS, Paulus Martinus Maria LIEBREGTS, Johannes Catharinus Hubertus MULKENS, Erik Henricus Egidius Catharina EUMMELEN, Marcel BECKERS, Richard MOERMAN, Cedric Desire GROUWSTRA, Danny Maria Hubertus PHILIPS, Remko Jan Peter VERHEES, Pieter MULDER, Evert VAN VLIET
-
Publication number: 20090237632Abstract: An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.Type: ApplicationFiled: March 20, 2009Publication date: September 24, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Daniel Jozef Maria Direcks, Nicolaas Rudolf Kemper, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Danny Maria Hubertus Philips, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Marcus Johannes Van Der Zanden, Pieter Mulder
-
Patent number: 7561841Abstract: A fuser apparatus includes first and second rolls rotatably mounted parallel to and in contact with each other to form a nip through which print media with a toner image thereon is passed to fuse the image to the print media. A cleaning system is provided for cleaning one of the rolls, such as the fuser roll. The cleaning system includes a rotatably mounted cleaning roll, an outer surface thereof including a pile. A flicker bar is arranged to detach toner from the pile.Type: GrantFiled: December 21, 2005Date of Patent: July 14, 2009Assignee: Xerox CorporationInventors: Martin Callis, Riley Brede, Pieter Mulder, John Poxon, Ian Pitts, Nicholas Baxter
-
Publication number: 20090129793Abstract: A toner dam maintenance process and system model the amount of toner mass at a toner cleaner blade, and apply a corrective procedure, such as insertion of a paperless copy into the print job mid-job or immediately prior to cycle out, to replenish the toner mass at the cleaner blade to maintain lubrication and reduce cleaning failure. The modeling includes contributing factors toward toner dam input and output, including untransferred toner, cycle-in/cycle-out bands, untransferred background, and leakage of toner from the cleaner blade. One or several threshold can be reached to cause one or more different corrective actions to take place. The action may be adding or skipping a pitch to insert a corrective maintenance pattern without transfer.Type: ApplicationFiled: November 21, 2007Publication date: May 21, 2009Applicant: XEROX CORPORATIONInventors: Derek John MILTON, Stuart John HANDLEY, Tim SPINK, Julian Derek MORRISON, Pieter MULDER
-
Patent number: 7532848Abstract: A roll useful in fusing marking material to a print sheet includes a coating disposed on at least a portion of the inner surface thereof. A lamp disposed inside the roll supplies radiant energy to the inner surface. The coating changes its absorptivity (such as color) as desired, to obtain specific desired temperatures at different portions of the roll. The coating can be thermochromic, changing its absorptivity in response to local temperature; or electrochromic, changing its absorptivity in response to an external electrical stimulus.Type: GrantFiled: July 14, 2008Date of Patent: May 12, 2009Assignee: Xerox CorporationInventors: Scott M Potter, John Poxon, Pieter Mulder
-
Patent number: 7460822Abstract: A roll useful in fusing marking material to a print sheet includes a coating disposed on at least a portion of the inner surface thereof. A lamp disposed inside the roll supplies radiant energy to the inner surface. The coating changes its absorptivity (such as color) as desired, to obtain specific desired temperatures at different portions of the roll. The coating can be thermochromic, changing its absorptivity in response to local temperature; or electrochromic, changing its absorptivity in response to an external electrical stimulus.Type: GrantFiled: August 3, 2006Date of Patent: December 2, 2008Assignee: Xerox CorporationInventors: Scott M. Potter, John Poxon, Pieter Mulder