Patents by Inventor Po-Jung Hsu

Po-Jung Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240347341
    Abstract: The present disclosure describes a system and a method for an ion implantation (IMP) process. The system includes an ion implanter configured to scan an ion beam over a target for a range of angles, a tilting mechanism configured to support and tilt the target, an ion-collecting device configured to collect a distribution and a number of ejected ions from the ion beam scan over the target, and a control unit configured to adjust a tilt angle based on a correction angle determined based on the distribution and number of ejected ions.
    Type: Application
    Filed: June 25, 2024
    Publication date: October 17, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chun-Jung HUANG, Li-Hsin CHU, Po-Feng TSAI, Henry PENG, Kuang Huan HSU, Tsung Wei CHEN, Yung-Lin HSU
  • Patent number: 12119272
    Abstract: A semiconductor device includes a fin-shaped structure on a substrate, a single diffusion break (SDB) structure in the fin-shaped structure to divide the first fin-shaped structure into a first portion and a second portion, and more than two gate structures on the SDB structure. Preferably, the more than two gate structures include a first gate structure, a second gate structure, a third gate structure, and a fourth gate structure disposed on the SDB structure.
    Type: Grant
    Filed: August 14, 2023
    Date of Patent: October 15, 2024
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Fu-Jung Chuang, Po-Jen Chuang, Yu-Ren Wang, Chi-Mao Hsu, Chia-Ming Kuo, Guan-Wei Huang, Chun-Hsien Lin
  • Patent number: 12107151
    Abstract: A semiconductor device includes a gate structure on a substrate, a first spacer on sidewalls of gate structure, a second spacer on sidewalls of the first spacer, a polymer block adjacent to the first spacer and on a corner between the gate structure and the substrate, an interfacial layer under the polymer block, and a source/drain region adjacent to two sides of the first spacer. Preferably, the polymer block is surrounded by the first spacer, the interfacial layer, and the second spacer.
    Type: Grant
    Filed: June 13, 2023
    Date of Patent: October 1, 2024
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Fu-Jung Chuang, Tsuo-Wen Lu, Chia-Ming Kuo, Po-Jen Chuang, Chi-Mao Hsu
  • Patent number: 12051896
    Abstract: A device is disclosed herein. The device includes a bias generator, an ESD driver, and a logic circuit. The bias generator includes a first transistor. The ESD driver includes a second transistor and a third transistor coupled to each other in series. The logic circuit is configured to generate a logic control signal. When the first transistor is turned on by a detection signal, the first transistor is turned off.
    Type: Grant
    Filed: May 24, 2023
    Date of Patent: July 30, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Po-Lin Peng, Yu-Ti Su, Chia-Wei Hsu, Ming-Fu Tsai, Shu-Yu Su, Li-Wei Chu, Jam-Wem Lee, Chia-Jung Chang, Hsiang-Hui Cheng
  • Patent number: 12050153
    Abstract: A method for monitoring a transport vehicle is provided. The method includes the operations as follows. A transport vehicle is scanned by a monitor during the transport vehicle is operated on a rail to acquire a vehicle pattern of the transport vehicle. The vehicle pattern of the transport vehicle is analyzed. An abnormal transport vehicle is determined based on the vehicle pattern. The monitor is placed nearby the rail. A method for transport vehicle maintenance is also provided.
    Type: Grant
    Filed: November 13, 2020
    Date of Patent: July 30, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Chun-Jung Huang, Kuang Huan Hsu, Jen-Ti Wang, Po-Feng Tsai, An-Sheng Chung
  • Patent number: 12051593
    Abstract: The present disclosure describes a system and a method for an ion implantation (IMP) process. The system includes an ion implanter configured to scan an ion beam over a target for a range of angles, a tilting mechanism configured to support and tilt the target, an ion-collecting device configured to collect a distribution and a number of ejected ions from the ion beam scan over the target, and a control unit configured to adjust a tilt angle based on a correction angle determined based on the distribution and number of ejected ions.
    Type: Grant
    Filed: March 27, 2023
    Date of Patent: July 30, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chun-Jung Huang, Li-Hsin Chu, Po-Feng Tsai, Henry Peng, Kuang Huan Hsu, Tsung Wei Chen, Yung-Lin Hsu
  • Publication number: 20240242016
    Abstract: A layout routing method includes determining a routing pattern according to a swapping rule, a via pattern, area constraints and pin locations; optimizing swapping in differential pairs according to the routing pattern; extracting features of each routing net to obtain extracted features; using an unsupervised algorithm to generate different routing groups according to the extracted features; and determining a routing order of the routing groups according to complex features of the routing groups.
    Type: Application
    Filed: December 25, 2023
    Publication date: July 18, 2024
    Applicant: MEDIATEK INC.
    Inventors: Chih-Jung Hsu, Chen Lien, Deng-Yao Tu, Po-Yang Chen, Guan-Qi Fang, Shu-Huan Chang, Yi-Hung Chen, Yao-Chun Su, Yu-Yang Chen
  • Patent number: 11807787
    Abstract: A luminescence conversion material is provided. The luminescence conversion material includes: a hybrid luminescence conversion particle, a first cladding material covering the hybrid luminescence conversion particle, and a second cladding material formed on the first cladding material and covering the first cladding material. The hybrid luminescence conversion particle includes a matrix and a plurality of quantum dots uniformly dispersed in the matrix. The first cladding material includes silicon oxide. The ratio ? (absorbance ratio ?: A939/A1000-1150) of the absorbance at 939 cm?1 (A939) to the absorbance peak at 1000-1150 cm?1 (A1000-1150) in a FTIR spectrum of the first cladding material is less than or equal to 0.8.
