Patents by Inventor Po-Feng Tsai
Po-Feng Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240347341Abstract: The present disclosure describes a system and a method for an ion implantation (IMP) process. The system includes an ion implanter configured to scan an ion beam over a target for a range of angles, a tilting mechanism configured to support and tilt the target, an ion-collecting device configured to collect a distribution and a number of ejected ions from the ion beam scan over the target, and a control unit configured to adjust a tilt angle based on a correction angle determined based on the distribution and number of ejected ions.Type: ApplicationFiled: June 25, 2024Publication date: October 17, 2024Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chun-Jung HUANG, Li-Hsin CHU, Po-Feng TSAI, Henry PENG, Kuang Huan HSU, Tsung Wei CHEN, Yung-Lin HSU
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Patent number: 12051593Abstract: The present disclosure describes a system and a method for an ion implantation (IMP) process. The system includes an ion implanter configured to scan an ion beam over a target for a range of angles, a tilting mechanism configured to support and tilt the target, an ion-collecting device configured to collect a distribution and a number of ejected ions from the ion beam scan over the target, and a control unit configured to adjust a tilt angle based on a correction angle determined based on the distribution and number of ejected ions.Type: GrantFiled: March 27, 2023Date of Patent: July 30, 2024Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chun-Jung Huang, Li-Hsin Chu, Po-Feng Tsai, Henry Peng, Kuang Huan Hsu, Tsung Wei Chen, Yung-Lin Hsu
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Patent number: 12050153Abstract: A method for monitoring a transport vehicle is provided. The method includes the operations as follows. A transport vehicle is scanned by a monitor during the transport vehicle is operated on a rail to acquire a vehicle pattern of the transport vehicle. The vehicle pattern of the transport vehicle is analyzed. An abnormal transport vehicle is determined based on the vehicle pattern. The monitor is placed nearby the rail. A method for transport vehicle maintenance is also provided.Type: GrantFiled: November 13, 2020Date of Patent: July 30, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Chun-Jung Huang, Kuang Huan Hsu, Jen-Ti Wang, Po-Feng Tsai, An-Sheng Chung
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Publication number: 20230230839Abstract: The present disclosure describes a system and a method for an ion implantation (IMP) process. The system includes an ion implanter configured to scan an ion beam over a target for a range of angles, a tilting mechanism configured to support and tilt the target, an ion-collecting device configured to collect a distribution and a number of ejected ions from the ion beam scan over the target, and a control unit configured to adjust a tilt angle based on a correction angle determined based on the distribution and number of ejected ions.Type: ApplicationFiled: March 27, 2023Publication date: July 20, 2023Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chun-Jung HUANG, Li-Hsin CHU, Po-Feng TSAI, Henry PENG, Kuang Huan HSU, Tsung Wei CHEN, Yung-Lin HSU
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Patent number: 11615961Abstract: The present disclosure describes a system and a method for an ion implantation (IMP) process. The system includes an ion implanter configured to scan an ion beam over a target for a range of angles, a tilting mechanism configured to support and tilt the target, an ion-collecting device configured to collect a distribution and a number of ejected ions from the ion beam scan over the target, and a control unit configured to adjust a tilt angle based on a correction angle determined based on the distribution and number of ejected ions.Type: GrantFiled: November 18, 2021Date of Patent: March 28, 2023Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chun-Jung Huang, Li-Hsin Chu, Po-Feng Tsai, Henry Peng, Kuang Huan Hsu, Tsung Wei Chen, Yung-Lin Hsu
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Publication number: 20220155180Abstract: A method for monitoring a transport vehicle is provided. The method includes the operations as follows. A transport vehicle is scanned by a monitor during the transport vehicle is operated on a rail to acquire a vehicle pattern of the transport vehicle. The vehicle pattern of the transport vehicle is analyzed. An abnormal transport vehicle is determined based on the vehicle pattern. The monitor is placed nearby the rail. A method for transport vehicle maintenance is also provided.Type: ApplicationFiled: November 13, 2020Publication date: May 19, 2022Inventors: CHUN-JUNG HUANG, KUANG HUAN HSU, JEN-TI WANG, PO-FENG TSAI, AN-SHENG CHUNG
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Publication number: 20220076958Abstract: The present disclosure describes a system and a method for an ion implantation (IMP) process. The system includes an ion implanter configured to scan an ion beam over a target for a range of angles, a tilting mechanism configured to support and tilt the target, an ion-collecting device configured to collect a distribution and a number of ejected ions from the ion beam scan over the target, and a control unit configured to adjust a tilt angle based on a correction angle determined based on the distribution and number of ejected ions.Type: ApplicationFiled: November 18, 2021Publication date: March 10, 2022Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chun-Jung Huang, Li-Hsin Chu, Po-Feng Tsai, Henry Peng, Kuang Huan Hsu, Tsung Wei Chen, Yung-Lin Hsu
