Patents by Inventor Pleun Dona
Pleun Dona has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11972920Abstract: Methods and apparatus are disclosed for providing an X-ray shield within an ultra-high vacuum enclosure. A shell is fabricated, leak-tested, filled with an X-ray shielding material, and sealed. An elongated twisted X-ray shield can be deployed within a pump-out channel of an electron microscope or similar equipment. The shield can incorporate lead within a stainless steel shell, with optional low-Z cladding outside the shell. Further variations are disclosed.Type: GrantFiled: November 23, 2021Date of Patent: April 30, 2024Assignee: FEI CompanyInventors: Pleun Dona, Casper Smit, Rients Jan de Groot
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Publication number: 20240112878Abstract: A charged particle microscope for imaging a specimen. The charged particle microscope includes a specimen holder movable into an imaging position intersecting an optical axis, a specimen chamber configured to receive the specimen holder in the imaging position, and a sorption pump disposed in the specimen chamber and configured to lower a pressure in the specimen chamber.Type: ApplicationFiled: September 30, 2022Publication date: April 4, 2024Inventors: Pleun Dona, Johannes A.H.W.G. Persoon, Hugo Cornelis Van Leeuwen, Peter Tiemeijer
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Patent number: 11915904Abstract: Systems for reducing the generation of thermal magnetic field noise in optical elements of microscope systems, are disclosed. Example microscopy optical elements having reduced Johnson noise generation according to the present disclosure comprises an inner core composed of an electrically isolating material, and an outer coating composed of an electrically conductive material. The product of the thickness of the outer coating and the electrical conductivity is less than 0.01??1. The outer coating causes a reduction in Johnson noise generated by the optical element of greater than 2×, 3×, or an order of magnitude or greater. In a specific example embodiment, the optical element is a corrector system having reduced Johnson noise generation. Such a corrector system comprises an outer magnetic multipole, and an inner electrostatic multipole. The inner electrostatic multipole comprises an inner core composed of an electrically isolating material and an outer coating composed of an electrically conductive material.Type: GrantFiled: August 3, 2022Date of Patent: February 27, 2024Assignee: FEI COMPANYInventors: Alexander Henstra, Pleun Dona
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Patent number: 11773905Abstract: An axial alignment assembly (100) comprising a first body and a second body. The first body has a substantially cylindrical outer jacket, and has a first alignment axis. The second body comprises a substantially cylindrical inner jacket, and has a second alignment axis. The second body is positioned with respect to said first body in so that said inner jacket faces said outer jacket and in between said inner jacket and said outer jacket a substantially annular recess is formed. The axial alignment assembly further comprises a plurality of resilient elements that are positioned within said annular recess, wherein each resilient element is in contact with said outer jacket of said first body and with said inner jacket of said second body. Each resilient element exerts a force onto said outer jacket and onto said inner jacket for aligning said first alignment axis and said second alignment axis.Type: GrantFiled: May 20, 2021Date of Patent: October 3, 2023Assignee: FEI CompanyInventors: Pleun Dona, Casper Maria Smit
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Publication number: 20230207254Abstract: Disclosed herein are electron microscopes with improved imaging. An example electron microscope at least includes an illumination system, for directing a beam of electrons to irradiate a specimen, an elongate beam conduit, through which the beam of electrons is directed; a multipole lens assembly configured as an aberration corrector, and a detector for detecting radiation emanating from the specimen in response to said irradiation, wherein at least a portion of said elongate beam conduit extends at least through said aberration corrector and has a composite structure comprising intermixed electrically insulating material and electrically conductive material, wherein the elongate beam conduit has an electrical conductivity ? and a thickness t, with ?t<0.1 ??1.Type: ApplicationFiled: February 21, 2023Publication date: June 29, 2023Applicant: FEI CompanyInventors: Alexander Henstra, Pleun Dona
