Patents by Inventor Po-Chang Huang
Po-Chang Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 9435936Abstract: A light guide plate with multi-directional structures includes a main body, a plurality of first microstructures and a plurality of second microstructures. The main body includes a light-incident surface, a light-emitting surface and a reflecting surface. The light-incident surface connects the light-emitting surface and the reflecting surface. The first microstructures are disposed on the light-emitting surface or the reflecting surface and arranged along a first extending direction. The second microstructures are disposed on the light-emitting surface or the reflecting surface and arranged along a second extending direction. The second microstructures and the first microstructures are disposed on the same plane and intersect with each other. Each of the second microstructures is a single stripe pattern, and has a width which becomes gradually smaller from one end of the second microstructure near the light-incident surface to the other end of the second microstructure away from the light-incident surface.Type: GrantFiled: December 9, 2013Date of Patent: September 6, 2016Assignee: Radiant Opto-Electronics CorporationInventors: Chia-Yin Chang, Po-Chang Huang, Chih-Chiang Chang, Shan-Fu Chang, Shin-Bo Lin
-
Publication number: 20160190353Abstract: A method for forming a photosensitive module is provided. The method includes providing a substrate having a first surface and a second surface opposite thereto. A conducting pad is located on the first surface. A cover plate is provided on the first surface of the substrate. An opening is formed. The opening penetrates the substrate and exposes the conducting pad. A redistribution layer is formed in the first opening to electrically connect to the conducting pad. The cover plate is removed and a dicing process is performed to form a sensing device. The sensing device is bonded to a circuit board. An optical component is mounted on the circuit board and corresponds to the sensing device. A photosensitive module formed by the method is also provided.Type: ApplicationFiled: September 21, 2015Publication date: June 30, 2016Inventors: Chi-Chang LIAO, Po-Chang HUANG, Tsang-Yu LIU
-
Patent number: 9375665Abstract: System and method for replacing a resist filter in such a manner as to reduce filter-induced wafer defects are described. In one embodiment, the system comprises a filtration system connected to a dispenser, the filtration system comprising a filter; and a switch connected to the filter for selectively connecting the filtration system to throughput one of a first chemical solution and a second chemical solution.Type: GrantFiled: November 8, 2013Date of Patent: June 28, 2016Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yao-Hwan Kao, Po-Chang Huang
-
Publication number: 20150302127Abstract: Disclosed herein is a system and method for producing semiconductor devices using overlays, the method comprising associating one or more patterned overlays with respective ones of reserved regions in a layer template, receiving a layer design based on the layer template, identifying the reserved regions in the layer design, generating a production layer design based on the layer design, the production layer design describing at least one production overlay in one of the reserved regions, and fabricating one or more devices based on the production layer design.Type: ApplicationFiled: June 29, 2015Publication date: October 22, 2015Inventors: Po-Chang Huang, Ying Ying Wang, Shellin Liu, Kuan-Chi Chen
-
Patent number: 9104831Abstract: Disclosed herein is a system and method for producing semiconductor devices using overlays, the method comprising associating one or more patterned overlays with respective ones of reserved regions in a layer template, receiving a layer design based on the layer template, identifying the reserved regions in the layer design, generating a production layer design based on the layer design, the production layer design describing at least one production overlay in one of the reserved regions, and fabricating one or more devices based on the production layer design.Type: GrantFiled: August 23, 2013Date of Patent: August 11, 2015Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Po-Chang Huang, Ying Ying Wang, Shellin Liu, Kuan-Chi Chen
-
Publication number: 20150058817Abstract: Disclosed herein is a system and method for producing semiconductor devices using overlays, the method comprising associating one or more patterned overlays with respective ones of reserved regions in a layer template, receiving a layer design based on the layer template, identifying the reserved regions in the layer design, generating a production layer design based on the layer design, the production layer design describing at least one production overlay in one of the reserved regions, and fabricating one or more devices based on the production layer design.Type: ApplicationFiled: August 23, 2013Publication date: February 26, 2015Inventors: Po-Chang Huang, Ying Ying Wang, Shellin Liu, Kuan-Chi Chen
-
Publication number: 20150055366Abstract: A light guide plate with multi-directional structures includes a main body, a plurality of first microstructures and a plurality of second microstructures. The main body includes a light-incident surface, a light-emitting surface and a reflecting surface. The light-incident surface connects the light-emitting surface and the reflecting surface. The first microstructures are disposed on the light-emitting surface or the reflecting surface and arranged along a first extending direction. The second microstructures are disposed on the light-emitting surface or the reflecting surface and arranged along a second extending direction. The second microstructures and the first microstructures are disposed on the same plane and intersect with each other. Each of the second microstructures is a single stripe pattern, and has a width which becomes gradually smaller from one end of the second microstructure near the light-incident surface to the other end of the second microstructure away from the light-incident surface.Type: ApplicationFiled: December 9, 2013Publication date: February 26, 2015Applicant: Radiant Opto-Electronics CorporationInventors: Chia-Yin CHANG, Po-Chang HUANG, Chih-Chiang CHANG, Shan-Fu CHANG, Shin-Bo LIN
-
