Patents by Inventor Pieter Renaat Maria Hennus
Pieter Renaat Maria Hennus has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220155675Abstract: An object handling apparatus for handling a generally planar object, the object handling apparatus including: two support arms, at least one of the two support arms movable relative to another support arm generally in a plane such that the two support arms are operable to grip and hold an object disposed in the plane, wherein each of the support arms includes at least one support pad and at least one aligner, the support pads configured to locally contact a surface of the object and apply a force thereto generally perpendicular to the plane so as to support the object and the at least one aligner configured to locally contact a surface of the object and apply a force thereto generally in the plane so as to grip the object.Type: ApplicationFiled: February 25, 2020Publication date: May 19, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Ilya MALAKHOVSKY, Derk Servatius Gertruda BROUNS, Joffrey Rene Sylvian CRAQUELIN, Edward HAGE, Pieter Renaat Maria HENNUS, Jan Willem Adriaan OOSTERLING, Ludolf POSTMA, Marcel Duco SNEL, Johannes Charles Adrianus VAN DEN BERG, Wouter VAN DER CHIJS, Bartel Joris VAN DER VEEK, Mike Johannes Antonius VAN KUIJK, Marina Antoinetta Leonarda VAN UUM-VAN HERK, Henricus Marinus Theodorus WIERSMA
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Patent number: 10578959Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body includes a projection configured such that it surrounds the object holder and such that, in use, a layer of immersion liquid is retained on the projection and in contact with an object supported on the object holder.Type: GrantFiled: March 22, 2016Date of Patent: March 3, 2020Assignee: ASML Netherlands B.V.Inventors: Gijs Kramer, Simon Karel Ravensbergen, Niek Jacobus Johannes Roset, Pieter Renaat Maria Hennus
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Publication number: 20180107107Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder, The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder.Type: ApplicationFiled: March 22, 2016Publication date: April 19, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Gijs KRAMER, Simon Karel RAVENSBERGEN, Niek Jacobus Johannes ROSET, Pieter Renaat Maria HENNUS
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Patent number: 9494869Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.Type: GrantFiled: December 5, 2012Date of Patent: November 15, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Arno Jan Bleeker, Pieter Renaat Maria Hennus, Martinus Hendricus Henricus Hoeks, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee, Ruud Antonius Catharina Maria Beerens, Olof Martinus Josephus Fischer, Wilhelmus Henricus Theodorus Maria Aangenent, Niels Johannes Maria Bosch
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Patent number: 9136151Abstract: An actuator comprising a first part and a second part, the first part being configured to move relative to the second part, wherein a labyrinth seal is provided between the first part and the second part, the labyrinth seal being configured to restrict the flow of gas from a first side of the labyrinth seal to a second side of the labyrinth seal, wherein one or more inlets and one or more outlets are provided within the labyrinth seal, the one or more inlets being configured to provide gas to a location within the labyrinth seal and the one or more outlets being configured to remove at least part of the gas from a location within the labyrinth seal.Type: GrantFiled: June 24, 2011Date of Patent: September 15, 2015Assignee: ASML Netherlands B.V.Inventors: Fredrik Wilhelm Van Der Blij, Edwin Johan Buis, Pieter Renaat Maria Hennus, Johannes Charles Adrianus Van Den Berg, Johannes Andreas Henricus Maria Jacobs
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Patent number: 8860926Abstract: A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.Type: GrantFiled: September 22, 2011Date of Patent: October 14, 2014Assignee: ASML Netherlands B.V.Inventors: Pieter Renaat Maria Hennus, Jeroen Johannes Sophia Maria Mertens, Patrick Johannes Cornelus Hendrik Smulders, Peter Smits
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Publication number: 20120162628Abstract: An actuator comprising a first part and a second part, the first part being configured to move relative to the second part, wherein a labyrinth seal is provided between the first part and the second part, the labyrinth seal being configured to restrict the flow of gas from a first side of the labyrinth seal to a second side of the labyrinth seal, wherein one or more inlets and one or more outlets are provided within the labyrinth seal, the one or more inlets being configured to provide gas to a location within the labyrinth seal and the one or more outlets being configured to remove at least part of the gas from a location within the labyrinth seal.Type: ApplicationFiled: June 24, 2011Publication date: June 28, 2012Applicant: ASML Netherlands B.V.Inventors: Fredrik Wilhelm Van Der Blij, Edwin Johan Buis, Pieter Renaat Maria Hennus, Johannes Charles Adrianus Van Den Berg, Johannes Andreas Henricus Maria Jacobs
