Patents by Inventor Ping-Chang Hsieh

Ping-Chang Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240069431
    Abstract: In a method of manufacturing an attenuated phase shift mask, a photo resist pattern is formed over a mask blank. The mask blank includes a transparent substrate, an etch stop layer on the transparent substrate, a phase shift material layer on the etch stop layer, a hard mask layer on the phase shift material layer and an intermediate layer on the hard mask layer. The intermediate layer is patterned by using the photo resist pattern as an etching mask, the hard mask layer is patterned by using the patterned intermediate layer as an etching mask, and the phase shift material layer is patterned by using the patterned hard mask layer as an etching mask. The intermediate layer includes at least one of a transition metal, a transition metal alloy, or a silicon containing material, and the hard mask layer is made of a different material than the intermediate layer.
    Type: Application
    Filed: February 16, 2023
    Publication date: February 29, 2024
    Inventors: Wei-Che HSIEH, Chien-Cheng Chen, Ping-Hsun Lin, Ta-Cheng Lien, Hsin-Chang Lee
  • Patent number: 11810492
    Abstract: The embodiments of the disclosure provide a method for determining an ambient light luminance, a host, and a computer readable storage medium. The method includes: obtaining a first frame and a second frame, wherein the first frame comprises a plurality of first regions of interest (ROI), the second frame comprises a plurality of second ROIs, and the first ROIs respectively correspond to the second ROIs; in response to determining that the first ROIs comprise at least one specific ROI satisfying a predetermined condition and at least one first candidate ROI, obtaining at least one second candidate ROI among the second ROIs, wherein the at least one second candidate ROI respectively correspond to the at least one specific ROI; and determining the ambient light luminance based on the at least one first candidate ROI and the at least one second candidate ROI.
    Type: Grant
    Filed: May 4, 2022
    Date of Patent: November 7, 2023
    Assignee: HTC Corporation
    Inventors: Chia-Wei Yu, Ping-Chang Hsieh, Chin-Yu Chang
  • Publication number: 20230186810
    Abstract: The embodiments of the disclosure provide a method for determining an ambient light luminance, a host, and a computer readable storage medium. The method includes: obtaining a first frame and a second frame, wherein the first frame comprises a plurality of first regions of interest (ROI), the second frame comprises a plurality of second ROIs, and the first ROIs respectively correspond to the second ROIs; in response to determining that the first ROIs comprise at least one specific ROI satisfying a predetermined condition and at least one first candidate ROI, obtaining at least one second candidate ROI among the second ROIs, wherein the at least one second candidate ROI respectively correspond to the at least one specific ROI; and determining the ambient light luminance based on the at least one first candidate ROI and the at least one second candidate ROI.
    Type: Application
    Filed: May 4, 2022
    Publication date: June 15, 2023
    Applicant: HTC Corporation
    Inventors: Chia-Wei Yu, Ping-Chang Hsieh, Chin-Yu Chang