Publication number: 20140054212Abstract: System and method for replacing a resist filter in such a manner as to reduce filter-induced wafer defects are described. In one embodiment, the system comprises a filtration system connected to a dispenser, the filtration system comprising a filter; and a switch connected to the filter for selectively connecting the filtration system to throughput one of a first chemical solution and a second chemical solution.Type: ApplicationFiled: November 8, 2013Publication date: February 27, 2014Inventors: Yao-Hwan Kao, Po-Chang Huang
-
Patent number: 8580117Abstract: System and method for replacing a resist filter in such a manner as to reduce filter-induced wafer defects are described. In one embodiment, the system comprises a filtration system connected to a dispenser, the filtration system comprising a filter; and a switch connected to the filter for selectively connecting the filtration system to throughput one of a first chemical solution and a second chemical solution.Type: GrantFiled: March 20, 2007Date of Patent: November 12, 2013Assignee: Taiwan Semiconductor Manufactuing Company, Ltd.Inventors: Yao-Hwan Kao, Po-Chang Huang
-
Publication number: 20120205773Abstract: A Schottky diode with a lowered forward voltage drop has an N? type doped drift layer formed on an N+ type doped layer. The N? type doped drift layer has a surface formed with a protection ring inside which is a P-type doped layer. The surface of the N? type doped drift layer is further formed with an oxide layer and a metal layer. The contact region between the metal layer and the N? type doped drift layer within the P-type doped layer forms a Schottky barrier. An upward extending N type doped layer is formed on the N+ type doped layer and under the Schottky barrier to reduce the thickness of the N? type doped drift layer under the Schottky barrier. This lowers the forward voltage drop of the Schottky diode.Type: ApplicationFiled: July 20, 2011Publication date: August 16, 2012Applicant: PYNMAX TECHNOLOGY CO., LTD.Inventors: Chiun-Yen TUNG, Po-Chang HUANG, Wei-Sheng CHAO, Kun-Hsien CHEN
-
Patent number: 7901854Abstract: A wafer edge exposure unit comprises a chuck for supporting a wafer. The chuck is rotatable about a central axis. A plurality of light sources are positioned or movably positionable with a common radial distance from the axis of the rotatable chuck, each light source configured to direct exposure light on a respective edge portion of the wafer simultaneously.Type: GrantFiled: May 8, 2009Date of Patent: March 8, 2011Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Po-Chang Huang, Heng-Hsin Liu, Heng-Jen Lee
-
Publication number: 20100285399Abstract: A wafer edge exposure unit comprises a chuck for supporting a wafer. The chuck is rotatable about a central axis. A plurality of light sources are positioned or movably positionable with a common radial distance from the axis of the rotatable chuck, each light source configured to direct exposure light on a respective edge portion of the wafer simultaneously.Type: ApplicationFiled: May 8, 2009Publication date: November 11, 2010Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Po-Chang Huang, Heng-Hsin Liu, Heng-Jen Lee
-
Publication number: 20080230492Abstract: System and method for replacing a resist filter in such a manner as to reduce filter-induced wafer defects are described. In one embodiment, the system comprises a filtration system connected to a dispenser, the filtration system comprising a filter; and a switch connected to the filter for selectively connecting the filtration system to throughput one of a first chemical solution and a second chemical solution.Type: ApplicationFiled: March 20, 2007Publication date: September 25, 2008Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Yao-Hwan Kao, Po-Chang Huang
-
Patent number: 7204413Abstract: Judgment systems and methods. The system includes a signal gathering module, an attribute retrieval module, a rule retrieval module, and a rule execution module. The signal gathering module receives identification of at least a first card and a second card, and defines statuses thereof. The attribute retrieval module retrieves attributes corresponding to the first and second cards according to the identification thereof. The rule retrieval module retrieves a rule according to the identification and statuses of the first and second cards. The rule execution module performs the rule on the first and second cards to change the attributes thereof.Type: GrantFiled: January 21, 2005Date of Patent: April 17, 2007Assignee: Institute for Information IndustryInventors: Po-Chang Huang, Wen-Tai Hsieh, Shih-Chun Chou, Yung-Fang Yang
-
Publication number: 20060124731Abstract: Judgment systems and methods. The system includes a signal gathering module, an attribute retrieval module, a rule retrieval module, and a rule execution module. The signal gathering module receives identification of at least a first card and a second card, and defines statuses thereof. The attribute retrieval module retrieves attributes corresponding to the first and second cards according to the identification thereof. The rule retrieval module retrieves a rule according to the identification and statuses of the first and second cards. The rule execution module performs the rule on the first and second cards to change the attributes thereof.Type: ApplicationFiled: January 21, 2005Publication date: June 15, 2006Inventors: Po-Chang Huang, Wen-Tai Hsieh, Shih-Chun Chou, Yung-Fang Yang
-
Publication number: 20050211267Abstract: A method and apparatus for rinsing and drying a substrate (100) of a semiconductor wafer (102), has a first nozzle (110) dispensing rinsing fluid against the substrate (100); and a second nozzle (114) dispensing dry gas under pressure against the substrate (100) during a drying cycle to dry the substrate (100) completely. The second nozzle (114) can point to the substrate (100) while the substrate (100) spins. The nozzles (110) and (114) can be positioned by a robot arm (112).Type: ApplicationFiled: March 26, 2004Publication date: September 29, 2005Inventors: Yao-Hwan Kao, Po-Chang Huang, Ming-Yeon Hung, Chi-Che Huang
-
Publication number: 20050051196Abstract: A developer dispensing apparatus for dispensing developer solution onto a semiconductor wafer substrate which has a vertically-adjustable knife ring. The knife ring is vertically actuated in the apparatus by pressurized air or fluid. In an application, the gap distance between the upper edge of the knife ring and the backside of the wafer is initially adjusted to a minimum value as the developer solution is dispensed onto the wafer, by adjusting the knife ring to the uppermost position in the apparatus.Type: ApplicationFiled: September 8, 2003Publication date: March 10, 2005Inventors: Yao-Hwan Kao, Ming-Yeon Hung, Po-Chang Huang