Patents by Inventor Pixelligent Technologies, LLC

Pixelligent Technologies, LLC has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • BLOCK CO-POLYMER PHOTORESIST
    Publication number: 20130207238
    Abstract: An integrated circuit is made by depositing a pinning layer on a substrate. A block copolymer photoresist is formed on the pinning layer. The block copolymer has two blocks A and B that do not self-assemble under at least some annealing conditions. The exposed block copolymer photoresist is processed to cleave at least some block copolymer bonds in the exposed selected regions. The exposed pinning layer is processed to create a chemical epitaxial pattern to direct the local self assembly of the block copolymer.
    Type: Application
    Filed: February 11, 2013
    Publication date: August 15, 2013
    Applicant: PIXELLIGENT TECHNOLOGIES, LLC
    Inventor: Pixelligent Technologies, LLC
  • RESISTS FOR LITHOGRAPHY
    Publication number: 20130136897
    Abstract: New routes involving multi-step reversible photo-chemical reactions using two-step techniques to provide non-linear resist for lithography are described in this disclosure. They may provide exposure quadratically dependant on the intensity of the light. Several specific examples, including but not limited to using nanocrystals, are also described. Combined with double patterning, these approaches may create sub-diffraction limit feature density.
    Type: Application
    Filed: January 23, 2013
    Publication date: May 30, 2013
    Applicant: PIXELLIGENT TECHNOLOGIES, LLC
    Inventor: Pixelligent Technologies, LLC