    Type: Grant
    Filed: December 28, 2021
    Date of Patent: November 7, 2023
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chin-Cheng Weng, Ming-Chang Li, Po-Jung Hsu
  • Publication number: 20230203367
    Abstract: A luminescence conversion material is provided. The luminescence conversion material includes: a hybrid luminescence conversion particle, a first cladding material covering the hybrid luminescence conversion particle, and a second cladding material formed on the first cladding material and covering the first cladding material. The hybrid luminescence conversion particle includes a matrix and a plurality of quantum dots uniformly dispersed in the matrix. The first cladding material includes silicon oxide. The ratio ? (absorbance ratio ?: A939/A1000-1150) of the absorbance at 939 cm?1 (A939) to the absorbance peak at 1000-1150 cm?1 (A1000-1150) in a FTIR spectrum of the first cladding material is less than or equal to 0.8.
    Type: Application
    Filed: December 28, 2021
    Publication date: June 29, 2023
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chin-Cheng WENG, Ming-Chang LI, Po-Jung HSU
  • Publication number: 20220384728
    Abstract: A polymer, a quantum dot composition, and a light-emitting device employing the same are provided. The polymer includes a first repeat unit that has a structure represented by Formula (I): wherein the definitions of R1, R2, A1, A2, A3, and Z1 and n are as defined in the specification.
    Type: Application
    Filed: April 29, 2022
    Publication date: December 1, 2022
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chin-Cheng WENG, Po-Jung HSU, Han-Cheng YEH, Yong-Jay LEE, Tzu-Hsing YANG, Jia-Lun LIOU, Chin-Hui CHOU, Chun-Neng KU
  • Patent number: 11505566
    Abstract: Organic metal compounds and organic light-emitting devices employing the same are provided. The organic metal compound has a chemical structure of Formula (I) or Formula (II): In particular, one of the following two conditions (1) and (2) is met: (1) R1 is deuterium or C1-6 deuterated alkyl group, when R3 and R4 are independently hydrogen, halogen, C1-6 alkyl group, C1-6 fluoroalkyl or C3-12 heteroaryl group; and (2) R1 is hydrogen, deuterium, C1-6 alkyl group, C1-6 deuterated alkyl group, C3-12 heteroaryl group, or C6-12 aryl group, when at least one of R3 and R4 is C6-12 aryl group or C6-12 fluoroaryl group.
    Type: Grant
    Filed: June 24, 2019
    Date of Patent: November 22, 2022
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yu-Chieh Pao, Jia-Lun Liou, Han-Cheng Yeh, Po-Jung Hsu, Mei-Rurng Tseng
  • Publication number: 20210179649
    Abstract: Organic metal compounds, and organic light-emitting devices employing the same are provided. The organic metal compound has a chemical structure of Formula (I): The definitions of R1-R18 and n are as defined in specification. The organic light-emitting device includes a pair of electrodes; and an organic light-emitting element, disposed between the electrodes, wherein the organic light-emitting element includes the aforementioned organic metal compound.
    Type: Application
    Filed: June 29, 2020
    Publication date: June 17, 2021
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Jia-Lun LIOU, Po-Jung HSU, Han-Cheng YEH, Mei-Rurng TSENG
  • Publication number: 20200024294
    Abstract: Organic metal compounds and organic light-emitting devices employing the same are provided. The organic metal compound has a chemical structure of Formula (I) or Formula (II): In particular, one of the following two conditions (1) and (2) is met: (1) R1 is deuterium or C1-6 deuterated alkyl group, when R3 and R4 are independently hydrogen, halogen, C1-6 alkyl group, C1-6 fluoroalkyl or C3-12 heteroaryl group; and (2) R1 is hydrogen, deuterium, C1-6 alkyl group, C1-6 deuterated alkyl group, C3-12 heteroaryl group, or C6-12 aryl group, when at least one of R3 and R4 is C6-12 aryl group or C6-12 fluoroaryl group.
    Type: Application
    Filed: June 24, 2019
    Publication date: January 23, 2020
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yu-Chieh PAO, Jia-Lun LIOU, Han-Cheng YEH, Po-Jung HSU, Mei-Rurng TSENG
  • Patent number: D561923
    Type: Grant
    Filed: May 7, 2007
    Date of Patent: February 12, 2008
    Assignee: Honor Trading Ltd of Formosa
    Inventor: Po-Jung Hsu
  • Patent number: D577530
    Type: Grant
    Filed: May 1, 2007
    Date of Patent: September 30, 2008
    Assignee: Honor Trading Ltd of Formosa
    Inventor: Po-Jung Hsu
  • Patent number: D585822
    Type: Grant
    Filed: March 27, 2007
    Date of Patent: February 3, 2009
    Assignee: Honor Trading Ltd. of Formosa
    Inventor: Po-Jung Hsu
  • Patent number: D611631
    Type: Grant
    Filed: March 5, 2009
    Date of Patent: March 9, 2010
    Inventor: Po-Jung Hsu
  • Patent number: D636332
    Type: Grant
    Filed: August 3, 2009
    Date of Patent: April 19, 2011
    Assignee: Wagan Corp
    Inventor: Po-Jung Hsu
  • Patent number: D655240
    Type: Grant
    Filed: February 28, 2011
    Date of Patent: March 6, 2012
    Assignee: Wagan Corp.
    Inventor: Po-Jung Hsu
  • Patent number: D687766
    Type: Grant
    Filed: June 13, 2011
    Date of Patent: August 13, 2013
    Assignee: Wagan Corp.
    Inventor: Po-Jung Hsu