Patents by Inventor Pieter VERHOEFF

Pieter VERHOEFF has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SUPPORT FOR A WORK OF ART
    Publication number: 20220127044
    Abstract: The invention is directed to a support for a work of art comprising a base element for fixing the support to an interior wall of a shipping container and a clamping element for clamping the work of art and wherein the base element and the clamping element are fixed to each other by wire rope isolators.
    Type: Application
    Filed: October 20, 2021
    Publication date: April 28, 2022
    Applicant: TURTLE B.V.
    Inventors: Kerstin Annette KRACHT, Geert Cornelis Pieter VERHOEFF, Menno BOELSMA, Mirna BOELSMA
  • Method and apparatus for direct write maskless lithography
    Patent number: 10928736
    Abstract: An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including a plurality of two-dimensional arrays of radiation sources, each radiation source configured to emit a radiation beam; a projection system configured to project the modulated radiation onto the substrate, the projection system including a plurality of optical elements arranged side by side and arranged such that a two-dimensional array of radiation beams from a two-dimensional array of radiation sources impinges a single optical element of the plurality of optical elements; and an actuator configured to provide relative motion between the substrate and the plurality of two-dimensional arrays of radiation sources in a scanning direction to expose the substrate.
    Type: Grant
    Filed: December 13, 2016
    Date of Patent: February 23, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Pieter Willem Herman De Jager, Coen Adrianus Verschuren, Erwin Paul Smakman, Erwin John Van Zwet, Wouter Frans Willem Mulckhuyse, Pieter Verhoeff, Robert Albertus Johannes Van Der Werf
  • METHOD AND APPARATUS FOR DIRECT WRITE MASKLESS LITHOGRAPHY
    Publication number: 20190011841
    Abstract: An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including a plurality of two-dimensional arrays of radiation sources, each radiation source configured to emit a radiation beam; a projection system configured to project the modulated radiation onto the substrate, the projection system including a plurality of optical elements arranged side by side and arranged such that a two-dimensional array of radiation beams from a two-dimensional array of radiation sources impinges a single optical element of the plurality of optical elements; and an actuator configured to provide relative motion between the substrate and the plurality of two-dimensional arrays of radiation sources in a scanning direction to expose the substrate.
    Type: Application
    Filed: December 13, 2016
    Publication date: January 10, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Pieter Willem Herman DE JAGER, Coen Adrianus VERSCHUREN, Erwin Paul SMAKMAN, Erwin JOhn VAN ZWET, Wouter Frans Willem MULCKHUYSE, Pieter VERHOEFF, Robert Albertus Johannes VAN DER WERF