Patents by Inventor Po-Fan HSU

Po-Fan HSU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11925226
    Abstract: A textile includes: (1) a matrix; and (2) particulate fillers dispersed within the matrix. The textile has a transmittance of infrared radiation at a wavelength of 9.5 ?m of at least about 40%, and the textile has a weighted average reflectivity of radiation over a wavelength range of 0.3 ?m to 2 ?m of at least about 40%.
    Type: Grant
    Filed: February 4, 2019
    Date of Patent: March 12, 2024
    Assignee: The Board of Trustees of The Leland Stanford Junior University
    Inventors: Yi Cui, Shanhui Fan, Lili Cai, Alex Y. Song, Wei Li, Po-Chun Hsu
  • Patent number: 8435620
    Abstract: Disclosed herein is a recording material for an optical recording medium. The recording material has a composition represented by a general formula of BixGeyO(1-x-y), in which x and y respectively are atomic ratios of bismuth and germanium, and satisfy the requirements of the following formulae: 2.8?(x/y)?25 and 0.55?(1?x?y)?0.62.
    Type: Grant
    Filed: September 9, 2011
    Date of Patent: May 7, 2013
    Assignee: Ritek Corporation
    Inventors: Wei-Hsiang Wang, Po-Fan Hsu, Wei-Chong Li
  • Publication number: 20130065008
    Abstract: Disclosed herein is a recording material for an optical recording medium. The recording material has a composition represented by a general formula of BixGeyO(1-x-y), in which x and y respectively are atomic ratios of bismuth and germanium, and satisfy the requirements of the following formulae: 2.8?(x/y)?25 and 0.55?(1?x?y)?0.62.
    Type: Application
    Filed: September 9, 2011
    Publication date: March 14, 2013
    Applicant: RITEK CORPORATION
    Inventors: Wei-Hsiang WANG, Po-Fan HSU, Wei-Chong LI