Abstract: A method for the treatment of teeth which comprises enhancing transport of substances through the tooth enamel by generating a gaseous plasma in proximity to the tooth.

Abstract: A method of material analysis, including; placing an electrode in proximity to the material; applying a voltage signal to generate plasma, preferably Dielectric Barrier Discharge in Air, between the material and the electrode; moving the electrode relative to the surface; monitoring an electrical signal associated with the microdischarge; and detecting a change in a physical characteristic of the material through variation in the monitored signal.

Abstract: A method of enhanced trans-tissue delivery of therapeutic substances including; placing an electrode in proximity to human or animal tissue covered with material of sufficient concentration of such substances; applying a voltage signal to generate plasma, preferably Dielectric Barrier Discharge in Air, between the tissue and the electrode.

Abstract: An apparatus for depositing a group III metal nitride film on a substrate, the apparatus comprising a plasma generator to generate a nitrogen plasma from a nitrogen source, a reaction chamber in which to react a reagent comprising a group III metal with a reactive nitrogen species derived from the nitrogen plasma so as to deposit a group III metal nitride on the substrate, a plasma inlet to facilitate the passage of nitrogen plasma from the plasma generator into the reaction chamber and a baffle having one or more flow channels for passage of the nitrogen plasma. The baffle is located between the plasma inlet and the substrate and prevents a direct line of passage for nitrogen plasma between the plasma inlet and the substrate.

Abstract: A method of material analysis, including; placing an electrode in proximity to the material; applying a voltage signal to generate plasma, preferably Dielectric Barrier Discharge in Air, between the material and the electrode; moving the electrode relative to the surface; monitoring an electrical signal associated with the microdischarge; and detecting a change in a physical characteristic of the material through variation in the monitored signal.

Abstract: An apparatus for depositing a group III metal nitride film on a substrate, the apparatus comprising a plasma generator to generate a nitrogen plasma from a nitrogen source, a reaction chamber in which to react a reagent comprising a group III metal with a reactive nitrogen species derived from the nitrogen plasma so as to deposit a group III metal nitride on the substrate, a plasma inlet to facilitate the passage of nitrogen plasma from the plasma generator into the reaction chamber and a baffle having one or more flow channels for passage of the nitrogen plasma. The baffle is located between the plasma inlet and the substrate and prevents a direct line of passage for nitrogen plasma between the plasma inlet and the substrate.