Abstract: A system and a method for parameter optimization with adaptive search space and a user interface using the same are provided. The system includes a data acquisition unit, an adaptive adjustment unit and an optimization search unit. The data acquisition unit obtains a set of executed values of several operating parameters and a target parameter. The adaptive adjustment unit includes a parameter space transformer and a search range definer. The parameter space transformer performs a space transformation on a parameter space of the operating parameters according to the executed values. The search range definer defines a parameter search range in a transformed parameter space based on the sets of the executed values. The optimization search unit takes the parameter search range as a limiting condition and takes optimizing the target parameter as a target to search for a set of recommended values of the operating parameters.

Abstract: A method of manufacturing a semiconductor device includes the following steps. A photoresist layer is formed over a material layer on a substrate. The photoresist layer has a composition including a solvent and a first photo-active compound dissolved in the solvent. The first photo-active compound is represented by the following formula (A1) or formula (A2): Zr12O8(OH)14(RCO2)18 ??Formula (A1); or Hf6O4(OH)6(RCO2)10 ??Formula (A2). R in the formula (A1) and R in the formula (A2) each include one of the following formulae (1) to (6): The photoresist layer is patterned. The material layer is etched using the photoresist layer as an etch mask.

Abstract: A method of manufacturing a semiconductor device includes the following steps. A photoresist layer is formed over a material layer on a substrate. The photoresist layer has a composition including a solvent and a first photo-active compound dissolved in the solvent. The first photo-active compound is represented by the following formula (Al) or formula (A2): Zr12O8(OH)14(RCO2)18??Formula (A1); or Hf6O4(OH)6(RCO2)10??Formula (A2). R in the formula (A1) and R in the formula (A2) each include one of the following formulae (1) to (6): The photoresist layer is patterned. The material layer is etched using the photoresist layer as an etch mask.

Abstract: A motion detection system with flicker compensation includes an image sensor that captures a first image for motion detection and a second image for flicker detection, the second image having a resolution lower than the first image; a controller that controls the image sensor to output either the first image or the second image; a motion detection device that receives first images and performs motion detection on the first images; and a flicker detection device that receives second images and performs flicker detection on the second images to generate a time offset, which is fed to the controller to update a wakeup cycle for coordinating the image sensor.

Abstract: A method for controlling an image capturing device that is operated according to a startup signal includes: configuring an image sensor array of the image capturing device by a first context to output a high-resolution image with a relatively long exposure time to a post-device; switching the first context to a second context based on the high-resolution image and a wide convergence zone; configuring the image sensor array by the second context to output one or more low-resolution images with relatively short exposure times in order to update an exposure value based on the low-resolution images; and updating the exposure value based on a narrow convergence zone to configure the image sensor array.

Abstract: An imaging method with motion detection includes determining a windows layout according to a vanishing point or a horizontal line, sizes of windows in the determined windows layout being not uniform; determining features of the windows of a current image; comparing the determined features of the windows of the current image with features of corresponding windows of a previous image to determine whether local motion occurs.

Abstract: An auto exposure control system includes a mean statistics unit that generates a weighted mean brightness value for an image array; a target control unit that determines a target brightness value according to an ambient status that is determined in accordance with an ambient light value, wherein, in one embodiment, the weighted mean brightness value is used as the ambient light value; a stabilization unit that generates stabilization control signals for the target control unit according to the ambient light value and ambient status information provided by the target control unit; and an exposure value control unit that computes a desired exposure value by comparing the target brightness value with the weighted mean brightness value and determines an exposure command according to the desired exposure value.

Abstract: An auto exposure control system includes a mean statistics unit that generates a weighted mean brightness value for an image array; a target control unit that determines a target brightness value according to an ambient status that is determined in accordance with an ambient light value, wherein, in one embodiment, the weighted mean brightness value is used as the ambient light value; a stabilization unit that generates stabilization control signals for the target control unit according to the ambient light value and ambient status information provided by the target control unit; and an exposure value control unit that computes a desired exposure value by comparing the target brightness value with the weighted mean brightness value and determines an exposure command according to the desired exposure value.

Abstract: A dual-exposure control circuit of an imaging system includes an RGB pixel array and a white pixel array. The dual-exposure control circuit is arranged to determine EGPs for the RGB pixel array and the white pixel array, and compensate RGB data sensed by the RGB pixel array based on the determined EGP.

Abstract: A method for controlling a frame exposure level, comprising: (a) determining a second integration time for the pixel array via a desired exposure level, and determining a second analog gain and a second digital gain via a desired total gain; (b) respectively applying the second analog gain and the second digital gain to amplify at least one second light sensing signal and at least one digital light sensing signal generated from the second light sensing signal; (c) computing a desired total gain for the third frame, and determining a third analog gain and a third digital gain via the desired total gain; and (d) respectively applying the third analog gain and the third digital gain to amplify at least one third light sensing signal and at least one digital light sensing signal generated from the third light sensing signal, and applying the second integration time to the pixel array.

Abstract: A method for controlling a frame exposure level, comprising: (a) determining a second integration time for the pixel array via a desired exposure level, and determining a second analog gain and a second digital gain via a desired total gain; (b) respectively applying the second analog gain and the second digital gain to amplify at least one second light sensing signal and at least one digital light sensing signal generated from the second light sensing signal; (c) computing a desired total gain for the third frame, and determining a third analog gain and a third digital gain via the desired total gain; and (d) respectively applying the third analog gain and the third digital gain to amplify at least one third light sensing signal and at least one digital light sensing signal generated from the third light sensing signal, and applying the second integration time to the pixel array.