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Patent number: 8115905Abstract: A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.Type: GrantFiled: March 21, 2008Date of Patent: February 14, 2012Assignee: ASML Netherlands B.V.Inventors: Pieter Renaat Maria Hennus, Jeroen Johannes Sophia Maria Mertens, Patrick Johannes Cornelus Hendrik Smulders, Peter Smits
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Publication number: 20120008114Abstract: A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.Type: ApplicationFiled: September 22, 2011Publication date: January 12, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Pieter Renaat Maria HENNUS, Jeroen Johann Sophia Maria MERTENS, Patrick Johannes Cornelus Hendrik SMULDERS, Peter SMITS
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Patent number: 7791709Abstract: A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part positioned around the central part. The substrate support further includes a thermal decoupler arranged to decrease heat transport between the central part and the peripheral part.Type: GrantFiled: December 7, 2007Date of Patent: September 7, 2010Assignee: ASML Netherlands B.V.Inventors: Pieter Renaat Maria Hennus, Frits Van Der Meulen, Joost Jeroen Ottens, Peter Paul Steijaert, Hubert Matthieu Richard Steijns, Peter Smits
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Publication number: 20090148604Abstract: An exemplary substrate processing apparatus has a vacuum chamber and a load lock for gas removal. The load lock has a support table to support a substrate. A cover plate may be provided in the load lock, the cover plate having a lower surface facing the upper surface of the support table. Openings may be provided in the lower surface of the cover plate to allow removal of gas from over the substrate in a direction substantially normal to the lower surface. In an embodiment, a gas pressure between the upper surface of the support table and the substrate is initially reduced through the opening to a certain pressure below a concurrent load lock pressure. When the remainder of the load lock pressure has dropped below the certain, gas pressure between the upper surface of the support table and the substrate is reduced together with the remainder load lock pressure.Type: ApplicationFiled: November 14, 2008Publication date: June 11, 2009Applicant: ASML Netherlands B.V.Inventors: Raimond VISSER, Pieter Renaat Maria Hennus, Johannes Hendrikus Gertrudis Franssen, Erwin Theodorus Jacoba Verhagen
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Patent number: 7405810Abstract: The invention relates to a method for positioning a substrate relative to a substrate table, is presented. When the substrate is positioned on the substrate table for a first time, a first relative position of the substrate with respect to the substrate table is determined. When the substrate is positioned on the substrate table a second subsequent time, a second relative position of the substrate with respect to the substrate table is determined and the position of the substrate table with respect to the substrate is adjusted based on the first and second relative positions, so that the substrate is positioned with respect to the substrate table substantially equally to the first relative position.Type: GrantFiled: June 25, 2004Date of Patent: July 29, 2008Assignee: ASML Netherlands B.V.Inventors: Pieter Renaat Maria Hennus, Jacob Willem Vink
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Publication number: 20080174752Abstract: A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.Type: ApplicationFiled: March 21, 2008Publication date: July 24, 2008Applicant: ASML NETHERLANDS B.V.Inventors: PIETER RENAAT MARIA HENNUS, JEROEN JOHANNES SOPHIA MARA MERTENS, PATRICK JOHANNES CORNELUS HENDRIK SMULDERS, PETER SMITS
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Patent number: 7397539Abstract: The invention relates to a transfer apparatus for transferring an object. The transfer apparatus comprises a gripper for either gripping the object at a first position and then releasing the object at a second position proximate to a receiving structure or releasing the object at a first position after gripping the object at a second position proximate to the receiver structure. The transfer apparatus also includes a measurement device arranged to measure the relative position of the gripper with respect to the receiving structure in at least one dimension. Further, a relative position error is determined with respect to a desired relative position based on the relative position measured. The relative position of the gripper and receiving structure are adjusted in order to minimize the relative position error in the second position.Type: GrantFiled: March 23, 2004Date of Patent: July 8, 2008Assignee: ASML Netherlands, B.V.Inventors: Marcus Johannes Henricus Willems Van Dijk, Pieter Renaat Maria Hennus
