Abstract: Provided is an apparatus for automatically classifying an input sound source according to a preset criterion and are an apparatus and method for automatically classifying a sound source according to a set criterion by using deep learning. The apparatus for classifying a sound source includes a processor and a memory connected to the processor and storing a deep learning algorithm and original sound data, wherein the memory stores program instructions executable by the processor to generate n pieces of image data corresponding to the original sound data according to a preset method, generate training image data corresponding to the original sound data by using the n pieces of image data, train the deep learning algorithm by using the training image data, and classify target sound data according to a preset criterion by using the deep learning algorithm, wherein the n is a natural number greater than or equal to 2.

Abstract: A semiconductor device including a two-dimensional material and a method of manufacturing the same are provided. The semiconductor device may include a first two-dimensional material layer including a first two-dimensional semiconductor material; a plurality of second two-dimensional material layers connected to the first two-dimensional material layer, each having a thickness greater than that of the first two-dimensional material layer, and including a doped two-dimensional semiconductor material; and a plurality of electrodes on the plurality of second two-dimensional material layers.

Abstract: A method of forming a material film includes providing a non-photosensitive mask on a substrate to expose a partial region of the substrate, forming a material film on the partial region of the substrate using a sputtering process, removing the non-photosensitive mask, and heat-treating the substrate and the material film from which the non-photosensitive mask is removed under a first gas atmosphere. The material film includes a transition metal and a chalcogen element. The sputtering process may include an RF magnetron sputtering process. The heat treatment may be performed at a higher temperature than a temperature of the forming the material film.