Patents by Inventor Ping-Chun Liu

Ping-Chun Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7425710
    Abstract: An anode layer particle beam device includes a base, at least an anode placed on top of the base, an insulation layer set between the anode and the base, at least one magnetic pole, made of magnetic and conductive material and can be used as a cathode, an electric discharge channel, positioned between the anode and the magnetic pole, and an insulating material, placed in the electric discharge channel to serve as an insulator between the anode and the magnetic pole. The magnetic pole is positioned on top of the base and on an somewhat elevated outer periphery of the aforementioned anode (with the center of the later also as its center). An orifice is also set on the radiation path of the anode. Accordingly, a process gas stream can be directed into the electric discharge channel and, after being applied with a biased electric field, with the aide of the anode and the magnetic pole device, a particle beam can be generated and radiated out of the channel.
    Type: Grant
    Filed: June 6, 2005
    Date of Patent: September 16, 2008
    Assignee: Industrial Technology Research Institute
    Inventors: Ping-Chun Liu, Ming-Te Hsiung, Ming-Hsin Liu, Tean-Mu Shen
  • Publication number: 20060138342
    Abstract: An anode layer particle beam device includes a base, at least an anode placed on top of the base, an insulation layer set between the anode and the base, at least one magnetic pole, made of magnetic and conductive material and can be used as a cathode, an electric discharge channel, positioned between the anode and the magnetic pole, and an insulating material, placed in the electric discharge channel to serve as an insulator between the anode and the magnetic pole. The magnetic pole is positioned on top of the base and on an somewhat elevated outer periphery of the aforementioned anode (with the center of the later also as its center). An orifice is also set on the radiation path of the anode. Accordingly, a process gas stream can be directed into the electric discharge channel and, after being applied with a biased electric field, with the aide of the anode and the magnetic pole device, a particle beam can be generated and radiated out of the channel.
    Type: Application
    Filed: June 6, 2005
    Publication date: June 29, 2006
    Inventors: Ping-Chun Liu, Ming-Te Hsiung, Ming-Hsin Liu, Tean-Mu Shen