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Publication number: 20220392736Abstract: Systems for reducing the generation of thermal magnetic field noise in optical elements of microscope systems, are disclosed. Example microscopy optical elements having reduced Johnson noise generation according to the present disclosure comprises an inner core composed of an electrically isolating material, and an outer coating composed of an electrically conductive material. The product of the thickness of the outer coating and the electrical conductivity is less than 0.01??1. The outer coating causes a reduction in Johnson noise generated by the optical element of greater than 2×, 3×, or an order of magnitude or greater. In a specific example embodiment, the optical element is a corrector system having reduced Johnson noise generation. Such a corrector system comprises an outer magnetic multipole, and an inner electrostatic multipole. The inner electrostatic multipole comprises an inner core composed of an electrically isolating material and an outer coating composed of an electrically conductive material.Type: ApplicationFiled: August 3, 2022Publication date: December 8, 2022Applicant: FEI CompanyInventors: Alexander Henstra, Pleun Dona
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Patent number: 11437216Abstract: Systems for reducing the generation of thermal magnetic field noise in optical elements of microscope systems, are disclosed. Example microscopy optical elements having reduced Johnson noise generation according to the present disclosure comprises an inner core composed of an electrically isolating material, and an outer coating composed of an electrically conductive material. The product of the thickness of the outer coating and the electrical conductivity is less than 0.01??1. The outer coating causes a reduction in Johnson noise generated by the optical element of greater than 2×, 3×, or an order of magnitude or greater. In a specific example embodiment, the optical element is a corrector system having reduced Johnson noise generation. Such a corrector system comprises an outer magnetic multipole, and an inner electrostatic multipole. The inner electrostatic multipole comprises an inner core composed of an electrically isolating material and an outer coating composed of an electrically conductive material.Type: GrantFiled: December 31, 2020Date of Patent: September 6, 2022Assignee: FEI CompanyInventors: Alexander Henstra, Pleun Dona
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Patent number: 11417498Abstract: The invention relates to a method of manufacturing a charged particle detector, comprising the steps of providing a sensor device, such as an Active Pixel Sensor (APS). Said sensor device at least comprises a substrate layer and a sensitive layer. The method further comprises the step of providing a mechanical supporting layer and connecting said mechanical supporting layer to said sensor device. After connection, the sensitive layer is situated in between said substrate layer and said mechanical supporting layer. By connecting the mechanical supporting layer, it is possible to thin said substrate layer for forming said charged particle detector. The mechanical supporting layer forms part of the manufactured detector. The detector can be used in a charged particle microscope, such as a Transmission Electron Microscope for direct electron detection.Type: GrantFiled: July 15, 2020Date of Patent: August 16, 2022Assignee: FEI CompanyInventors: Bart Jozef Janssen, Pleun Dona
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Publication number: 20220208507Abstract: Systems for reducing the generation of thermal magnetic field noise in optical elements of microscope systems, are disclosed. Example microscopy optical elements having reduced Johnson noise generation according to the present disclosure comprises an inner core composed of an electrically isolating material, and an outer coating composed of an electrically conductive material. The product of the thickness of the outer coating and the electrical conductivity is less than 0.01??1. The outer coating causes a reduction in Johnson noise generated by the optical element of greater than 2×, 3×, or an order of magnitude or greater. In a specific example embodiment, the optical element is a corrector system having reduced Johnson noise generation. Such a corrector system comprises an outer magnetic multipole, and an inner electrostatic multipole. The inner electrostatic multipole comprises an inner core composed of an electrically isolating material and an outer coating composed of an electrically conductive material.Type: ApplicationFiled: December 31, 2020Publication date: June 30, 2022Applicant: FEI CompanyInventors: Alexander Henstra, Pleun Dona
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Patent number: 11328892Abstract: Disclosed herein are radio frequency (RF) cavities and systems including such RF cavities. The RF cavities are characterized as having an insert with at least one sidewall coated with a material to prevent charge build up without affecting RF input power and that is heat and vacuum compatible. One example RF cavity includes a dielectric insert, the dielectric insert having an opening extending from one side of the dielectric insert to another to form a via, and a coating layer disposed on an inner surface of the dielectric insert, the inner surface facing the via, wherein the coating layer has a thickness and a resistivity, the thickness less than a thickness threshold, and the resistivity greater than a resistivity threshold, wherein the thickness and resistivity thresholds are based partly on operating parameters of the RF cavity.Type: GrantFiled: August 6, 2020Date of Patent: May 10, 2022Assignee: FEI CompanyInventors: Erik Rene Kieft, Pleun Dona, Jasper Frans Mathijs van Rens, Wouter Verhoeven, Peter Mutsaers, Jom Luiten, Ond{hacek over (r)}ej Ba{hacek over (c)}o
