Abstract: A photolithographic system and a method for driving the same is disclosed that prevents a no-load operation and imbalance in a fabrication process generated by time differences between different stages of the fabrication process. The apparatus includes a first plate storing a substrate coated with a photosensitive layer before an exposure process, a second plate storing an exposed substrate before a development process, and an auxiliary buffer plate part storing the exposed substrate before the development process when another exposed substrate has been previously stored in the second plate.