Patents by Inventor Po-Chang Huang

Po-Chang Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9435936
    Abstract: A light guide plate with multi-directional structures includes a main body, a plurality of first microstructures and a plurality of second microstructures. The main body includes a light-incident surface, a light-emitting surface and a reflecting surface. The light-incident surface connects the light-emitting surface and the reflecting surface. The first microstructures are disposed on the light-emitting surface or the reflecting surface and arranged along a first extending direction. The second microstructures are disposed on the light-emitting surface or the reflecting surface and arranged along a second extending direction. The second microstructures and the first microstructures are disposed on the same plane and intersect with each other. Each of the second microstructures is a single stripe pattern, and has a width which becomes gradually smaller from one end of the second microstructure near the light-incident surface to the other end of the second microstructure away from the light-incident surface.
    Type: Grant
    Filed: December 9, 2013
    Date of Patent: September 6, 2016
    Assignee: Radiant Opto-Electronics Corporation
    Inventors: Chia-Yin Chang, Po-Chang Huang, Chih-Chiang Chang, Shan-Fu Chang, Shin-Bo Lin
  • Publication number: 20160190353
    Abstract: A method for forming a photosensitive module is provided. The method includes providing a substrate having a first surface and a second surface opposite thereto. A conducting pad is located on the first surface. A cover plate is provided on the first surface of the substrate. An opening is formed. The opening penetrates the substrate and exposes the conducting pad. A redistribution layer is formed in the first opening to electrically connect to the conducting pad. The cover plate is removed and a dicing process is performed to form a sensing device. The sensing device is bonded to a circuit board. An optical component is mounted on the circuit board and corresponds to the sensing device. A photosensitive module formed by the method is also provided.
    Type: Application
    Filed: September 21, 2015
    Publication date: June 30, 2016
    Inventors: Chi-Chang LIAO, Po-Chang HUANG, Tsang-Yu LIU
  • Patent number: 9375665
    Abstract: System and method for replacing a resist filter in such a manner as to reduce filter-induced wafer defects are described. In one embodiment, the system comprises a filtration system connected to a dispenser, the filtration system comprising a filter; and a switch connected to the filter for selectively connecting the filtration system to throughput one of a first chemical solution and a second chemical solution.
    Type: Grant
    Filed: November 8, 2013
    Date of Patent: June 28, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yao-Hwan Kao, Po-Chang Huang
  • Publication number: 20150302127
    Abstract: Disclosed herein is a system and method for producing semiconductor devices using overlays, the method comprising associating one or more patterned overlays with respective ones of reserved regions in a layer template, receiving a layer design based on the layer template, identifying the reserved regions in the layer design, generating a production layer design based on the layer design, the production layer design describing at least one production overlay in one of the reserved regions, and fabricating one or more devices based on the production layer design.
    Type: Application
    Filed: June 29, 2015
    Publication date: October 22, 2015
    Inventors: Po-Chang Huang, Ying Ying Wang, Shellin Liu, Kuan-Chi Chen
  • Patent number: 9104831
    Abstract: Disclosed herein is a system and method for producing semiconductor devices using overlays, the method comprising associating one or more patterned overlays with respective ones of reserved regions in a layer template, receiving a layer design based on the layer template, identifying the reserved regions in the layer design, generating a production layer design based on the layer design, the production layer design describing at least one production overlay in one of the reserved regions, and fabricating one or more devices based on the production layer design.
    Type: Grant
    Filed: August 23, 2013
    Date of Patent: August 11, 2015
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Po-Chang Huang, Ying Ying Wang, Shellin Liu, Kuan-Chi Chen
  • Publication number: 20150058817
    Abstract: Disclosed herein is a system and method for producing semiconductor devices using overlays, the method comprising associating one or more patterned overlays with respective ones of reserved regions in a layer template, receiving a layer design based on the layer template, identifying the reserved regions in the layer design, generating a production layer design based on the layer design, the production layer design describing at least one production overlay in one of the reserved regions, and fabricating one or more devices based on the production layer design.
    Type: Application
    Filed: August 23, 2013
    Publication date: February 26, 2015
    Inventors: Po-Chang Huang, Ying Ying Wang, Shellin Liu, Kuan-Chi Chen
  • Publication number: 20150055366
    Abstract: A light guide plate with multi-directional structures includes a main body, a plurality of first microstructures and a plurality of second microstructures. The main body includes a light-incident surface, a light-emitting surface and a reflecting surface. The light-incident surface connects the light-emitting surface and the reflecting surface. The first microstructures are disposed on the light-emitting surface or the reflecting surface and arranged along a first extending direction. The second microstructures are disposed on the light-emitting surface or the reflecting surface and arranged along a second extending direction. The second microstructures and the first microstructures are disposed on the same plane and intersect with each other. Each of the second microstructures is a single stripe pattern, and has a width which becomes gradually smaller from one end of the second microstructure near the light-incident surface to the other end of the second microstructure away from the light-incident surface.
    Type: Application
    Filed: December 9, 2013
    Publication date: February 26, 2015
    Applicant: Radiant Opto-Electronics Corporation
    Inventors: Chia-Yin CHANG, Po-Chang HUANG, Chih-Chiang CHANG, Shan-Fu CHANG, Shin-Bo LIN
  • Publication number: 20140054212
    Abstract: System and method for replacing a resist filter in such a manner as to reduce filter-induced wafer defects are described. In one embodiment, the system comprises a filtration system connected to a dispenser, the filtration system comprising a filter; and a switch connected to the filter for selectively connecting the filtration system to throughput one of a first chemical solution and a second chemical solution.
