Abstract: A method of fabricating a photomask includes selectively exposing portions of a photomask blank to radiation to change an optical property of the portions of the photomask blank exposed to the radiation, thereby forming a pattern of exposed portions of the photomask blank and unexposed portions of the photomask blank. The pattern corresponds to a pattern of semiconductor device features.

Abstract: An image sensor structure includes a semiconductor substrate, a plurality of image sensing elements, a reflective element, and a high-k dielectric structure. The image sensing elements are in the semiconductor substrate. The reflective element is in the semiconductor substrate and between the image sensing elements. The high-k dielectric structure is between the reflective element and the image sensing elements.

Abstract: A method of making a semiconductor device includes forming at least one fiducial mark on a photomask. The method further includes defining a pattern including a plurality of sub-patterns on the photomask in a pattern region. The defining the pattern includes defining a first sub-pattern of the plurality of sub-patterns having a first spacing from a second sub-pattern of the plurality of sub-patterns, wherein the first spacing is different from a second spacing between the second sub-pattern and a third sub-pattern of the plurality of sub-patterns.

Abstract: A method includes forming a test pattern and a reference pattern in an absorption layer of a photomask structure. The test pattern has a first trench and a second trench, the reference pattern has a third trench and a fourth trench, the test pattern and the reference pattern have substantially the same dimension in a top view, and the second trench is deeper than the first trench, the third trench, and the fourth trench. The method further includes emitting a light beam to the test pattern to obtain a first interference pattern reflected from the test pattern, emitting the light beam to the reference pattern to obtain a second interference pattern reflected from the reference pattern; and comparing the first interference pattern with the second interference pattern to obtain a measured complex refractive index of the absorption layer.

Abstract: In a method of manufacturing an attenuated phase shift mask, a photo resist pattern is formed over a mask blank. The mask blank includes a transparent substrate, an etch stop layer on the transparent substrate, a phase shift material layer on the etch stop layer, a hard mask layer on the phase shift material layer and an intermediate layer on the hard mask layer. The intermediate layer is patterned by using the photo resist pattern as an etching mask, the hard mask layer is patterned by using the patterned intermediate layer as an etching mask, and the phase shift material layer is patterned by using the patterned hard mask layer as an etching mask. The intermediate layer includes at least one of a transition metal, a transition metal alloy, or a silicon containing material, and the hard mask layer is made of a different material than the intermediate layer.

Abstract: A one-piece dental implant guide pack based on photocuring molding includes: a guide socket for receiving a photosensitive resin at an outer edge of the guide socket, adjusting and positioning the guide socket by the photosensitive resin which is curable by light; a guide slot formed at a side edge of the guide socket, and having a receiving portion at the bottom; a positioning shaft, having a positioning part and a shaft, and the positioning part being socketed into the guide socket, and the shaft penetrating to the bottom of the guide socket; and at least one positioning part, with an end connected to the guide socket and another end connected to and positioning the positioning shaft. This disclosure facilitates the drilling process of subsequent operations and improves the convenience and accuracy of the implant guide plate and the accuracy of the dental implant surgery.

Abstract: A dental implant guiding tool set and a dental implant guiding sleeve thereof are disclosed. The dental implant guiding tool set includes a handpiece, a dental implant guiding sleeve and a tooth mold fastening device. The dental implant guiding sleeve includes a handpiece head guiding hole disposed axially and corresponding to a shape of the handpiece head of the handpiece, a lateral opening disposed on a side of the handpiece head guiding hole and corresponding to a connection handle of the handpiece. The dental implant guiding sleeve can directly guide the handpiece head of the handpiece, to prevent the dental implant guiding sleeve from directly contacting the drill bit mounted on the handpiece. Therefore, a conventional drill bit can be directly used for a guiding dental implant operation, and the minimal required operation space of the dental implant guiding tool set can be reduced.

Abstract: A dental implant guiding tool set and a dental implant guiding sleeve thereof are disclosed. The dental implant guiding tool set includes a handpiece, a dental implant guiding sleeve and a tooth mold fastening device. The dental implant guiding sleeve includes a handpiece head guiding hole disposed axially and corresponding to a shape of the handpiece head of the handpiece, a lateral opening disposed on a side of the handpiece head guiding hole and corresponding to a connection handle of the handpiece. The dental implant guiding sleeve can directly guide the handpiece head of the handpiece, to prevent the dental implant guiding sleeve from directly contacting the drill bit mounted on the handpiece. Therefore, a conventional drill bit can be directly used for a guiding dental implant operation, and the minimal required operation space of the dental implant guiding tool set can be reduced.