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Publication number: 20210366684Abstract: An axial alignment assembly (100) comprising a first body and a second body. The first body has a substantially cylindrical outer jacket, and has a first alignment axis. The second body comprises a substantially cylindrical inner jacket, and has a second alignment axis. The second body is positioned with respect to said first body in so that said inner jacket faces said outer jacket and in between said inner jacket and said outer jacket a substantially annular recess is formed. The axial alignment assembly further comprises a plurality of resilient elements that are positioned within said annular recess, wherein each resilient element is in contact with said outer jacket of said first body and with said inner jacket of said second body. Each resilient element exerts a force onto said outer jacket and onto said inner jacket for aligning said first alignment axis and said second alignment axis.Type: ApplicationFiled: May 20, 2021Publication date: November 25, 2021Applicant: FEI CompanyInventors: Pleun Dona, Casper Maria Smit
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Patent number: 11101101Abstract: Methods and systems for implementing laser-based phase plate image contrast enhancement are disclosed herein. An example method at least includes forming at least one optical peak in a diffraction plane of an electron microscope, and directing an electron beam through the at least one optical peak at a first location, where the first location determines an amount of phase manipulation the optical peak imparts to an electron of the electron beam.Type: GrantFiled: April 22, 2020Date of Patent: August 24, 2021Assignee: FEI CompanyInventors: Bart Buijsse, Bas Hendriksen, Pleun Dona
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Patent number: 11101104Abstract: Cryo compatible sample grids having multi-modal cryo-EM compatible GUIDs, according to the present disclosure include an outer support structure that defines a region of the grid for holding one or more samples, and a plurality of inner support structures that define a plurality of apertures that are each configured to hold a sample. Cryo compatible sample grids further include a first identifier located on the outer support structure, and a second identifier located within the region of the grid for holding the one or more samples. The first identifier is readable with an optical detector, while the second identifier is readable with an electron detector (e.g., within an electron microscope). Specifically, the second identifier is readable with an electron detector when one or more teeth and/or holes that comprise the second identifier are filled with ice from a vitrification process.Type: GrantFiled: August 30, 2019Date of Patent: August 24, 2021Assignee: FEI CompanyInventors: Maarten Kuijper, Ondrej Ludmil Shanel, Mathijs Petrus van den Boogaard, Pleun Dona
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Publication number: 20210072170Abstract: Various methods and devices are provided for searching the optimum sample condition of a sample for cryogenic electron microscopy. Multiple samples with different sample conditions may be screened using a sample inspection device. The sample inspection device includes at least a chamber formed between a top electron transparent layer and a bottom electron transparent layer for holding the sample. Multiple pillars are arranged within the chamber. The sample inspection device includes a window covering at least one of the multiple pillars.Type: ApplicationFiled: September 9, 2019Publication date: March 11, 2021Applicant: FEI CompanyInventors: Bas HENDRIKSEN, Maarten KUIJPER, Luigi MELE, Pleun DONA, Erum RAJA, Atieh AMINIAN
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Publication number: 20210066032Abstract: Cryo compatible sample grids having multi-modal cryo-EM compatible GUIDs, according to the present disclosure include an outer support structure that defines a region of the grid for holding one or more samples, and a plurality of inner support structures that define a plurality of apertures that are each configured to hold a sample. Cryo compatible sample grids further include a first identifier located on the outer support structure, and a second identifier located within the region of the grid for holding the one or more samples. The first identifier is readable with an optical detector, while the second identifier is readable with an electron detector (e.g., within an electron microscope). Specifically, the second identifier is readable with an electron detector when one or more teeth and/or holes that comprise the second identifier are filled with ice from a vitrification process.Type: ApplicationFiled: August 30, 2019Publication date: March 4, 2021Applicant: FEI CompanyInventors: Maarten Kuijper, Ondrej Ludmil Shanel, Mathijs Petrus van den Boogaard, Pleun Dona
