Patents by Inventor Po-Cho HSIAO

Po-Cho HSIAO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Etch-resistant composition and its application
    Patent number: 9187659
    Abstract: An etch-resistant composition is provided. The etch-resistant composition comprises a polymer and a first organic solvent. The polymer is prepared by copolymerizing a polymerization unit comprising styrene-based monomer(s) and acrylate-based monomer(s), and has a weight average molecular weight of at least about 35,000. Based on the total weight of the etch-resistant composition, the amount of the polymer is about 20.0 to about 60.0 wt % and the amount of the solvent is about 40.0 to about 80.0 wt %. The etch-resistant composition can be used for preparing a selective emitter of a solar cell.
    Type: Grant
    Filed: August 8, 2012
    Date of Patent: November 17, 2015
    Assignee: ETERNAL MATERIALS CO., LTD.
    Inventors: Pei-Rong Shieh, Tsai-Fa Hsu, Po-Cho Hsiao
  • ETCH-RESISTANT COMPOSITION AND ITS APPLICATION
    Publication number: 20130230940
    Abstract: An etch-resistant composition is provided. The etch-resistant composition comprises a polymer and a first organic solvent. The polymer is prepared by copolymerizing a polymerization unit comprising styrene-based monomer(s) and acrylate-based monomer(s), and has a weight average molecular weight of at least about 35,000. Based on the total weight of the etch-resistant composition, the amount of the polymer is about 20.0 to about 60.0 wt % and the amount of the solvent is about 40.0 to about 80.0 wt %. The etch-resistant composition can be used for preparing a selective emitter of a solar cell.
    Type: Application
    Filed: August 8, 2012
    Publication date: September 5, 2013
    Applicant: ETERNAL CHEMICAL CO., LTD.
    Inventors: Pei-Rong SHIEH, Tsai-Fa HSU, Po-Cho HSIAO