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Publication number: 20080158526Abstract: A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part positioned around the central part. The substrate support further includes a thermal decoupler arranged to decrease heat transport between the central part and the peripheral part.Type: ApplicationFiled: December 7, 2007Publication date: July 3, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Pieter Renaat Maria Hennus, Frits Van Der Meulen, Joost Jeroen Ottens, Peter Paul Steijaert, Hubert Matthieu Richard Steijns, Peter Smits
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Publication number: 20080137055Abstract: A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part, the peripheral part comprising an extraction duct configured to extract a liquid from a top surface of the substrate support, the extraction duct connected to an exit duct configured to duct the liquid away from the substrate support. The substrate support further includes a thermal stabilizer, arranged in the peripheral part, configured to thermally stabilize a central part of the substrate support relative to the peripheral part.Type: ApplicationFiled: December 8, 2006Publication date: June 12, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Pieter Renaat Maria Hennus, Frits Van Der Meulen, Joost Jeroen Ottens, Peter Paul Steijaert, Hubert Matthieu Richard Steijns, Peter Smits
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Patent number: 7365827Abstract: A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.Type: GrantFiled: December 8, 2004Date of Patent: April 29, 2008Assignee: ASML Netherlands B.V.Inventors: Pieter Renaat Maria Hennus, Jeroen Johannes Sophia Mara Mertens, Patrick Johannes Cornelus Hendrik Smulders, Peter Smits
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Patent number: 7123349Abstract: The invention relates to a lithographic projection assembly, having at least two load locks for transferring substrates between a first environment and a lower pressure second environment, a substrate handler with a handler chamber within the second environment and a lithographic projection apparatus including a projection chamber. The handler chamber and the projection chamber communicate via a load position for entering a substrate from the handler chanter into the projection chamber and an unload position for removing the substrate from the projection chamber into the handler chamber. The handler chamber also includes pre-processing means for pre-processing of the substrates and transport means for transferring substrates between the load locks and pre-processing means.Type: GrantFiled: March 11, 2004Date of Patent: October 17, 2006Assignee: ASML Netherlands B.V.Inventors: Pieter Johannes Marius Van Groos, Pieter Renaat Maria Hennus, Jan Frederik Hoogkamp, Albert Jan Hendrik Klomp, Johannes Onvlee, Raimond Visser
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Publication number: 20040227924Abstract: The invention relates to a transfer apparatus for transferring an object. The transfer apparatus comprises a gripper for either gripping the object at a first position and then releasing the object at a second position proximate to a receiving structure or releasing the object at a first position after gripping the object at a second position proximate to the receiver structure. The transfer apparatus also includes a measurement device arranged to measure the relative position of the gripper with respect to the receiving structure in at least one dimension. Further, a relative position error is determined with respect to a desired relative position based on the relative position measured. The relative position of the gripper and receiving structure are adjusted in order to minimize the relative position error in the second position.Type: ApplicationFiled: March 23, 2004Publication date: November 18, 2004Applicant: ASML Netherlands B.V.Inventors: Marcus Johannes Henricus Willems Van Dijk, Pieter Renaat Maria Hennus
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Publication number: 20040218168Abstract: The invention relates to a lithographic projection assembly, comprising at least two load locks for transferring substrates between a first environment and a second environment, the second environment having a lower pressure than the first environment; a substrate handler comprising a handler chamber in which the second environment prevails; a lithographic projection apparatus comprising a projection chamber.Type: ApplicationFiled: March 11, 2004Publication date: November 4, 2004Applicant: ASML Netherlands B.V.Inventors: Pieter Johannes Marius Van Groos, Pieter Renaat Maria Hennus, Jan Frederik Hoogkamp, Albert Jan Hendrik Klomp, Johannes Onvlee, Raimond Visser