Patents by Inventor Plash P. Das

Plash P. Das has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithography laser with beam delivery and beam pointing control
    Patent number: 7230964
    Abstract: The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source with a beam delivery to a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. Preferred embodiments include equipment for beam attenuation, equipment for automatic feedback beam alignment and equipment for accurate optics module positioning at installation and during maintenance. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.
    Type: Grant
    Filed: April 29, 2003
    Date of Patent: June 12, 2007
    Assignee: Cymer, Inc.
    Inventors: Plash P. Das, R. Kyle Webb, Marco Giovanardi, Gregory Francis, Huckleberry B. Dorn, Kyle P. Erlandsen, John W. Nelson, Richard L. Sandstrom, Alexander I. Ershov
  • Lithography laser with beam delivery and beam pointing control
    Publication number: 20040022291
    Abstract: The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source with a beam delivery to a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. Preferred embodiments include equipment for beam attenuation, equipment for automatic feedback beam alignment and equipment for accurate optics module positioning at installation and during maintenance. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.
    Type: Application
    Filed: April 29, 2003
    Publication date: February 5, 2004
    Inventors: Plash P. Das, R. Kyle Webb, Marco Giovanardi, Gregory Francis, Huckleberry B. Dorn, Kyle P. Erlandsen, John W. Nelson, Richard L. Sandstrom, Alexander I. Ershov