    Type: Application
    Filed: November 8, 2013
    Publication date: February 27, 2014
    Inventors: Yao-Hwan Kao, Po-Chang Huang
  • Patent number: 8580117
    Abstract: System and method for replacing a resist filter in such a manner as to reduce filter-induced wafer defects are described. In one embodiment, the system comprises a filtration system connected to a dispenser, the filtration system comprising a filter; and a switch connected to the filter for selectively connecting the filtration system to throughput one of a first chemical solution and a second chemical solution.
    Type: Grant
    Filed: March 20, 2007
    Date of Patent: November 12, 2013
    Assignee: Taiwan Semiconductor Manufactuing Company, Ltd.
    Inventors: Yao-Hwan Kao, Po-Chang Huang
  • Publication number: 20120205773
    Abstract: A Schottky diode with a lowered forward voltage drop has an N? type doped drift layer formed on an N+ type doped layer. The N? type doped drift layer has a surface formed with a protection ring inside which is a P-type doped layer. The surface of the N? type doped drift layer is further formed with an oxide layer and a metal layer. The contact region between the metal layer and the N? type doped drift layer within the P-type doped layer forms a Schottky barrier. An upward extending N type doped layer is formed on the N+ type doped layer and under the Schottky barrier to reduce the thickness of the N? type doped drift layer under the Schottky barrier. This lowers the forward voltage drop of the Schottky diode.
    Type: Application
    Filed: July 20, 2011
    Publication date: August 16, 2012
    Applicant: PYNMAX TECHNOLOGY CO., LTD.
    Inventors: Chiun-Yen TUNG, Po-Chang HUANG, Wei-Sheng CHAO, Kun-Hsien CHEN
  • Patent number: 7901854
    Abstract: A wafer edge exposure unit comprises a chuck for supporting a wafer. The chuck is rotatable about a central axis. A plurality of light sources are positioned or movably positionable with a common radial distance from the axis of the rotatable chuck, each light source configured to direct exposure light on a respective edge portion of the wafer simultaneously.
    Type: Grant
    Filed: May 8, 2009
    Date of Patent: March 8, 2011
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Po-Chang Huang, Heng-Hsin Liu, Heng-Jen Lee
  • Publication number: 20100285399
    Abstract: A wafer edge exposure unit comprises a chuck for supporting a wafer. The chuck is rotatable about a central axis. A plurality of light sources are positioned or movably positionable with a common radial distance from the axis of the rotatable chuck, each light source configured to direct exposure light on a respective edge portion of the wafer simultaneously.
    Type: Application
    Filed: May 8, 2009
    Publication date: November 11, 2010
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Po-Chang Huang, Heng-Hsin Liu, Heng-Jen Lee
  • Publication number: 20080230492
    Abstract: System and method for replacing a resist filter in such a manner as to reduce filter-induced wafer defects are described. In one embodiment, the system comprises a filtration system connected to a dispenser, the filtration system comprising a filter; and a switch connected to the filter for selectively connecting the filtration system to throughput one of a first chemical solution and a second chemical solution.
    Type: Application
    Filed: March 20, 2007
    Publication date: September 25, 2008
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yao-Hwan Kao, Po-Chang Huang
  • Patent number: 7204413
    Abstract: Judgment systems and methods. The system includes a signal gathering module, an attribute retrieval module, a rule retrieval module, and a rule execution module. The signal gathering module receives identification of at least a first card and a second card, and defines statuses thereof. The attribute retrieval module retrieves attributes corresponding to the first and second cards according to the identification thereof. The rule retrieval module retrieves a rule according to the identification and statuses of the first and second cards. The rule execution module performs the rule on the first and second cards to change the attributes thereof.
    Type: Grant
    Filed: January 21, 2005
    Date of Patent: April 17, 2007
    Assignee: Institute for Information Industry
    Inventors: Po-Chang Huang, Wen-Tai Hsieh, Shih-Chun Chou, Yung-Fang Yang
  • Publication number: 20060124731
    Abstract: Judgment systems and methods. The system includes a signal gathering module, an attribute retrieval module, a rule retrieval module, and a rule execution module. The signal gathering module receives identification of at least a first card and a second card, and defines statuses thereof. The attribute retrieval module retrieves attributes corresponding to the first and second cards according to the identification thereof. The rule retrieval module retrieves a rule according to the identification and statuses of the first and second cards. The rule execution module performs the rule on the first and second cards to change the attributes thereof.
    Type: Application
    Filed: January 21, 2005
    Publication date: June 15, 2006
    Inventors: Po-Chang Huang, Wen-Tai Hsieh, Shih-Chun Chou, Yung-Fang Yang
  • Publication number: 20050211267
    Abstract: A method and apparatus for rinsing and drying a substrate (100) of a semiconductor wafer (102), has a first nozzle (110) dispensing rinsing fluid against the substrate (100); and a second nozzle (114) dispensing dry gas under pressure against the substrate (100) during a drying cycle to dry the substrate (100) completely. The second nozzle (114) can point to the substrate (100) while the substrate (100) spins. The nozzles (110) and (114) can be positioned by a robot arm (112).
    Type: Application
    Filed: March 26, 2004
    Publication date: September 29, 2005
    Inventors: Yao-Hwan Kao, Po-Chang Huang, Ming-Yeon Hung, Chi-Che Huang
  • Publication number: 20050051196
    Abstract: A developer dispensing apparatus for dispensing developer solution onto a semiconductor wafer substrate which has a vertically-adjustable knife ring. The knife ring is vertically actuated in the apparatus by pressurized air or fluid. In an application, the gap distance between the upper edge of the knife ring and the backside of the wafer is initially adjusted to a minimum value as the developer solution is dispensed onto the wafer, by adjusting the knife ring to the uppermost position in the apparatus.
    Type: Application
    Filed: September 8, 2003
    Publication date: March 10, 2005
    Inventors: Yao-Hwan Kao, Ming-Yeon Hung, Po-Chang Huang