Patents by Inventor Ping-Ling Fan

Ping-Ling Fan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mechanisms for etching apparatus and etching-detection method
    Patent number: 10515813
    Abstract: Embodiments of mechanisms of an etching apparatus are provided. The etching apparatus includes a processing chamber. The etching apparatus also includes a gas distribution plate disposed in the processing chamber and comprising a number of exhaust openings. The etching apparatus further includes a number of end-point detectors disposed on the gas distribution plate. The gas distribution plate is configured to spurt gas into the processing chamber via the exhaust openings during a semiconductor process.
    Type: Grant
    Filed: December 10, 2013
    Date of Patent: December 24, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chi-Wei Chang, Ping-Ling Fan
  • MECHANISMS FOR ETCHING APPARATUS AND ETCHING-DETECTION METHOD
    Publication number: 20150162227
    Abstract: Embodiments of mechanisms of an etching apparatus are provided. The etching apparatus includes a processing chamber. The etching apparatus also includes a gas distribution plate disposed in the processing chamber and comprising a number of exhaust openings. The etching apparatus further includes a number of end-point detectors disposed on the gas distribution plate. The gas distribution plate is configured to spurt gas into the processing chamber via the exhaust openings during a semiconductor process.
    Type: Application
    Filed: December 10, 2013
    Publication date: June 11, 2015
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chi-Wei CHANG, Ping-Ling FAN
  • Gap gauge
    Patent number: 6935038
    Abstract: An apparatus and method for preventing damage to a chamber wall by a baffle plate in a semiconductor fabrication system during a semiconductor fabrication operation is disclosed herein. An electrostatic chuck is associated with the semiconductor fabrication system. A gauge for measuring a gap between said baffle plate and the chamber wall can be utilized to prevent damage to the chamber wall by the baffle plate during a movement of the electrostatic chunk during the semiconductor fabrication operation. Such a semiconductor fabrication operation can comprise, for example, a wet cleaning semiconductor operation.
    Type: Grant
    Filed: February 14, 2002
    Date of Patent: August 30, 2005
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Ping-Ling Fan, Te-Hsiang Liu
  • Gap gauge
    Publication number: 20030150123
    Abstract: An apparatus and method for preventing damage to a chamber wall by a baffle plate in a semiconductor fabrication system during a semiconductor fabrication operation is disclosed herein. An electrostatic chuck is associated with the semiconductor fabrication system. A gauge for measuring a gap between said baffle plate and the chamber wall can be utilized to prevent damage to the chamber wall by the baffle plate during a movement of the electrostatic chunk during the semiconductor fabrication operation. Such a semiconductor fabrication operation can comprise, for example, a wet cleaning semiconductor operation.
    Type: Application
    Filed: February 14, 2002
    Publication date: August 14, 2003
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Ping-Ling Fan, Te-Hsiang Liu