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Patent number: 11195720Abstract: The present disclosure describes a system and a method for a ion implantation (IMP) process. The system includes an ion implanter configured to scan an ion beam over a target for a range of angles, a tilting mechanism configured to support and tilt the target, an ion-collecting device configured to collect a distribution and a number of ejected ions from the ion beam scan over the target, and a control unit configured to adjust a tilt angle based on a correction angle determined based on the distribution and number of ejected ions.Type: GrantFiled: April 11, 2019Date of Patent: December 7, 2021Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chun-Jung Huang, Li-Hsin Chu, Po-Feng Tsai, Henry Peng, Kuang Huan Hsu, Tsung Wei Chen, Yung-Lin Hsu
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Publication number: 20200135470Abstract: The present disclosure describes a system and a method for a ion implantation (IMP) process. The system includes an ion implanter configured to scan an ion beam over a target for a range of angles, a tilting mechanism configured to support and tilt the target, an ion-collecting device configured to collect a distribution and a number of ejected ions from the ion beam scan over the target, and a control unit configured to adjust a tilt angle based on a correction angle determined based on the distribution and number of ejected ions.Type: ApplicationFiled: April 11, 2019Publication date: April 30, 2020Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chun-Jung HUANG, Li-Hsin CHU, Po-Feng TSAI, Henry PENG, Kuang Huan HSU, Tsung Wei CHEN, Yung-Lin HSU
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Patent number: 10047439Abstract: A method and system for removing control action effects from inline measurement data for tool condition monitoring is disclosed. An exemplary method includes determining a control action effect that contributes to an inline measurement, wherein the inline measurement indicates a wafer characteristic of a wafer processed by a process tool; and evaluating the inline measurement without the control action effect contribution to determine a condition of the process tool.Type: GrantFiled: December 8, 2011Date of Patent: August 14, 2018Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Po-Feng Tsai, Chia-Tong Ho, Sunny Wu, Jo Fei Wang, Jong-I Mou, Chin-Hsiang Lin
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Patent number: 9870896Abstract: A system, a method, and a non-transitory computer readable storage medium for controlling an ion implanter are disclosed herein. The system includes a sample module and a control module. The sample module is configured to generate a summarized value from process data of the ion implanter, and the process data correspond to a control parameter. The control module is configured to tune a control parameter, and the control module performs an ion implantation by releasing tools of the ion implanter in accordance with the control parameter when the summarized value meets a predetermined stability requirement.Type: GrantFiled: December 6, 2013Date of Patent: January 16, 2018Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Po-Feng Tsai, Chia-Tong Ho, Chia-Hsing Liao, Sheng-Wei Lee, Jo-Fei Wang, Jong-I Mou
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Patent number: 9727049Abstract: The present disclosure provides various methods for tool condition monitoring, including systems for implementing such monitoring. An exemplary method includes receiving data associated with a process performed on wafers by an integrated circuit manufacturing process tool; and monitoring a condition of the integrated circuit manufacturing process tool using the data. The monitoring includes evaluating the data based on an abnormality identification criterion, an abnormality filtering criterion, and an abnormality threshold to determine whether the data meets an alarm threshold. The method may further include issuing an alarm when the data meets the alarm threshold.Type: GrantFiled: September 4, 2012Date of Patent: August 8, 2017Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chia-Tong Ho, Po-Feng Tsai, Jung-Chang Chen, Tze-Liang Lee, Jo Fei Wang, Jong-I Mou, Chin-Hsiang Lin
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Patent number: 9519285Abstract: The present disclosure provides various methods for tuning process parameters of a process tool, including systems for implementing such tuning. An exemplary method for tuning process parameters of a process tool such that the wafers processed by the process tool exhibit desired process monitor items includes defining behavior constraint criteria and sensitivity adjustment criteria; generating a set of possible tool tuning process parameter combinations using process monitor item data associated with wafers processed by the process tool, sensitivity data associated with a sensitivity of the process monitor items to each process parameter, the behavior constraint criteria, and the sensitivity adjustment criteria; generating a set of optimal tool tuning process parameter combinations from the set of possible tool tuning process parameter combinations; and configuring the process tool according to one of the optimal tool tuning process parameter combinations.Type: GrantFiled: January 23, 2013Date of Patent: December 13, 2016Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Po-Feng Tsai, Chia-Tong Ho, Sunny Wu, Jo Fei Wang, Jong-I Mou, Chin-Hsiang Lin
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Patent number: 9349660Abstract: A system and method for monitoring a process tool of an integrated circuit manufacturing system are disclosed. An exemplary method includes defining zones of an integrated circuit manufacturing process tool; grouping parameters of the integrated circuit manufacturing process tool based on the defined zones; and evaluating a condition of the integrated circuit manufacturing process tool based on the grouped parameters.Type: GrantFiled: December 1, 2011Date of Patent: May 24, 2016Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Po-Feng Tsai, Chia-Tong Ho, Sunny Wu, Jo Fei Wang, Jong-I Mou, Chin-Hsiang Lin