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Patent number: 10921268Abstract: Various methods and devices are provided for searching the optimum sample condition of a sample for cryogenic electron microscopy. Multiple samples with different sample conditions may be screened using a sample inspection device. The sample inspection device includes at least a chamber formed between a top electron transparent layer and a bottom electron transparent layer for holding the sample. Multiple pillars are arranged within the chamber. The sample inspection device includes a window covering at least one of the multiple pillars.Type: GrantFiled: September 9, 2019Date of Patent: February 16, 2021Assignee: FEI CompanyInventors: Bas Hendriksen, Maarten Kuijper, Luigi Mele, Pleun Dona, Erum Raja, Atieh Aminian
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Publication number: 20210043410Abstract: Disclosed herein are radio frequency (RF) cavities and systems including such RF cavities. The RF cavities are characterized as having an insert with at least one sidewall coated with a material to prevent charge build up without affecting RF input power and that is heat and vacuum compatible. One example RF cavity includes a dielectric insert, the dielectric insert having an opening extending from one side of the dielectric insert to another to form a via, and a coating layer disposed on an inner surface of the dielectric insert, the inner surface facing the via, wherein the coating layer has a thickness and a resistivity, the thickness less than a thickness threshold, and the resistivity greater than a resistivity threshold, wherein the thickness and resistivity thresholds are based partly on operating parameters of the RF cavity.Type: ApplicationFiled: August 6, 2020Publication date: February 11, 2021Applicant: FEI CompanyInventors: Erik Rene Kieft, Pleun Dona, Jasper Frans Mathijs van Rens, Wouter Verhoeven, Peter Mutsaers, Jom Luiten, Ondrej Baco
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Publication number: 20210020400Abstract: The invention relates to a method of manufacturing a charged particle detector, comprising the steps of providing a sensor device, such as an Active Pixel Sensor (APS). Said sensor device at least comprises a substrate layer and a sensitive layer. The method further comprises the step of providing a mechanical supporting layer and connecting said mechanical supporting layer to said sensor device. After connection, the sensitive layer is situated in between said substrate layer and said mechanical supporting layer. By connecting the mechanical supporting layer, it is possible to thin said substrate layer for forming said charged particle detector. The mechanical supporting layer forms part of the manufactured detector. The detector can be used in a charged particle microscope, such as a Transmission Electron Microscope for direct electron detection.Type: ApplicationFiled: July 15, 2020Publication date: January 21, 2021Applicant: FEI CompanyInventors: Bart Jozef Janssen, Pleun Dona
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Publication number: 20200365366Abstract: Methods and systems for implementing laser-based phase plate image contrast enhancement are disclosed herein. An example method at least includes forming at least one optical peak in a diffraction plane of an electron microscope, and directing an electron beam through the at least one optical peak at a first location, where the first location determines an amount of phase manipulation the optical peak imparts to an electron of the electron beam.Type: ApplicationFiled: April 22, 2020Publication date: November 19, 2020Applicant: FEI CompanyInventors: Bart Buijsse, Bas Hendriksen, Pleun Dona
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Publication number: 20200013580Abstract: Disclosed herein are electron microscopes with improved imaging. An example electron microscope at least includes an illumination system, for directing a beam of electrons to irradiate a specimen, an elongate beam conduit, through which the beam of electrons is directed; a multipole lens assembly configured as an aberration corrector, and a detector for detecting radiation emanating from the specimen in response to said irradiation, wherein at least a portion of said elongate beam conduit extends at least through said aberration corrector and has a composite structure comprising an outer tube of electrically insulating material, and an inner skin of electrically conductive material with an electrical conductivity ? and a thickness t, with ?t<0.1 ??1.Type: ApplicationFiled: June 26, 2019Publication date: January 9, 2020Applicant: FEI CompanyInventors: Alexander Henstra, Pleun Dona