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Patent number: 9141097Abstract: A method of automatically determining process parameters for processing equipment includes processing at least one first substrate in the processing equipment at a first time; and processing at least one second substrate in the processing equipment at a second time. The method includes collecting data on process monitors for the at least one first substrate; and the at least one second substrate. The method includes receiving the data by a multiple-input-multiple-output (MIMO) optimization system. The method includes revising a sensitivity matrix, by a MIMO optimizer, using the data and an adaptive-learning algorithm, wherein the adaptive-learning algorithm revises the sensitivity matrix based on a learning parameter which is related to a rate of change of the processing equipment over time. The method includes determining a set of process parameters for the processing equipment by the MIMO optimizer, wherein the MIMO optimizer uses the revised sensitivity matrix to determine the process parameters.Type: GrantFiled: November 15, 2013Date of Patent: September 22, 2015Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Po-Feng Tsai, Chia-Tong Ho, Sunny Wu, Jo Fei Wang, Jong-I Mou
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Publication number: 20150162166Abstract: A system, a method, and a non-transitory computer readable storage medium for controlling an ion implanter are disclosed herein. The system includes a sample module and a control module. The sample module is configured to generate a summarized value from process data of the ion implanter, and the process data correspond to a control parameter. The control module is configured to tune a control parameter, and the control module performs an ion implantation by releasing tools of the ion implanter in accordance with the control parameter when the summarized value meets a predetermined stability requirement.Type: ApplicationFiled: December 6, 2013Publication date: June 11, 2015Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Po-Feng TSAI, Chia-Tong HO, Chia-Hsing LlAO, Sheng-Wei LEE, Jo-Fei WANG, Jong-I MOU
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Patent number: 9026239Abstract: A method of extending advanced process control (APC) models includes constructing an APC model table including APC model parameters of a plurality of products and a plurality of work stations. The APC model table includes empty cells and cells filled with existing APC model parameters. Average APC model parameters of the existing APC model parameters are calculated, and filled into the empty cells as initial values. An iterative calculation is performed to update the empty cells with updated values.Type: GrantFiled: June 3, 2010Date of Patent: May 5, 2015Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Po-Feng Tsai, Yen-Di Tsen, Jo Fei Wang, Jong-I Mou
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Publication number: 20140207271Abstract: The present disclosure provides various methods for tuning process parameters of a process tool, including systems for implementing such tuning. An exemplary method for tuning process parameters of a process tool such that the wafers processed by the process tool exhibit desired process monitor items includes defining behavior constraint criteria and sensitivity adjustment criteria; generating a set of possible tool tuning process parameter combinations using process monitor item data associated with wafers processed by the process tool, sensitivity data associated with a sensitivity of the process monitor items to each process parameter, the behavior constraint criteria, and the sensitivity adjustment criteria; generating a set of optimal tool tuning process parameter combinations from the set of possible tool tuning process parameter combinations; and configuring the process tool according to one of the optimal tool tuning process parameter combinations.Type: ApplicationFiled: January 23, 2013Publication date: July 24, 2014Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Po-Feng Tsai, Chia-Tong Ho, Sunny Wu, Jo Fei Wang, Jong-I Mou, Chin-Hsiang Lin
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Publication number: 20140074258Abstract: A method of automatically determining process parameters for processing equipment includes processing at least one first substrate in the processing equipment at a first time; and processing at least one second substrate in the processing equipment at a second time. The method includes collecting data on process monitors for the at least one first substrate; and the at least one second substrate. The method includes receiving the data by a multiple-input-multiple-output (MIMO) optimization system. The method includes revising a sensitivity matrix, by a MIMO optimizer, using the data and an adaptive-learning algorithm, wherein the adaptive-learning algorithm revises the sensitivity matrix based on a learning parameter which is related to a rate of change of the processing equipment over time. The method includes determining a set of process parameters for the processing equipment by the MIMO optimizer, wherein the MIMO optimizer uses the revised sensitivity matrix to determine the process parameters.Type: ApplicationFiled: November 15, 2013Publication date: March 13, 2014Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Po-Feng TSAI, Chia-Tong HO, Sunny WU, Jo Fei WANG, Jong-I MOU
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Publication number: 20140067324Abstract: The present disclosure provides various methods for tool condition monitoring, including systems for implementing such monitoring. An exemplary method includes receiving data associated with a process performed on wafers by an integrated circuit manufacturing process tool; and monitoring a condition of the integrated circuit manufacturing process tool using the data. The monitoring includes evaluating the data based on an abnormality identification criterion, an abnormality filtering criterion, and an abnormality threshold to determine whether the data meets an alarm threshold. The method may further include issuing an alarm when the data meets the alarm threshold.Type: ApplicationFiled: September 4, 2012Publication date: March 6, 2014Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chia-Tong Ho, Po-Feng Tsai, Jung-Chang Chen, Tze-Liang Lee, Jo Fei Wang, Jong-I Mou, Chin-Hsiang Lin